一种高噪声显微图像分割方法研究

传统的图像分割算法在处理高噪声显微图像时,由于背景复杂,很难得到目标完整的区域轮廓。通过对不同图像分割算法的性能进行对比,提出了一种改进的二维最大熵阈值遗传算法结合数学形态学除噪分割的方法。首先用改进的二维最大熵阈值算法结合遗传算法对高噪声显微图像进行粗分割,除去图像中大量的背景噪声,然后运用数学形态学进行细分割,滤除剩余少量杂质和孔洞,提取出目标轮廓。实验结果表明改进的方法较传统分割方法具有更强的抗噪声能力及更快的处理速度,有效地实现了高噪声显微图像的除噪分割。     

Group velocity matters for accurate prediction of phonon-limited carrier mobility

First-principles approaches have recently been developed to replace the phenomenological modeling approaches with adjustable parameters for calculating carrier mobilities in semiconductors. However, in addition to the high computational cost, it is still a challenge to obtain accurate mobility for carriers with a complex band structure, e.g., hole mobility in common semiconductors. Here, we present a computationally efficient approach using isotropic and parabolic bands to approximate the anisotropy valence bands for evaluating group velocities in the first-principles calculations. This treatment greatly reduces the computational cost in two ways: relieves the requirement of an extremely dense κ mesh to obtain a smooth change in group velocity, and reduces the 5-dimensional integral to 3-dimensional integral. Taking Si and SiC as two examples, we find that this simplified approach reproduces the full first-principles calculation for mobility. If we use experimental effective masses to evaluate the group velocity, we can obtain hole mobility in excellent agreement with experimental data over a wide temperature range. These findings shed light on how to improve the first-principles calculations towards predictive carrier mobility in high accuracy.     

反三角函数和三角方程

程是 一、选择题: 1.适合arccosx>.了万的:值的集合是()。 (A)哎x 10成:相似文献   

单晶硅化学机械抛光划痕演变研究

化学机械抛光法是制作超光滑单晶硅镜片的常用工艺,抛光过程中的各类杂质粒子经常会导致加工表面产生划痕,降低镜片的表面质量。为系统研究不同晶向单晶硅表面塑性划痕与抛光液中杂质的关系,设计了金刚石微粉掺杂抛光Si(111)、Si(110)和Si(100)晶面的实验。利用轮廓仪测量了不同晶向、不同掺杂浓度下的划痕形貌,并通过计算载荷归一化后的划痕宽度分布、划痕深度分布、粗糙度和二维功率谱密度来评估划痕形貌。结果显示,抛光液中杂质粒子粒径、硅片表面的划痕宽度均服从正态分布。随着杂质粒子浓度的增加,划痕形貌从非周期性特征转变为周期性波动,粗糙度出现突跃点。此外,在同浓度金刚石微粉掺杂情况下,Si(110)面在划痕产生初期有更好的杂质粒子容忍度。     

Photochemical kinetics for holographic grating formation in phenanthrenequinone doped poly (methyl methacrylate) photopolymer

The photochemical kinetics of phenanthrenequinone (PQ) doped poly (methyl methacrylate) photopolymer in holographic recording was studied theoretically and experimentally. The diffusion of PQ molecules during holographic recording was negligible because of its small diffusion coefficient at room temperature. A photochemical reaction kinetics model of PQ/PMMA was established. The analytical expressions for the temporal variations of transmittance and diffraction efficiency were derived. By fitting the experimental curves, some parameters related with the polymer components were obtained by the proposed model, which can be used to analyze the photochemical process and will be helpful to the optimization of material preparation.     

用阶跃温升法测量生物组织的热物理参数

生物体的热物性是研究生物组织热物理问题的基本参数。本文设计制作了以热敏电阻为探头的生物探针,基于阶跃温升法研制了相应的测量电路和计算机采集和控制系统,测量了生物组织的导热率,分析了组织试样尺寸对测量的影响。离体实验表明,阶跃温升法能够可靠地测量生物组织的热物性。     

七芯及十九芯大模场少模光纤的特性研究和比对分析

提出了一种新型的多芯大模场少模光纤.包含缺失空气孔的特殊结构使其具有独特的少模特性, 仅传输HE₁₁模和HE₂₁模.分析表明七芯大模场少模光纤能维持稳定的双模式运转, 且基模有效面积可达866.54 μm². 系统研究了光纤结构参数影响模式特性和基模有效面积的规律, 并分析了纤芯数目增加带来的性能相似性和差异性–-进阶的十九芯大模场少模光纤在继承少模特性的同时, 模场面积大大增加, 其基模有效面积可高达3617.55 μm². 对比已报道的少模光纤, 多芯大模场少模光纤获得了更大的有效面积, 并具有良好的弯曲特性, 有望被用于更高功率的光纤放大器、光纤激光器以及高速大容量光纤传输系统中. 关键词： 少模光纤 多芯 大模场面积 弯曲损耗     

微聚焦管硬x射线位相衬度成像

利用微聚焦管硬x射线光源进行同轴位相衬度成像实验，所用的光源聚焦尺寸最小可达0.5μm.根据微聚焦硬x射线管的光学传递函数，对光源尺寸、相干长度等因素对成像分辨率的影响进行了分析.对新鲜的未经任何处理的生物样品进行了位相衬度成像，分辨率在10μm左右，并和吸收衬度成像进行了对比.实验结果表明利用微聚焦管作为硬x射线光源，多色硬x射线位相衬度成像可以得到比吸收衬度成像高得多的分辨率. 关键词： 位相衬度成像 微聚焦管x射线源 吸收衬度成像 光学传递函数     

学科育人价值导向下的单元教学实践探索--以“整式”课堂教学为例

单项式与多项式均属整式单元的基本概念,两者在概念生成和知识呈现方式上具有较强的关联.适当整合教材,实施单元教学,于“巧”中创设生活情景,于“慢”中探索概念生成,于“活”中呈现知识应用,于“实”中进行课堂小结,进而构建完整的知识体系,渗透分类的数学思想,彰显学科育人价值.