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61.
一种催化动力学光度法测定铅的新方法 总被引:6,自引:0,他引:6
本文基于盐酸介质中 ,在活化剂氨三乙酸存在下 ,铅 (Ⅱ )催化过氧化氢氧化罗丹明B的新的指示反应体系 ,建立了一种灵敏度高的测定痕量铅 (Ⅱ )的新方法 ,其检测限为 1.45× 10 -10 g/mL ,线性范围 0~ 40ng/mL .用于生物样品及河水样品的测定 ,结果满意 相似文献
62.
Effect of polyacrylamide on morphology and electromagnetic properties of chrysanthemum-like ZnO particles 下载免费PDF全文
Through hydrothermal process, the chrysanthemum-like ZnO particles
are prepared with zinc acetate dihydrate (Zn(CH3COO)2\cdot
2H2O) and sodium hydroxide (NaOH) used as main resources under
the different concentrations of surfactant polyacrylamide (PAM). The
microstructure, morphology and the electromagnetic properties of the
as-prepared products are characterized by high-resolution
transmission electron microscopy (HRTEM), field emission environment
scanning electron microscope (FEESEM) and microwave vector network
analyzer, respectively. The experimental results indicate that the
as-prepared products are ZnO single crystalline with hexagona
wurtzite structure, that the values of slenderness ratio L_d are
different in different PAM concentrations, and that the good
magnetic loss property is found in the ZnO products, and the average
magnetic loss tangent tanδu increases with PAM
concentration increasing, while the dielectric loss tangent
tanδ e decreases. 相似文献
63.
利用等离子体化学气相沉积技术制备纳米硅(nc-Si∶H)薄膜材料,并用X射线衍射仪(XRD)、原子力显微镜(AFM)、Raman光谱仪对成膜的状态进行了表征。用红外吸收光谱仪对不同工艺薄膜的结构进行了分析,研究了偏压对薄膜结构的影响,为纳米硅薄膜在光电子方面的应用提供可靠的依据。 相似文献
64.
采用溶胶-凝胶技术,在Si(110)衬底上制备了Mg、Mn掺杂外延生长的Zn1-xMgxO和Zn1-xMnxO薄膜,通过XRD、AFM、PL等考察不同杂质浓度对薄膜结晶质量和发光性能的影响。结果表明:Zn1-xMgxO和Zn1-xMnxO薄膜均具有较高的Tc(002)结构系数和较为光滑、平整的表面形貌。掺杂使得薄膜的紫外发光峰向短波方向移动至365 nm左右,同时Zn1-xMnxO薄膜的室温可见光发射得以有效地钝化,使其近带边紫外光发射与深能级可见光发射比例高达56,极大地提高了薄膜紫外发光性能。并对掺杂薄膜紫外发光蓝移和Zn1-xMnxO薄膜室温可见光发射的猝灭机理进行了深入探讨,得出掺杂组分为Zn0.85Mg0.15O、Zn0.97Mn0.03O时,薄膜具有最强的紫外光发射性能。 相似文献
65.
66.
In this Letter, we reported the preliminary results of an integrating periodically capacitive-loaded traveling wave electrode(CL-TWE) Mach–Zehnder modulator(MZM) based on InP-based multiple quantum well(MQW)optical waveguides. The device configuration mainly includes an optical Mach–Zehnder interferometer, a direct current electrode, two phase electrodes, and a CL-TWE consisting of a U electrode and an I electrode. The modulator was fabricated on a 3 in. InP epitaxial wafer by standard photolithography, inductively coupled plasma dry etching, wet etching, electroplating, etc. Measurement results show that the MZM exhibits a3 dB electro-optic bandwidth of about 31 GHz, a V_π of 3 V, and an extinction ratio of about 20 dB. 相似文献