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31.
Dependence of Intrinsic Defects in ZnO Films on Oxygen Fraction Studied by Positron Annihilation
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Defects in ZnO films grown by radio-frequency reactive magnetron sputtering under variable ratios between oxygen and argon gas have been investigated by using the monoenergetie positron beam technique. The dominate intrinsic defects in these ZnO samples are O vacancies (Vo) and Zn interstitials (Zni) when the oxygen fraction in the O2/Ar feed gas does not exceed 70% in the processing chamber. On the other hand, zinc vacancies are preponderant in the ZnO films fabricated in richer oxygen environment. The concentration of zinc vacancies increases with the increasing O2 fraction. For the oxygen fraction 85%, the number of zinc vacancies that could trap positrons will be smaller. It is speculated that some unknown defects could shield zinc vacancies. The concentration of zinc vacancies in the ZnO films varies with the oxygen fraction in the growth chamber, which is in agreement with the results of photolurninescence spectra. 相似文献
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对在不同极板负偏压下采用射频-直流等离子体方法制备得到的类金刚石膜(a-C:H)的微结构进行了测量,利用慢正电子束实验装置,探测并分析了样品缺陷浓度的分布情况.结果表明,在不同偏压下制备的薄膜,其膜中缺陷浓度存在很大差别,但在900 V偏压下制得的样品,膜中的缺陷浓度最低. 相似文献
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通过对不同生长厚度GaN/SiC(n-n)的慢正电子研究,发现在GaN/SiC的界面中存在大量各种缺陷并在界面两端形成两个不同方向的电场. 这些缺陷的产生和SiC衬底表面制备以及GaN和SiC不同的热膨胀系数有关. 而缺陷中大量的带状缺陷在界面中形成一个费米能级钉扎(Fermi level pinning),它的存在使界面中存在一定高度的势垒,导致在界面两端的一定区域内形成两个不同方向的电场. 用VEPFIT模拟该电场的存在,分四层(GaN/Interface/SiC1/SiC2)进行拟合,得到了很好的拟
关键词:
正电子湮没
缺陷
半导体 相似文献
34.
利用单能慢正电子束流,对原生的和经过电子辐照的6H-SiC内的缺陷形成及其退火行为进行研究.发现在n型6H-SiC中,经过退火后缺陷浓度降低.这主要是因为在退火过程中缺陷和间隙子的相互作用所引起.n型6H-Si经过1400 oC、30 min真空退火后,在SiC表面形成一个大约20 nm的Si层,这是在高温退火过程中Si原子向表面逸出的有力证明.在高温退火中,在样品的近表面区域有一个明显的表面效应,既在这些区域的S参数整体较大,这种现象与高温退火中Si不断向表面逸出有关.经过10 MeV的电子辐照,在n型6H-SiC中,正电子有效扩散长度从86.2 nm减少至39.1 nm,说明在样品中由于电子辐照产生大量缺陷.但是对p型6H-SiC,经过10 MeV电子辐照后有效扩散长度变化不大,这与其中缺陷的正电性有关.同时还对n型6H-SiC进行了1.8 MeV电子辐照后的300 oC退火实验,发现退火后缺陷浓度不减反增,这主要是因为在退火过程中,一些双空位缺陷和Si间隙子互相作用从而产生了VC缺陷的缘故. 相似文献
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用单能慢正电子束,测量了不同氧分压下生长的La0.7Sr0.3MnO3外延膜的S参数与入射正电子能量E的关系.结果发现La0.7Sr0.3MnO3外延膜中S参数与氧分压是非单调变化的;这与沉积氧分压的两种作用相关联的.在氧分压较高的LSMO薄膜中, 空位浓度的增加主要是由沉积原子(离子)与氧原子碰撞几率增大,使其缺乏足够的动能去填补空位引起的;在低氧分压的LSMO薄膜中, 空位浓度的增大则主要是提供成膜所需要的氧原子缺乏,从而导致氧空位及其相关缺陷增加. 相似文献
39.
Identification of the pressure-induced phase transition of ZnSe with the positron annihilation method
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This paper studies the pressure-induced phase transition between zincblende (B3) and NaCl (B1) structure ZnSe by using the hydrostatic pressure first-principles pseudopotential plane wave method. The energy-volume and enthalpy-pressure curves are employed to estimate the transition pressure. It is found that ZnSe undergoes a first-order phase transition from the B3 structure to the B1 structure at approximately 15 GPa derived from the energy-volume relation and 14 GPa based on deduction from enthalpy-pressure data. The pressure-related positron bulk lifetimes of the two ZnSe structures are calculated with the atomic superposition approximation method. In comparison with the 13.4% reduction in volume of ZnSe at the transition pressure, the positron bulk lifetime decreases more significantly and the relative value declines up to 22.3%. The results show that positron annihilation is an effective technique to identify and characterize the first-order phase transition and can give valuable information about changes in micro-scale, such as volume shrinkage and compressibility. 相似文献
40.
Twenty pure elemental metal samples have been studied with a coincidence Doppler broadening system (CDB). The results show the relationship between the CDB spectra and the electronic structure of these samples. The experimental results are compared to simple theoretical predictions, which show that the high-momentum part of the Doppler-broadening spectra can be used to distinguish different elements. 相似文献