Transmission Bandwidth Tunability of a Liquid-Filled Photonic Bandgap Fiber

A temperature tunable photonie bandgap fiber （PBGF） is demonstrated by an index-guiding photonic crystal fiber filled with high-index liquid. The temperature tunable characteristics of the fiber are experimentally and numerically investigated. Compression of transmission bandwidth of the PBGF is demonstrated by changing the temperature of part of the fiber. The tunable transmission bandwidth with a range of 250nm is achieved by changing the temperature from 30℃ to 90℃.     

基于线阵InGaAs光电二极管阵列的光纤光栅传感解调

采用线阵InGaAs光电二极管阵列和体相位光栅并结合空分复用和波分复用技术,对光纤光栅传感进行解调.设计了基于线阵InGaAs光电二极管阵列和体相位光栅的光纤光栅传感解调系统,通过系统测试和性能分析,该解调系统解调带宽42 nm,信噪比30 dB,波长偏移测量精确度±15 pm,功率测量精确度为±0.3 dB.基于线阵InGaAs光电二极管阵列和体相位光栅的光纤光栅解调系统不但尺寸小,功耗低,而且具有较高的解调速度.     

一种新颖的高灵敏度光纤光栅带宽调谐机构

设计了一种由一直梁和两个半圆拱组成的开口环结构,并将均匀光纤布拉格光栅斜贴于直梁中间的表面处。对两半圆拱施加与直梁方向平行的应力作用时,光纤光栅受到线性应力场的作用,光纤布拉格光栅即转化为啁啾光纤光栅。该机构实现了光纤光栅带宽的线性调谐,线性度高达0．9982,实验结果与理论分析一致。与以往的带宽调谐机构相比,该机构具有很高的应力灵敏度,在20N力的作用下,可产生约7nm的带宽反射,灵敏度达0．34nm／N。利用环境温度对带宽调谐无影响的特性,采用带宽编码技术,研制出具有温度自动补偿特性、高灵敏度的带宽调谐装置。     

图像三维重构在叶片表面压力测量的应用

PSP(Pressure Sensitive Paint)图像的三维重构即将PSP处理所得二维压力图谱转变为叶片三维模型上的压力分布,其有助于PSP实验结果的分析和压力信息的定量提取。以某叶栅的PSP压力图像为对象进行图像的三维重构,得到了三维叶片模型表面的压力分布,并对三维重构图像进行了误差分析。结果表明:1)将PSP图像进行三维重构以后可以方便压力信息的分析及读取;2)标记点的数量及位置分布对PSP图像的三维重构精度有影响。     

Nano-scale gap filling and mechanism of deposit-etch-deposit process for phase-change material

Ge2Sb2Te5 gap filling is one of the key processes for phase-change random access memory manufacture.Physical vapor deposition is the mainstream method of Ge2Sb2Te5 film deposition due to its advantages of film quality,purity,and accurate composition control.However,the conventional physical vapor deposition process cannot meet the gapfilling requirement with the critical device dimension scaling down to 90 nm or below.In this study,we find that the deposit-etch-deposit process shows better gap-filling capability and scalability than the single-step deposition process,especially at the nano-scale critical dimension.The gap-filling mechanism of the deposit-etch-deposit process was briefly discussed.We also find that re-deposition of phase-change material from via the sidewall to via the bottom by argon ion bombardment during the etch step was a key ingredient for the final good gap filling.We achieve void-free gap filling of phase-change material on the 45-nm via the two-cycle deposit-etch-deposit process.We gain a rather comprehensive insight into the mechanism of deposit-etch-deposit process and propose a potential gap-filling solution for over 45-nm technology nodes for phase-change random access memory.     

星载可见光相机成像仿真建模研究

针对星载可见光相机成像模拟在逼真度和灵活性方面的综合仿真应用需求,研究并提出了一种以三维场景为基础,以光线追踪技术为主要渲染核心,综合考虑卫星轨道和姿态、光照条件、物体光谱特性和周边环境、大气传输、遥感器成像性能等影响因素的全光路成像模拟技术的仿真模型.文中首先从完备性及可扩展性的角度尝试建立了成像仿真系统的综合模型框架,对整个成像链中的各个重要环节进行分层及模块化,并结合目前现有三维技术、光线追踪技术、传感器仿真技术的特点设计各模块之间的调用及接口关系,使其能在较好利用现有计算模型的同时能够对新的算法模型实现有效兼容.随后讨论了模型目前使用的镜头前辐亮度计算模块、光线路径计算模块和传感器效果仿真模块,并针对简单空间探测场景用C++编程语言实现了系统框架和关键模型,生成模拟图像,结果证明该模型在深空光照及大气效果方面有较好的表现,具备较高的仿真度和良好的适应性、扩展性,能够有效支撑卫星光学成像系统的指标论证、算法评估以及效能预估等应用.     

Chemical mechanical planarization of Ge_2Sb_2Te_5 using IC1010 and Politex reg pads in acidic slurry

In the paper, chemical mechanical planarization(CMP) of Ge2Sb2Te5(GST) is investigated using IC1010 and Politex reg pads in acidic slurry. For the CMP with blank wafer, it is found that the removal rate(RR) of GST increases with the increase of pressure for both pads, but the RR of GST polished using IC1010 is far more than that of Politex reg. To check the surface defects, GST film is observed with an optical microscope(OM) and scanning electron microscope(SEM). For the CMP with Politex reg, many spots are observed on the surface of the blank wafer with OM, but no obvious spots are observed with SEM. With regard to the patterned wafer, a few stains are observed on the GST cell, but many residues are found on other area with OM. However, from SEM results, a few residues are observed on the GST cell, more dielectric loss is revealed about the trench structure. For the CMP with IC1010, the surface of the polished blank wafer suffers serious scratches found with both OM and SEM, which may result from a low hardness of GST, compared with those of IC1010 and abrasives. With regard to the patterned wafer, it can achieve a clean surface and almost no scratches are observed with OM, which may result from the high-hardness SiO2 film on the surface, not from the soft GST film across the whole wafer. From the SEM results, a clean interface and no residues are observed on the GST surface, and less dielectric loss is revealed. Compared with Politex reg, the patterned wafer can achieve a good performance after CMP using IC1010.     

掺Y对PbWO4闪烁体的热释光影响

研究了纯PbWO₄和PbWO₄:Y晶体经γ射线辐照和可见光光照前后室温 以上的热释光.发现大剂量辐照后掺Y可以有效地抑制热释光的强度并使热释光峰移向高温, 说明掺Y有利于提高光输出的稳定性.可见光光照也会影响热释光并可以产生新的热释光峰, 这可能是由于光释电子(或空穴)被浅陷阱重新俘获或是光照后产生了新型色心的结果. 关键词： 4')" href="#">PbWO₄ 掺Y 热释光     

CuBrx I1-x闪烁薄膜的制备和发光性能

为了系统地研究Br的引入对CuBr_xI_(1-x)薄膜发光强度和衰减时间的影响,通过气相沉积法在Si片上制备了CuBr_xI_(1-x)(0≤x≤1)闪烁薄膜,并测试了薄膜的发光性能和衰减曲线。结果表明,所制备的样品具有良好的CuBr_xI_(1-x)(0≤x≤1)固溶体结晶性;相对于长波段的深能级发射,CuBr_xI_(1-x)薄膜均表现出较强的光致和X射线激发近带边发射,且发射强度随Br含量的增加而大幅增加,有利于提高闪烁器件的探测效率;不过薄膜的发光衰减时间会随Br含量的增加而变慢(40～300 ps)。本研究工作对于通过选择合适组分的CuBr_xI_(1-x)闪烁材料以平衡探测效率和时间响应的测量需求具有重要意义。     

π-18O非弹性散射

我们在程函扭曲的DWIA框架下,用跃迁密度方法计算了230MeV的π到¹⁸O的2⁺（1.98MeV）激发态上的非弹性散射微分截面,分析了π^-和π⁺截面比,研究了中子半径的变化对微分截面的影响。我们的理论计算结果与实验符合较好。