微机控高精度高压脉冲电源的研制

介绍利用大功率绝缘栅极晶体管(IGBT)配合脉冲升压变压器组成的高精度高压脉冲电源。该电源利用复杂可编程逻辑器件(CPLD)产生触发信号，通过微机、单片机、CPLD实现脉冲频率、脉冲宽度和脉冲个数的微机控制。且脉冲宽度能够以1μs步长增减，满足了脉冲电场非热效应处理技术应用的研究。     

含氚废气净化系统研制

在中子发生器的运行过程中，会释放一定量的氚，为对使用中产生的含氚废尾气进行净化处理，必须研制—套废氚净化处理系统。该系统的研制包括工艺流程设计、流程中各主要反应器的设计及自动控制功能设计等方面。     

Pt-SDB疏水催化剂的研制

基于液相水-氢同位素催化交换的疏水催化剂研究已有近30年历史。从所报道的资料来看，目前用于重水提氚工艺中相转移的疏水催化剂主要集中在Pt-C-PTFE和Pt-SDB两类材料上。前者疏水性好，耐辐照稳定性好，后者催化活性好，但催化剂耐辐照稳定性稍差。拟在特制的SDB疏水材料上制备出催化活性好，性能稳定，满足使用要求的Pt-SDB疏水催化剂。     

Radiation characteristics and implosion dynamics of tungsten wire array Z-pinches on the YANG accelerator

We investigated the radiation characteristics and implosion dynamics of low-wire-number cylindrical tungsten wire array Z-pinches on the YANG accelerator with a peak current 0.8-1.1 MA and a rising time ～ 90 ns.The arrays are made up of(8-32)×5 μm wires 6/10 mm in diameter and 15 mm in height.The highest X-ray power obtained in the experiments was about 0.37 TW with the total radiation energy ～ 13 kJ and the energy conversion efficiency ～ 9%(24×5 μm wires,6 mm in diameter).Most of the X-ray emissions from tungsten Z-pinch plasmas were distributed in the spectral band of 100-600 eV,peaked at 250 and 375 eV.The dominant wavelengths of the wire ablation and the magneto-Rayleigh-Taylor instability were found and analyzed through measuring the time-gated self-emission and laser interferometric images.Through analyzing the implosion trajectories obtained by an optical streak camera,the run-in velocities of the Z-pinch plasmas at the end of the implosion phase were determined to be about(1.3-2.1)×10 7 cm/s.     

聚龙一号装置上首次铝套筒Z箍缩X射线背光照相实验

在聚龙一号脉冲功率装置上首次完成了对带正弦扰动铝套筒Z箍缩的X射线背光照相实验。实验采用千焦耳激光器（1053 nm, 1 kJ, 1 ns）驱动固体靶材产生X射线, 然后利用基于球面晶体的单色背光照相技术以及直接点投影背光照相技术, 成功观测到约7.5 MA电流驱动条件下, Z箍缩铝套筒的外边界不稳定性发展情况。该实验验证了在聚龙一号装置上联合千焦耳激光器开展X射线背光照相实验的能力, 为后续精密Z箍缩物理研究奠定了基础。     

斜入射脉冲X射线产生电流实验

针对斜入射脉冲X射线与金属的几种可能相互作用机制,设计了实验布局,测量了斜入射X射线在金属靶上产生的脉冲电流,建立了相应的理论模型。结果显示,当X射线入射强度低于105 W/cm2时,以光电效应为主,高于此值时,以热电效应为主导。这表明,X射线加载强度较弱时,电子表现出个体行为,而增大X射线入射强度,电子表现出弱关联集体行为。由此可以预测,超强X射线辐照下,金属表面将出现宏观尺度的电荷密度调制,在退激发过程中,这种调制状态可能以较高的效率辐射定向的微波电磁脉冲。     

Towards Fabrication of Atomic Dopant Wires via Monolayer Doping Patterned by Resist-Free Lithography

Fabrication of atomic dopant wires at large scale is challenging.We explored the feasibility to fabricate atomic dopant wires by nano-patterning self-assembled dopant carrying molecular monolayers via a resist-free lithographic approach.The resist-free lithography is to use electron beam exposure to decompose hydrocarbon contaminants in vacuum chamber into amorphous carbon that serves as an etching mask for nanopatterning the phosphorus-bearing monolayers.Dopant wires were fabricated in silicon by patterning diethyl vinylphosphonate monolayers into lines with a width ranging from 1 μm down to 8 nm.The dopants were subsequently driven into silicon to form dopant wires by rapid thermal annealing.Electrical measurements show a linear correlation between wire width and conductance,indicating the success of the monolayer patterning process at nanoscale.The dopant wires can be potentially scaled down to atomic scale if the dopant thermal diffusion can be mitigated.     

Investigation of Bessel beam propagation in scattering media with scalar diffraction method

Bessel beam propagation in scattering media is simulated using the angular spectrum method combined with slice-by-slice propagation model. Generating Bessel beams with a spatial light modulator, which provides a means to adjust flexibly the parameters of the Bessel beam, allows us to validate the simulation results experimentally. The study reveals that the self-reconstructing length changes oppositely with the axicon angle （i.e., the larger the axieon angle, the shorter the self-reconstructing length）. The radius of the incident beam has little influence on the self-reconstruction of the Bessel beam central lobe.     

不同载荷及转速条件下MoS2涂层的摩擦磨损性能研究

为获得二硫化钼(MoS₂)涂层在聚变堆部件表面使用条件下的摩擦磨损特性,采用单极性脉冲磁控溅射技术在铁铬镍基高温合金A286上制备了厚度为2μm的MoS₂涂层,并针对MoS₂涂层在不同载荷及转速条件下的摩擦学性能展开了研究。经验证,沉积的MoS₂涂层结晶度较好,沿(002)面择优取向;随测试转速的增加,摩擦系数逐渐减小,在转速为50r·min^-1时,摩擦系数平均值为0.0722;在转速固定时,摩擦系数随测试载荷的增加先减小后增大,当载荷为7N时达到最小平均值0.0763。     

高C3S水泥硬化浆体水浸取液中离子浓度的变化规律

为了研究高C3S水泥硬化浆体水浸取液中离子浓度与水化条件间的关系,本文利用水浸取法探讨了水化时间、水灰比、水化温度等因素对高硅酸三钙水泥水化硬化体系水浸取液中离子浓度的影响。试验结果表明：浸取液中的各离子浓度和pH值随水化时间的延长、水灰比的增加和养护温度的升高而降低;其中水化14d前离子浓度和pH值下降速度很快,14d下降速度趋缓;各水化条件下离子浓度的大小主要与水化程度、孔隙率和水化产物的溶解相关。该研究对于从离子浓度方面去了解高C3S水泥的水化特点具有一定的指导意义。