Effect of end groups on complexation kinetics between cyclodextrins and guest polymers

α‐Cyclodextrin (α‐CD) has been complexed with various poly(ethylene glycol) (PEG) derivatives in aqueous solution. It has been found that the end groups of PEG derivatives affect the complexation kinetics greatly, but have only a little influence on the thermodynamic behavior. By increasing the hydrophobicity of end groups, the complexation speeds up rapidly. On the other hand, the bulky end groups slow down the threading of polymeric guests into the cavity of CD. By changing the hydrophobicity and the size of end groups, the complexation rate can be adjusted in the range of several orders of magnitudes, which should be quite useful in the design of new supramolecular systems. © 2006 Wiley Periodicals, Inc. J Polym Sci Part B: Polym Phys 44: 2050–2057, 2006     

粒子分辨CCT方法中的δ电子效应

提出了切伦科夫相关时间测量(CCT)中初始粒子在辐射体里产生的δ电子的干扰问题,以及降低干扰的方法. 通过模拟计算给出了北京τ-C工厂探测器初步设计中CCT的π/K分辨本领.     

镨掺杂分布对1.3μm光纤放大器特性影响

对掺氟化镨玻璃光纤放大器的小信号增益，用广义的高斯近似公式可获得精确的分析表达。文中研究了限制光纤芯层中央部分的镨掺杂对光纤放大器特性的影响，结果发现限制镨掺杂分布能改进光纤放大器的工作效率，且截止波长比芯层全部均匀掺镨的光纤更长。     

超稳Y沸石制备技术对沸石铝分布的影响 Ⅱ.均匀铝分布的超稳Y沸石的制备

对水热处理后得到的USY沸石作进一步的酸处理以及采用改进的氟硅酸盐溶液骨架富硅工艺,分别得到了经XPS剖面分析证实为铝分布均匀的超稳Y沸石HAY-Ⅰ和HAY-Ⅱ。IR分析表明,在酸处理过程中从USY沸石中去掉的那部分非骨架铝类与3690cm~(-1)处羟基有关,仍残留在HAY-Ⅰ沸石中的那部分非骨架铝类与3670cm~(-1)和3600cm~(-1)处羟基有关。XRD和化学分析表明HAY-Ⅰ沸石仍含有约50％的非骨架铝类,而HAY-Ⅱ沸石则基本上不含非骨架铝类,HAY-Ⅱ沸石还显示更高的结晶保留度。DTA分析表明,HAY-Ⅰ和HAY-Ⅱ两种沸石的热稳定性均高于USY沸石。     

Continuously chirped DFB gratings by specially bent waveguides fortunable lasers

We have implemented and studied a new type of tunable multiple-section semiconductor distributed feedback (DFB) laser using tailored chirped DFB gratings. Arbitrarily and continuously chirped DFB gratings are defined by bent waveguides on homogeneous grating fields with ultrahigh spatial precision. The mathematical bending functions are optimized in this case to provide enlarged wavelength tuning ranges. We present the results of model calculations, the technological device realization and experimental results of the DFB laser characterization e.g. a tuning range of 5.5 nm without wavelength gaps and high side mode suppression ratio     

淀积条件对GDa—SiNx薄膜电学特性的影响

本文讨论了用辉光放电法制备氮化硅薄膜时衬底温度、射频功率和气体流量比对薄膜的电导率、介电常数和击穿强度的影响。通过优化生长条件，制备了优质非晶氮化硅薄膜，其介电常数为７．５、击穿强度为５．５ＭＶ／ｃｍ、电导率为１０－１３（Ωｃｍ）－１。     

动情期家兔输卵管上皮及其分泌活动的电镜观察

本实验用透射电镜和扫描电镜观察了动情期家兔输卵管上皮。证实分泌细胞和纤毛细胞都有分泌功能，共分泌三种分泌物质。本文对这些分泌物质的分泌方式、分泌活动进行了研究和探讨。另外，发现上皮基膜下方始终有一层成纤维细胞形成的胞质膜伴行，据此，对血一输卵管腔屏障的构成亦进行了讨论。     

微光CCD摄像器件综合特性的分析与比较

ＣＣＤ的优良特性使其在微光电视技术领域得到了广泛运用。本文对各种微光ＣＣＤ摄像器件的综合特性例如信噪比、探测率、动态范围与计数模式等进行了详细的研究与对比，并得出基本结论。     

(NH4)2MoS4在活性炭上浸渍过程的研究:Ⅱ.干燥机理及模型

（ＮＨ＿４）＿２ＭｏＳ＿４在活性炭上浸渍过程的研究Ⅱ．干燥机理及模型秦慧芳，张成芳，陆岗，俞丰，朱子彬（华东理工大学无机化工研究所，上海２００２３７）２３７）关键词硫代钼酸铵，活性炭，干燥，钼分布，干燥模型负载型催化剂的活性组分在载体上的分布，受浸渍...     

Atmospheric and low pressure shadow masked MOVPE growth of InGaAs(P)/InP and (In)GaAs/(Al)GaAs heterostructures and quantum wells

The shadow masked growth technique is presented as a tool to achieve thickness and bandgap variations laterally over the substrate during metalorganic vapor phase epitaxy. Lateral thickness and bandgap variations are very important for the fabrication of photonic integrated circuits, where several passive and active optical components need to be integrated on the same substrate. Several aspects of the shadow masked growth are characterized for InP based materials as well as for GaAs based materials. Thickness reductions are studied as a function of the mask dimensions, the reactor pressure, the orientation of the masked channels and the undercutting of the mask. The thickness reduction is strongly influenced by the mask dimensions and the reactor pressure, while the influence of the orientation of the channels and the amount of undercutting is only significant for narrow mask windows. During shadow masked growth, there are not only thickness variations but also compositional variations. Therefore, we studied the changes in In/Ga and As/P ratios for InGaAs and InGaAsP layers. It appears that mainly the In/Ga-ratio is responsible for compositional changes and that the As/P-ratio remains unchanged during shadow masked growth.