OBE-CDIO理念下“集成电路版图分析与设计”课程教学改革与探索

针对目前集成电路版图分析与设计课程存在教学方法老化、教学模式形式化等问题,本文以OBE-CDIO教育理念为指导,对”集成电路版图分析与设计”课程的课程教学模式、课程设计、项目式教学方式和课程考核方式等方面的改革进行有益的探索与实践。将工程教学认证中对学生的专业毕业要求作为制定教学目标的依据,将BB网络平台、ISO9001等现代化教学资源和质量标准融入课堂教学,采用OBE-CDIO能力教学理念指导课程设计,实现教学环节与考核环节的科学化与多元化,通过引入课程思政激发学生学习热情,树立社会主义核心价值观,全面地培养学生的综合版图分析与设计能力和素养。     

基于度量学习的意图识别和槽填充方法

人机对话中小样本学习场景下的意图识别和槽填充,是自然语言处理的一个重要课题.本文采用基于度量学习的方法,通过计算query set中的样本与support set中样本的距离,寻找距离最近的类别样本作为分类标签,同时将两个任务联合进行训练,用以提升模型的效果.从实验结果中可以得出,本文提出的Fine-tune方法,对意图识别和槽填充任务都有一定的帮助和提升.胶囊网络在意图识别中也起到了一定的效果,可以帮助去除一部分无关信息,但对槽填充任务的帮助不明显;而任务自适应的投影网络,可以更好地将不同类的向量分开,提升了两个任务的性能.     

n维有限射影空间上d~e——析取矩阵的新构作

利用n维有限射影空间上的一些性质,构作了组合群验的数学模型de-析取矩阵,并研究了它的参数和Hamming距离.     

区域导航对流层延迟误差修正模型研究

本文研究了电波大气折射理论，分析了传播误差因素，阐述了区域导航信号的传播路径与 GNSS 卫星导航的不同，论述了对流层延迟对区域导航信号测量精度的影响，设计了满足区域导航系统应用需求的对流层延迟误差修正模型，并通过仿真研究，验证了所设计区域导航对流层延迟误差修正模型的可行性，并给出了该模型在远距离低仰角和近距离高仰角下的误差修正能力。     

应变纤锌矿ZnO/MgxZn1-xO量子点中离子施主束缚激子的光学性质

Within the framework of the effective-mass approximation and the dipole approximation, considering the three-dimensional confinement of the electron and hole and the strong built-in electric field(BEF) in strained wurtzite Zn O/Mg0:25Zn0:75O quantum dots(QDs), the optical properties of ionized donor-bound excitons(D+, X)are investigated theoretically using a variational method. The computations are performed in the case of finite band offset. Numerical results indicate that the optical properties of(D+, X) complexes sensitively depend on the donor position, the QD size and the BEF. The binding energy of(D+, X) complexes is larger when the donor is located in the vicinity of the left interface of the QDs, and it decreases with increasing QD size. The oscillator strength reduces with an increase in the dot height and increases with an increase in the dot radius. Furthermore, when the QD size decreases, the absorption peak intensity shows a marked increment, and the absorption coefficient peak has a blueshift. The strong BEF causes a redshift of the absorption coefficient peak and causes the absorption peak intensity to decrease remarkably. The physical reasons for these relationships have been analyzed in depth.     

减压扩散高阻密栅技术应用研究

本文对减压扩散机理及高阻密栅技术作了详细的分析,并就设备及工艺方面的关键技术进行了阐述,最后对减压扩散高方阻工艺及密栅匹配技术电池效率进行了对比分析,有以下结论:(1)减压扩散在工艺优化后,方阻均匀性得到大幅改善,达到3;以内.(2)减压扩散电池效率完全可达到常规产线的水平,且在高阻密栅方面更有优势,可有效提升太阳电池效率.     

零维到三维结构中三核铜自旋阻挫簇单元的磁构关系和反对称交换

量子自旋液体是最近几年刚被人们证实除铁磁体、反铁磁体之外的第三种磁性类型,因其有望解释高温超导的运行机制、改变计算机硬盘信息存储方式而在物理、材料等领域备受关注。自旋阻挫作为量子自旋液体的最小单元可能是解开量子自旋液体诸多问题的钥匙,所以在磁学、电学研究领域再一次成为人们研究的热点。基于文献报道的三核铜配合物[Cu3(μ3-OH)(μ-OPz)3(NO3)2(H2O)2]·CH3OH(1),我们合成了三维金属有机框架配合物{[Ag(HOPz)Cu3(μ3-OH)(NO3)3(OPz)2Ag(NO3)]·6H2O}n(2)(HOPz=甲基(2-吡嗪基)酮肟),并从自旋阻挫的角度对二者磁性质进行对比和详细分析。磁化率数据表明自旋间有很强的反铁磁相互作用和反对称交换。通过包含各向同性和反对称交换的哈密顿算符对两者磁学数据进行拟合并研究其磁构关系,所获最佳拟合参数为:配合物1:Jav=-426 cm^-1,g⊥=1.83,g∥=2.00;配合物2:Jav=-401 cm^-1,g⊥=1.85,g∥=2.00。     

THE effect of Srandom DOPANT fluctuation on threshold voltage and drain current variation in junctionless nanotransistors

We investigate the effect of dopant random fluctuation on threshold voltage and drain current variation in a two-gate nanoscale transistor. We used a quantum-corrected technology computer aided design simulation to run the simulation (10000 randomizations). With this simulation, we could study the effects of varying the dimensions (length and width), and thicknesses of oxide and dopant factors of a transistor on the threshold voltage and drain current in subthreshold region (off) and overthreshold (on). It was found that in the subthreshold region the variability of the drain current and threshold voltage is relatively fixed while in the overthreshold region the variability of the threshold voltage and drain current decreases remarkably, despite the slight reduction of gate voltage diffusion (compared with that of the subthreshold). These results have been interpreted by using previously reported models for threshold current variability, load displacement, and simple analytical calculations. Scaling analysis shows that the variability of the characteristics of this semiconductor increases as the effects of the short channel increases. Therefore, with a slight increase of length and a reduction of width, oxide thickness, and dopant factor, we could correct the effect of the short channel.