高可靠镀Ni／Au工艺及其在微波PTFE电路上的应用

介绍了高可靠电镀Ｎｉ／Ａｕ工艺在ＰＴＦＥ微波印制电路上的应用，并分析了氨基磺酸盐镀软镍和亚硫酸盐镀软金工艺的影响因素及提高Ｎｉ／Ａｕ镀层之间附着力的措施。通过实验及应用证明了与直接镀金工艺相比，在软基材ＰＴＦＥ敷铜箔板上镀Ｎｉ／Ａｕ工艺能大大提高微波电路的可焊性，高温稳定性和长期可靠性，并且用其所制作的微波器件的高频性能也优于直接镀金工业。     

羰基镍分析报警仪

羰基镍分析报警仪运用化学发光原理构成，不仅适用于羰基镍生产车间现场的检测和报警，也适于实验室的研究工作。检出限达0.037mg/m^3(0.5ppb），响应时间2min。     

F／Cl比与Eu~（2＋）：BaFCl中F色心的浓度和光激励截面的关系

研究了Ｅｕ（２＋）：ＢａＦｘＣｌ２在紫外线辐照下的光激励发光。通过改变激励方式及激励光的扫描方向，给出了Ｅｕ（２＋）：ＢａＦｘＣｌ２－ｘ光激励发光过程中，两种Ｆ色心的浓度比值与光激励截面比值的测定方法。利用这种测定方法，进一步研究了两种Ｆ色心的浓度比值和光激励截面比值与Ｆ／ＣＩ比值的关系。     

Analysis of dispersion characteristics for a circular dielectric waveguide with periodic metallic strips by using the method of lines

The dispersion characteristics of circular dielectric waveguide with periodic metallic strips are analyzed by the method of lines. The filter property of the metallic strip loaded structure is carefully investigated for both TE and TM modes. The brillioum diagrams for both TE₀₁ and TM₀₁ modes are given. A comparison is made between the results obtained by Galerkin's method and those calculated with the method of lines, and very good agreement has been found; the accuracy of the present method is thus justified. On the basis of the analysis, some useful guidelines for the design of the bandreject filters are suggested.     

The importance of electrochemistry-related etching in thegate-groove fabrication for InAlAs/InGaAs HFETs

For the first time, the surface metal on nonalloyed ohmic electrodes is found to significantly change the profiles of gate grooves, when resist openings are employed to monitor drain current during wet-chemical gate recess for sub-micron InAlAs/lnGaAs heterojunction field-effect transistors (HFETs). The surface metal of Ni enhances the etching rate in comparison with that in the absence of electrodes by a factor of 4 and 10, laterally and vertically, which is favorable to fabricate deep gate grooves with small side etching. The Pt surface metal, however, leads to preferential etching of InGaAs over InAlAs, which can be useful to realize large side etching. The existence of an electrochemistry-related etching component, which arises when the ohmic electrodes are present during recess etching, is considered to be responsible for these behaviors     

复杂目标近场电磁散射的可视化计算方法

首次介绍了复杂目标近场散射计算的可视化方法。采用非均匀有理Ｂ样条曲面（ＮＵＲＢＳ）精确构造任意形状散射体，结合几何体近场透视变换和Ｚ－Ｂｕｆｆｅｒ技术实现了基于Ｗｉｎｄｏｗｓ平台的近场散射计算。提出广义雷达散射截面的概念并给出的若干算例。该方法充分利用了计算机３Ｄ图形设备的几何运算能力，运算速度快，严谨高，可扩展性好。     

Analysis of a resonant-cavity enhanced GaAs/AlGaAs MSMphotodetector

The authors have developed a 2-D device simulator for heterostructure metal-semiconductor-metal (MSM) photodetectors. They have incorporated a model of multilayer optics into the simulator and used it to analyze the temporal response of a resonant-cavity enhanced heterostructure with a confining buffer layer and a distributed Bragg reflector (DBR). The authors show that through fine tuning the layer thicknesses, optical resonance enhancement of the light absorption can be obtained     

Diffraction characteristics of superimposed holographic gratings inplanar optical waveguides

A coupled-mode analysis of superimposed holographic transmission gratings in single-mode planar optical waveguides is presented. The diffraction characteristics are shown to be sensitive to the polarization of the incident wave, the angular separation of the output waves and the relative index modulation between the gratings. The coupling between gratings affects the diffraction efficiencies and decreases the angular and wavelength selectivities. Nevertheless, good channel separation and high fanout can be obtained together     

一类非线性单调型方程的区域分裂法

本文考虑了一类非线性单调问题的加性Schwgrz交替法和异步平行算法,并得到了在能量模意义下的收敛性结果,最后还讨论了格式的有限元离散。     

光孤子相互作用对压缩态的影响

在线性近似条件下，量子化了非线性薛定谔方程，用后向传播法数值求解了光孤子相互作用对压缩比的影响。数值结果表明，在碰撞距离附近，压缩比显著增加。