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161.
GaAs亚微米自对准工艺技术研究 总被引:2,自引:2,他引:0
总结了在50mmGaAs圆片上实现自对准介质膜隔离等平面工艺技术的研究,着重描述了离子注入、自对准亚微米难熔栅制备、钝化介质膜生长、干法刻蚀、电阻和电容制备等关键工艺的研究结果。这套工艺的均匀性、重复性好,在50mmGaAs圆片上获得了满意的成品率。采用这套工艺已成功地研制出多种性能良好的GaAsIC和GaAs功率MESFET,证明国家自然科学基金委员会这一重大课题的选择对发展我国GaAsIC确实具有重大意义。 相似文献
162.
2~12GHz GaAs单片行波放大器 总被引:1,自引:1,他引:0
报道了一个全平面超宽带GaAs单片行波放大器的研究结果。该单片电路的核心部件是四个300μm栅宽的MESFET,整个电路拓扑结构简单,芯片面积为3.0mm×1.8mm。电路经优化设计后在2~12GHz范围内,小信号增益为5±1dB,输入输出电压驻波比≤1.75。上述频率范围内输出功率≥16dBm,噪声系数≤8dB。采用全离子注入、全平面工艺,均匀性、一致性良好。实验结果与设计预计值十分一致。 相似文献
163.
164.
165.
The author demonstrates a simple technique that extracts average doping concentration in the polysilicon and silicon near the oxide in a metal/polysilicon/oxide/silicon system. The technique is based on the maximum-minimum capacitance method on two large area structures-one MOSFET and one MOSC (MOS capacitor). The technique is simple and reliable since only three data points in the C-V data are required-two points in MOSC C-V and one point in MOSFET C-V. The technique avoids inaccuracy caused by interface traps at the polysilicon/oxide and the oxide/silicon interface. The technique can be implemented into fab routine electric-test procedures for simultaneously monitoring change of doping concentration in polysilicon and silicon during process development 相似文献
166.
Shye Lin Wu Chung Len Lee Tan Fu Lei Chen C.F. Chen L.J. Ho K.Z. Ling Y.C. 《Electron Device Letters, IEEE》1994,15(4):120-122
In this study, it is demonstrated that the incorporation of fluorine can enhance poly-Si/Si interfacial oxide break-up in the poly-Si emitter contacted p+-n shallow junction formation. The annealing temperature for breaking up the poly-Si/Si interfacial oxide has been found to be as low as 900°C. As a result, the junction depth of the BF2-implanted device is much larger than that of the boron-implanted device 相似文献
167.
Yu-Zung Chiou Yan-Kuin Su Shoou-Jinn Chang Yi-Chao Lin Chia-Sheng Chang Chin-Hsiang Chen 《Solid-state electronics》2002,46(12):2227-2229
InGaN/GaN multiquantum well (MQW) p–n junction photodetectors with semi-transparent Ni/Au electrodes were fabricated and characterized. It was found that the fabricated InGaN/GaN MQW p–n junction photodetectors exhibit a 20 V breakdown voltage and a 3.5 V forward 20 mA turn on voltage. It was also found that the photocurrent to dark current contrast ratio is higher than 105 when a 0.4 V reverse bias was applied to the InGaN/GaN MQW p–n junction photodetectors. Furthermore, it was found that the maximum responsivity was 1.28 and 1.76 A/W with a 0.1 and 3 V applied reverse bias, respectively. 相似文献
168.
YBa2Cu3O7-δ and Tl2Ba2CaCu2O8 thin films for microwave filters were synthesized by pulsed laser deposition and the two-step thalliation process. Substrate
quality requirements and the relation of thin film morphology, microstructure with microwave surface resistance were discussed. 相似文献
169.
Design of a 3780-point IFFT processor for TDS-OFDM 总被引:2,自引:0,他引:2
Zhi-Xing Yang Yu-Peng Hu Chang-Yong Pan Lin Yang 《Broadcasting, IEEE Transactions on》2002,48(1):57-61
This correspondence presents a design of 3780-point IFFT processor for TDS-OFDM terrestrial DTV transmitter using FPGA. It demonstrates the algorithm design and error analysis of the processor, which can achieve a throughput of 7.56M complex IFFT operations per second. This design meets the signal-to-quantization noise ratio requirement of the TDS-OFDM system. It consists of two FPGA and one dual-port RAM. The data stream pipeline algorithm is implemented 相似文献
170.
Hayden J.D. Taft R.C. Kenkare P. Mazure C. Gunderson C. Nguyen B.-Y. Woo M. Lage C. Roman B.J. Radhakrishna S. Subrahmanyan R. Sitaram A.R. Pelley P. Lin J.-H. Kemp K. Kirsch H. 《Electron Devices, IEEE Transactions on》1994,41(12):2318-2325
An advanced, high-performance, quadruple well, quadruple polysilicon BiCMOS technology has been developed for fast 16 Mb SRAM's. A split word-line bitcell architecture, using four levels of polysilicon and two self-aligned contacts, achieves a cell area of 8.61 μm2 with conventional I-line lithography and 7.32 μm2 with I-line plus phase-shift or with deep UV lithography. The process features PELOX isolation to provide a 1.0 μm active pitch, MOSFET transistors designed for a 0.80 μm gate poly pitch, a double polysilicon bipolar transistor with aggressively scaled parasitics, and a thin-film polysilicon transistor to enhance bitcell stability. A quadruple-well structure improves soft error rate (SER) and allows simultaneous optimization of MOSFET and bipolar performance 相似文献