采用Authorware 5制作现代光学实验多媒体课件

我们采用目前最流行的多媒体制作软件Authorware 5开发工具，把现代光学实验原理，公式推导，实验内容，步骤等字材料，以及用CCD采集的干涉图像，优美的背景音乐及解说词等多种数学信息，制作成多媒体课件，可直接用于远程教育，有较大的实用价值。     

VHF-PECVD制备微晶硅材料的均匀性及其结构特性的分析

采用VHF-PECVD技术在多功能系统(cluster tool)中制备了系列硅薄膜，研究薄膜的均匀性及电学特性和结构特性。结果表明：气压和功率的合理匹配对薄膜的均匀性有很大的影响；材料的喇曼测试和电学测试结果表明微晶硅薄膜存在着纵向的结构不均匀，在将材料应用于器件上时，必须要考虑优化合适的工艺条件；硅烷浓度大，相应制备薄膜的晶化程度减弱，即薄膜中非晶成分增多。     

基于Web的选课支持系统

为了在选课之前给予学生充分的信息支持,使选课更有针对性和透明性,建设基于Web的选课支持系统是一项有意义的工作.提出了系统的三层体系结构及系统构成,分析了各子系统的功能,给出系统实现的关键技术,运行实践表明,该系统具有很好的信息支持效果.     

PINNING EFFECT OF LEAD LANTHANUM TITANATE THIN FILMS DEPOSITED ON DIFFERENT SUBSTRATES

Pinning effect of lead lanthanum titanate (PLT) ferroelectric thin films with excess PbO of 20 mol% has been studied for deposition on diffe rent substrates. Silicon, sapphire and quartz were used as substrates on which P t/Ti or LaNiO₃ thin films were deposited as bottom electrodes. Electron probe analysis results showed that there was still a certain amount of excess Pb in PLT films after annealing at 550 ℃ for 1 h, and the amount of it was dependent on the substrate used. The distribution of excess Pb in the films was investig ated by Auger electron spectroscopy depth profile. It was shown that the substrates and the bottom electrodes had significant effects on the content and distrib ution of excess Pb in PLT films. The excess Pb and its accumulation at the inter face between the film and bottom electrode may act as pinning centers and have a pinning effect on domains, which can be observed by abnormal P-E hysteresis loops and abnormal C-V curves. The excess Pb content in the films and the accumulation of Pb at the interface were high in PLT films deposited on Pt/Ti/S i, and considerable pinning effect was observed. As LaNiO₃ would absorb most part of the excess Pb in PLT films, the content of excess Pb in the films deposited on LaNiO₃/Si was very low and the pinning effect was hardly observed.     

p-τ值对COIL的影响的实验研究

 实验研究了单重态氧发生器（SOG）的p-τ值，即初始氯气分压与停留时间的乘积，对化学氧碘激光器（COIL）的影响，并分析了诸多实验因素对SOG的p-τ值的影响。对于提高COIL的化学效率具有很重要的实际意义。     

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The main circuit topology, control hardware and control sequence of the cathode filament power supply for the HL-2A neutral beam heating system was introduced. Feedback control simulation of main circuit of filament power supply is carried out through MATLAB simulation software. It is found that the ripple factor is about 1%when the current is about 1000A, and the ripple coefficient increases to 3% when the current drops to 200A. Without the AC filter reactor in series L₁ and parallel harmonic filter LC in the low level control cabinet, the output current ripple coefficient becomes larger obviously. It shows that L₁ and LC not only absorb harmonic current, but also filter the chopper waveform after AC voltage regulation to make the output waveform smoother.     

ZI纵向计数数据模型的影响分析

基于EM算法和Laplace逼近, 本文给出了研究ZI (即含0较多的)纵向计数数据模型的影响分析方法. 为了识别含0较多的分组计数数据中的强影响点, 本文将ZI纵向数据模型中取值为0的数据赋予一定的权重; 而把随机效应看作缺失数据; 在此基础上引入EM算法, 从而应用完全数据对数似然函数的条件期望以及相应的$Q$距离函数进行影响分析; 并进一步应用Laplace逼近方法简化EM算法中的积分计算. 在此基础上, 基于数据删除模型和局部影响分析方法导出了适用于ZI纵向计数数据模型的诊断统计量. 本文也通过实际计数数据的例子验证了诊断统计量的有效性.     

一种高效可控恒流源

提出了一个设计高效可控恒流源方案.首先分析了影响其效率的各种因素,提出了提高效率的途径和方法.其次又给出应用微机实现双回路的测控方法及数学模型,该方案已成功的应用于某些专用设备中.     

金属氧化物薄膜的多离子束反应共溅射模型(Ⅱ)——数值计算与结果讨论

结合实验中的工艺技术参数,以Pb,Ti两金属靶的反应共溅射为例,对我们提出的金属氧化物薄膜的多离子束反应共溅射模型进行数值计算,分别得出了各靶的溅射速率R,反应腔中反应气体分压p以及衬底Pb,Ti的金属单质和氧化物所占的有效面积百分比与反应共溅射中直接可调的物理量,即反应气体总量Q和溅射离子束流J的关系.计算结果表明,该模型揭示了反应溅射具有滞回效应的本质特征,反映了反应共溅射中相关参数的相互影响与相互耦合的特点,给出了薄膜中组分原子百分比及其氧化物的形态与溅射工艺的关系,指出了多离子束反应共溅射中稳恒溅 关键词：     

超导／半导兼容材料的制作及性能分析

介绍了几种结构合理的超导／半导兼容材料的制作技术及其测试结果，重点讨论了超导体（ＹＢＣＯ）与半导体（Ｓｉ，ＣａＡｓ）间缓冲层的选取，并对这几种复合材料的性能作了较详细的分析。