全文获取类型
收费全文 | 28239篇 |
免费 | 276篇 |
国内免费 | 138篇 |
专业分类
化学 | 13146篇 |
晶体学 | 452篇 |
力学 | 677篇 |
综合类 | 7篇 |
数学 | 2179篇 |
物理学 | 8875篇 |
无线电 | 3317篇 |
出版年
2017年 | 195篇 |
2016年 | 333篇 |
2015年 | 216篇 |
2014年 | 364篇 |
2013年 | 1069篇 |
2012年 | 796篇 |
2011年 | 918篇 |
2010年 | 631篇 |
2009年 | 639篇 |
2008年 | 937篇 |
2007年 | 1063篇 |
2006年 | 988篇 |
2005年 | 912篇 |
2004年 | 836篇 |
2003年 | 755篇 |
2002年 | 747篇 |
2001年 | 979篇 |
2000年 | 780篇 |
1999年 | 608篇 |
1998年 | 538篇 |
1997年 | 489篇 |
1996年 | 507篇 |
1995年 | 566篇 |
1994年 | 532篇 |
1993年 | 516篇 |
1992年 | 552篇 |
1991年 | 518篇 |
1990年 | 501篇 |
1989年 | 540篇 |
1988年 | 445篇 |
1987年 | 406篇 |
1986年 | 427篇 |
1985年 | 518篇 |
1984年 | 518篇 |
1983年 | 389篇 |
1982年 | 413篇 |
1981年 | 434篇 |
1980年 | 405篇 |
1979年 | 403篇 |
1978年 | 410篇 |
1977年 | 393篇 |
1976年 | 386篇 |
1975年 | 345篇 |
1974年 | 342篇 |
1973年 | 365篇 |
1972年 | 225篇 |
1971年 | 190篇 |
1968年 | 219篇 |
1967年 | 357篇 |
1966年 | 309篇 |
排序方式: 共有10000条查询结果,搜索用时 15 毫秒
151.
Hiroshi Ito Masaki Okazaki Dolores C. Miller 《Journal of polymer science. Part A, Polymer chemistry》2004,42(6):1478-1505
Radical copolymerizations of electron‐deficient 2‐trifluoromethylacrylic (TFMA) monomers, such as 2‐trifluoromethylacrylic acid and t‐butyl 2‐trifluoromethylacrylate (TBTFMA), with electron‐rich norbornene derivatives and vinyl ethers with 2,2′‐azobisisobutyronitrile as the initiator were investigated in detail through the analysis of the kinetics in situ with 1H NMR and through the determination of the monomer reactivity ratios. The norbornene derivatives used in this study included bicyclo[2.2.1]hept‐2‐ene (norbornene) and 5‐(2‐trifluoromethyl‐1,1,1‐trifluoro‐2‐hydroxylpropyl)‐2‐norbornene. The vinyl ether monomers were ethyl vinyl ether, t‐butyl vinyl ether, and 3,4‐dihydro‐2‐H‐pyran. Vinylene carbonate was found to copolymerize with TBTFMA. Although none of the monomers underwent radical homopolymerization under normal conditions, they copolymerized readily, producing a copolymer containing 60–70 mol % TFMA. The copolymerization of the TFMA monomer with norbornenes and vinyl ethers deviated from the terminal model and could be described by the penultimate model. The copolymers of TFMA reported in this article were evaluated as chemical amplification resist polymers for the emerging field of 157‐nm lithography. © 2004 Wiley Periodicals, Inc. J Polym Sci Part A: Polym Chem 42: 1478–1505, 2004 相似文献
152.
Collaborative filtering (CF) involves predicting the preferences of a user for a set of items given partial knowledge of the user's preferences for other items, while leveraging a database of profiles for other users. CF has applications e.g. in predicting Web sites a person will visit and in recommending products. Fundamentally, CF is a pattern recognition task, but a formidable one, often involving a huge feature space, a large data set, and many missing features. Even more daunting is the fact that a CF inference engine must be capable of predicting any (user-selected) items, given any available set of partial knowledge on the user's other preferences. In other words, the model must be designed to solve any of a huge (combinatoric) set of possible inference tasks. CF techniques include memory-based, classification-based, and statistical modelling approaches. Among these, modelling approaches scale best with large data sets and are the most adept at handling missing features. The disadvantage of these methods lies in the statistical assumptions (e.g. feature independence), which may be unjustified. To address this shortcoming we propose a new model-based CF method, based on the maximum entropy principle. For the MS Web application, the new method is demonstrated to outperform a number of CF approaches, including naive Bayes and latent variable (cluster) models, support vector machines (SVMs), and the (Pearson) correlation method. 相似文献
153.
154.
P. Thomsen-Schmidt K. Hasche G. Ulm K. Herrmann M. Krumrey G. Ade J. Stümpel I. Busch S. Schädlich A. Schindler W. Frank D. Hirsch M. Procop U. Beck 《Applied Physics A: Materials Science & Processing》2004,78(5):645-649
High-accuracy film thickness measurements in the range below 100 nm can be made by various complex methods like spectral ellipsometry (SE), scanning force microscopy (SFM), grazing incidence X-ray reflectometry (GIXR), or X-ray fluorescence analysis (XRF). The measurement results achieved with these methods are based on different interactions between the film and the probe. A key question in nanotechnology is how to achieve consistent results on a level of uncertainty below one nanometre with different techniques.Two different types of thickness standards are realised. Metal film standards for X-ray techniques in the thickness range 10 to 50 nm are calibrated by GIXR with monochromatised synchrotron radiation of 8048 eV. The results obtained at four different facilities show excellent agreement. SiO2 on Si standards for SE and SFM in the thickness range 6 to 1000 nm are calibrated by GIXR with monochromatised synchrotron radiation of 1841 eV and with a metrological SFM. Consistent results within the combined uncertainties are obtained with the two methods. Surfaces and interfaces of both types of standards are additionally investigated by transmission electron microscopy (TEM). PACS 61.10.Kw; 68.55.Jk; 06.20.Fn; 06.60.Mr; 07.79.Lh 相似文献
155.
156.
We give several new constructions for moderate rank elliptic curves over Q(T). In particular we construct infinitely many rational elliptic surfaces (not in Weierstrass form) of rank 6 over Q using polynomials of degree two in T. While our method generates linearly independent points, we are able to show the rank is exactly 6 without having to verify the points are independent. The method generalizes; however, the higher rank surfaces are not rational, and we need to check that the constructed points are linearly independent. 相似文献
157.
158.
U. M. Dzhemilev A. G. Ibragimov V. A. D’yakonov R. A. Zinnurova 《Russian Journal of Organic Chemistry》2007,43(2):176-180
Treatment of internal acetylenes and allenes with BuMgHlg (Hlg = Cl, Br) in the presence of Cp2ZrCl2 selectively leads to the formation of substituted magnesacyclopenta-2,4-dienes and alkylidenemagnesacyclopentenes. 相似文献
159.
160.
M.C. Ubaldi V. Stasi U. Colombo D. Piccinin M. Martinelli 《Photonics and Nanostructures》2007,5(2-3):145-148
Roughness reduction of a submicron waveguide profile in chemically amplified negative resist is here performed by proper selection of an alkali-based developer, taking into account that its smaller molecules lead to smoother resist surface by altering the developing mechanism of aggregate extraction performed with standard quaternary ammonium hydroxide. Roughness is then analyzed by means of classical Atomic Force Microscope inspection; furthermore, a non-invasive line edge roughness analysis approach based on top-down scanning electron microscope acquisition gives comparable results, in terms of standard deviation and molecular aggregate periodicity. 相似文献