半导体量子点中极化子的有效质量

研究了半导体量子点中极化子的有效质量.采用改进的线性组合算符方法,导出在电子-体纵光学声子(LO)强耦合时抛物量子点中极化子的振动频率、相互作用能和有效质量随受限强度和电子-声子耦合强度的变化.对RbCl晶体量子点进行了数值计算,结果表明,量子点受限越强,半导体量子点中强耦合极化子的振动频率和有效质量就越大;极化子的相互作用能随受限强度的增加先急剧增加,当达到极值后,随受限强度的增加而急剧减少     

WPAN/WLAN应用环境下基于PER的链路自适应算法

本文重点研究基于包错误率测量的链路自适应算法，分析了包错误率与信道参数的关系，提出了一种有别于固定门限值方案的优化门限值方案。仿真结果表明，优化门限值方案的网络吞吐量要大于固定门限值方案和基于信干比估计的链路自适应算法，最大增幅可达12Mbit/s。在系统引入重传机制后，网络吞吐量将有所损失，但最大不超过1Mbit/s，相比较服务质量的提高是值得的。需指出的是，虽然分析和仿真均以HIPERLAN／2为例，但不失一般性，它们同样适合于WPAN/WLAN等类似系统。     

Towards implementation of a nickel silicide process for CMOS technologies

In this paper, we review some of the advantages and disadvantages of nickel silicide as a material for the electrical contacts to the source, drain and gate of current and future CMOS devices. We first present some of the limitations imposed on the current cobalt silicide process because of the constant scaling, of the introduction of new substrate geometries (i.e. thin silicon on insulator) and of the modifications to the substrate material (i.e. SiGe). We then discuss the advantages of NiSi and for each of the CoSi₂ limitations, we point out why Ni is believed to be superior from the point of view of material properties, miscibility of phases and formation mechanisms. Discussion follows on the expected limitations of NiSi and some of the possible solutions to palliate these limitations.     

变换域数字水印处理技术

数字水印是信息安全领域的一项新技术,给出了相对明确的定义。着重分析了变换域数字水印系统的特征及常见攻击,给出了一些相应的对策。最后指出变换域水印的重要问题,即频率的选择问题。     

不同注F剂量与CMOS运放电路辐照损伤的相关性

在不同注F剂量条件下,对P沟和N沟两种不同差分对输入CMOS运放电路的电离辐照响应进行了研究.分析比较了注F和未注F运放电路电离辐照响应之间的差异.结果表明,在栅场介质注入适量的F,可有效抑制辐照感生的氧化物电荷尤其是界面态的增长,从而提高CMOS运放电路的抗辐照特性.     

Analysis on X-Ray Laser Generation with EM-Wave Wiggler

The possibility of realizing SASE Free Election Laser in x-ray waveband with EM-wave wiggler is studied in this paper. SASE effect including saturation length, saturation power and nonlinear process is explored through a 3-D simulation code. A utilization of seed light from laser plasma x-ray is also analyzed, which demonstrates the feature of shortening the interaction length for saturation. The results show that sizeable output power of x-ray laser would be generated with a middle energy electron beam.     

完全非相干白光一维光生伏打暗空间孤子

使用白炽灯作光源在LiNbO₃∶Fe晶体内实验观察到一维白光光生伏打暗空间孤 子. 由奇数 和偶数初始条件分别产生了灰孤子和灰孤子对，它们所感应的波导能导向白光和相干光. 用 相干光清楚地探测到它们内部的多模结构. 该实验证明了白光光生伏打暗空间孤子的存在， 并指出了用完全非相干的白光暗孤子控制和导向相干光的可能性. 关键词： 光生伏打效应 自陷 完全非相干孤子 波导     

Discrete Wavelet Transform: Architectures, Design and Performance Issues

Due to the demand for real time wavelet processors in applications such as video compression [1], Internet communications compression [2], object recognition [3], and numerical analysis, many architectures for the Discrete Wavelet Transform (DWT) systems have been proposed. This paper surveys the different approaches to designing DWT architectures. The types of architectures depend on whether the application is 1-D, 2-D, or 3-D, as well as the style of architecture: systolic, semi-systolic, folded, digit-serial, etc. This paper presents an overview and evaluation of the architectures based on the criteria of latency, control, area, memory, and number of multipliers and adders. This paper will give the reader an indication of the advantages and disadvantages of each design.     

高温氨化合成GaN微晶

分别利用Ga2O3粉末和Ga2O3凝胶作为Ga源,采用NH3为N源,在950℃下,分别将两种反应物与流动的NH3反应20 min合成了GaN微晶。用X射线衍射(XRD)、扫描电子显微镜(SEM)、选择区电子衍射(SAED)对微晶进行结构、形貌的分析,特别是对两种不同途径合成GaN微晶的XRD进行了分析比较。结果表明,当Ga源温度为950℃时两种不同的合成途径均可得到六方纤锌矿结构的GaN单晶颗粒,在氮化温度为850℃和900℃时,利用Ga2O3粉末作为Ga源,仅有少量的Ga2O3转变为GaN;而采用Ga2O3凝胶作为Ga源,在相同的温度下,大部分凝胶经过高温氨化反应均可转化为GaN。