(NH4)2MoS4在活性炭上浸渍过程的研究:Ⅱ.干燥机理及模型

（ＮＨ＿４）＿２ＭｏＳ＿４在活性炭上浸渍过程的研究Ⅱ．干燥机理及模型秦慧芳，张成芳，陆岗，俞丰，朱子彬（华东理工大学无机化工研究所，上海２００２３７）２３７）关键词硫代钼酸铵，活性炭，干燥，钼分布，干燥模型负载型催化剂的活性组分在载体上的分布，受浸渍...     

CVD金刚石工具膜生长特征SEM观察

本文用不热形变栅状直丝化学气相沉积（ＣＶＤ）法生长金刚石膜，在Ｓｉ及ＷＣ－Ｃｏ硬质合金衬底上金刚石膜晶面显露规律随衬底温度和甲烷浓度而异，经适当表面处理及选择合适的工艺条件，当生长初期衬底上就呈现出良好晶形的沉积膜，衬底与膜之间的粘结力能得到提高。Ｒａｍａｎ谱分析表明此膜仅具有特征金刚石１３３２ｃｍ￣（－１）峰，通过ＳＥＭ观察揭示出盒刚石膜可在表面、侧面及棱上生长，并与衬底有良好的联结。     

Bright Blue Light—emitting Diodes Based on a Novel Fluorescent Dye Containing Heterocyclic Groups

Novel molecular material ,1-benzothiazoly-3-pheny1-pyrazoline (BTPP) was found to function as bright blue light emitting dye in organic electroluminescent device, and its optical and electric characteristics were investigated. This heterovyclic compound exhibited good characteristics of blue photoluminescence and electroluminescence,which had the emission peak at 450nm .The single layer light-emitting devices using BTPP as light -emitting material dispersed in poly(N-vinylcarbazole)(PVK) and double layer ones using PBD as hole block layer above the light-emitting layer were fabricated using conventional spin-casting and vaccum vapour deposition methods. The introduction of PBD has enhanced electron injection and luminance efficiency, compared with the single layer LEDs.     

Spin-relaxation and magnetoresistance in FM/SC/FM tunnel junctions

The effect of spin relaxation on tunnel magnetoresistance (TMR) in a ferromagnet/superconductor/ferromagnet (FM/SC/FM) double tunnel junction is theoretically studied. The spin accumulation in SC is determined by balancing of the spin-injection rate and the spin-relaxation rate. In the superconducting state, the spin-relaxation time τ_s becomes longer with decreasing temperature, resulting in a rapid increase of TMR. The TMR of FM/SC/FM junctions provides a useful probe to extract information about spin-relaxation in superconductors.     

Multivalued differential equations on closed convex sets in Banach spaces

New derivation results for integrands and multifunctions via the Lipschitzean approximations are obtained. Applications to multivalued differential equations on closed convex sets are presented.     

Characterisation of sub-100 nm-MOS-transistors processed by optical lithography and a sidewall-etchback technique

This paper describes the fabrication of NMOS-transistors with a geometric gate length of down to 50 nm using conventional optical lithography and a modified sidewall-etchback process. Based on measurements the transistors are characterised and their device parameters are compared to simulations. Finally the procedures for further optimisation of the process will be explained.     

Lithographic and pattern transfer of a novel deep-UV photoresist: ARCH2

We have developed a novel chemically amplified deep-UV photoresist called ARCH2. ARCH2 displays a resolution of<0.23μm with a DOF of 1.0μm at 0.25μm. This material also displays superior time delay stability (>8 hours). The post exposure bake (PEB) temperature was varied from 100°C to 120°C and the PEB time was varied from 60s to 180s. This had very little effect on the CD of the resist profiles. Preliminary etching experiments in a conventional reactive ion etcher were then carried out using CF₄ to etch TiN. In these experiments the ARCH2 etched at a similar rate as conventional Novolac.     

全球电信界的战略联盟

９０年代初，随着通信向全球化方向发展，发达国家各电信企业纷纷采用联盟的方式，相互联合，发挥各自优势，大举进军全球电信市场。面对这种联盟潮流，想要搭上全球通信的列车，发展中国家应该采取什么措施？坚持什么原则？本文作者对此进行了较深入的分析和研究，并对中国电信的发展提出了建议。     

因子分析在企业竞争力评价中的应用

根据因子分析原理,建立了企业竞争力的规模因子、效益因子和成长因子得分模型。通过现实竞争力和潜在竞争力分析,实现了企业竞争力和可持续发展的评价。