High-density plasma etching of indium-zinc oxide films in Ar/Cl2 and Ar/CH4/H2 chemistries

The dry etching characteristics of transparent and conductive indium-zinc oxide (IZO) films have been investigated using an inductively coupled high-density plasma. While the Cl₂-based plasma mixture showed little enhancement over physical sputtering in a pure argon atmosphere, the CH₄/H₂/Ar chemistry produced an increase of the IZO etch rate. On the other hand, the surface morphology of IZO films after etching in Ar and Ar/Cl₂ discharges is smooth, whereas that after etching in CH₄/H₂/Ar presents particle-like features resulting from the preferential desorption of In- and O-containing products. Etching in CH₄/H₂/Ar also produces formation of a Zn-rich surface layer, whose thickness (∼40 nm) is well-above the expected range of incident ions in the material (∼1 nm). Such alteration of the IZO layer after etching in CH₄/H₂/Ar plasmas is expected to have a significant impact on the transparent electrode properties in optoelectronic device fabrication.     

倾斜下降管气液两相分层流截面含气率的计算与液层高度的预测

分层流是气液两相流中常见的流动型式，分层流中液层高度是计算的基本数据，由于界面波的存在，对液层的测量和预测都很困难．Ｖｌａｃｈｏｓ提出了预测气液两相分层流液层厚度的关系式，但这一关系式并不适用于倾斜下降管气液两相流．本文提出了计算倾斜下降管气液两相分层流截面含气率的理论模型，在这种模型下得到的截面含气率和实验结果符合良好．在大量实验的基础上，考虑了倾角、管径、气液各相折算速度的影响，根据实验数据提出了预测液层厚度的关系式。     

Microstructure effect on microtopography of chemically etched α + β Ti alloys

Microstructure effect on chemical etching behavior of the annealed Ti-6Al-4V and Ti-3Al-2.5V titanium (Ti) alloys was compared with that of unalloyed commercially pure titanium. The microstructural evolution of structure phases after annealing the titanium and its alloys at temperature near and above β transus and followed by furnace cooling to room temperature was studied using optical microscope, scanning electron microscope and X-ray diffraction techniques. The microstructure study illustrates that the heat treatment enhanced partitioning effect allows extensive formation of hemispherical and near spherical pits roughened surface to be readily acquired by chemically etching the annealed α + β titanium alloys. The kinetics of the chemical etching reaction process show a linear dependence on time. The annealed α + β titanium alloys that exhibit relatively lower weight loss and thickness reduction rate illustrate less chemical activity than the annealed unalloyed titanium.     

Matrix model in a class of time dependent supersymmetric backgrounds

We discuss the matrix model in a class of 11D time dependent supersymmetric backgrounds as obtained in [B. Chen, Phys. Lett. B 632 (2006) 393, hep-th/0508191]. We construct the matrix model action through the matrix regularization of the membrane action in the background. We show that the action is exact to all orders of fermionic coordinates. Furthermore we discuss the fuzzy sphere solutions in this background.     

Investigation of the Li1+xV3O8 electrode–organic electrolyte interface by scanning photoelectron microscopy

To investigate the formation of a solid electrolyte interface (SEI) on the Li_1+xV₃O₈ electrode surface in the thermodynamic stability range of the organic electrolyte, we applied scanning photoelectron microscopy (SPEM) to a pristine electrode and to an electrode after ten cycles. The F K-edge absorption spectrum of the cycled electrode showed that LiF forms on the electrode surface during the lithium insertion–extraction process in the Li_1+xV₃O₈/Li cell. The photoelectron spectrum for the cycled electrode showed intense spectral features corresponding to Li 1s, F 2s, F 2p, and P 2p electron signals, whereas these spectral features were of negligible intensity for the pristine electrode. The above results give strong support for the formation of an SEI that consists of LiF and compounds containing phosphorus during operation of the battery. The SPEM images also revealed that the fluorine distribution on the surface of the cycled electrode was inhomogeneous.     

弱导光纤的标量衍射光束特性分析

仿照罗兰圆光学系统构造罗兰球光学系统 ,在罗兰球中简化电磁波的瑞利 索末菲标量衍射积分公式 ,推导出折射率阶跃分布的弱导光纤LP模衍射场分布和空间频谱的计算公式。提出LP0 1模远场衍射分布存在类似于平面波圆孔夫琅禾费衍射艾里斑的中央亮斑概念 ,并给出中央亮斑角半宽度的计算公式。     

基于图像内容的多子波去噪

本文介绍了多子波变换的一般理论及OPTFR多子波的性质,通过改进其一阶平衡器,避免了预滤波,从而简化了运算。在将OPTFR多子波用于图像处理时,采用了一种基于图像内容的阈值方法,实验结果表明,其去噪效果优于CL多子波及一般的阈值方法。     

填充等离子体波纹波导色散曲线计算软件的设计

从一种正弦波纹波导慢波结构的色散方程理论推导出发,设计了在不同结构参数、有无电子注以及填充不同等离子体浓度的情况下,计算其色散曲线的专用软件.该软件除了具有传统的数值计算功能外,提供了一个较为友好的图形用户界面.该界面直接显示该波纹波导的结构图,同时用户可以通过该界面很方便地修改各主要参数,比较不同情况下得到的色散曲线,以获得优化的参数选择.     

利用C++Builder 5.0开发原理框图绘图软件

介绍了原理框图各种图形的数据存储方法，利用C^ Builder5.0开发了原理框图的绘图软件，实现了原理框图绘制的基本功能。