叶绿素衍生物─CPD_4在人血清中的激发和发射荧光谱

叶绿素衍生物４号（ＣＰＤ４）是一种新型中药光敏剂，本文研究了不同浓度的ＣＰＤ４分别在含１０％不同血型人血清的生理盐水中以及纯生理盐水中的激发和发射荧光光谱，并对结果进行了分析，结论对ＣＰＤ４在光动力诊断恶性肿瘤的临床应用具有一定的指导意义．     

低温硅双极晶体管基区优化设计

常规双极晶体管在７７Ｋ下电流增益和频率性能都严重退化。本文首先分析了低温双极晶体管基区Ｇｕｍｍｅｌ数，基区方块电阻，渡越时间和穿通电压等参数与温度及基区掺杂的关系，然后讨论了低温双极器件基区的优化设计问题。     

微机在应变测量中的应用

微机在应变测量中的应用，采用上位机和下位机组合方式．上位机为一台ＩＢＭ－ＰＣ／ＸＴ微机，用于对数据进行后处理．下位机以Ｚ８０－ＣＰＵ为控制器，由传感器、转换器、接口及外设等组成数据采集器，实施对应变、压力和位移等参数的采集、显示和打印（即数据的预处理）．上位机和下位机之间的数据传输，采用串行的方式，通过ＲＳ－２３２接口完成．本文主要以应变的采集处理为例，介绍系统功能、硬件配置及软件设计．     

Mechanism analysis of gate-induced drain leakage in off-state n-MOSFET

An analytical expression for both band-to-band and band-trap-band indirect tunnelings is used to study the gate-induced drain leakage (GIDL) current of MOSFETs measured before and after hot-carrier stress. The voltage and temperature dependence of GIDL are characterized. Both results show that interface traps situated near the midgap participate in the conduction of GIDL, and band-trap-band indirect tunneling could be the major mechanism. This is further supported by the fact that the percentage increase in GIDL induced by hot-carrier stress is about the same as the corresponding increase in interface-trap density. On the other hand, under low-field conditions, trap-assisted Poole–Frenkle emission dominates over tunneling for temperatures even well below room temperature.     

无线数据通信网发展趋势

无线数据通信具有两大发展趋势，即低速的广域移动数据网及高速的局域无线数据网。本文介绍了其技术特点、应用情况和市场前景，分析了无线数据通信传输技术、网络结构和媒质接入控制等问题。     

Design model and guidelines for n-well guard ring in epitaxial CMOS

This work reports the development of design model for n-well guard rings in a CMOS process utilizing a low-doped epitaxial layer on a highly doped substrate. The validity of the model has been judged by a wide range of experimental data measured from the fabricated n-well guard ring structures with guard ring width as parameter. From the model developed, guidelines have been drawn to minimize the guard ring width while critically suppressing the amount of electrons escaping from the guard ring     

Effects of hot carrier induced interface state generation insubmicron LDD MOSFET's

A two-dimensional numerical simulation including a new interface state generation model has been developed to study the performance variation of a LDD MOSFET after a dc voltage stress. The spatial distribution of hot carrier induced interface states is calculated with a breaking silicon-hydrogen bond model. Mobility degradation and reduction of conduction charge due to interface traps are considered. A 0.6 μm LDD MOSFET was fabricated. The drain current degradation and the substrate current variation after a stress were characterized to compare the simulation. A reduction of the substrate current at V_g ≃0.5 V_d in a stressed device was observed from both the measurement and the simulation. Our study reveals that the reduction is attributed to a distance between a maximum channel electric field and generated interface states     

The implementation of time-domain diakoptics in the FDTD method

The time-domain diakoptics is implemented in the finite-difference time-domain (FDTD) method with two types of connecting interfaces: i) directional interface (TLM-type), and ii) total-field interface (FDTD-type). The FDTD-type interface provides a more efficient way to realize time-domain diakoptics than TLM, especially for device optimization problems. To emulate the TLM-type interface in FDTD, two novel algorithms are developed in this paper. One is to implement an ultra-wideband absorbing boundary on the excitation plane during excitation. The other is to separate directional waves without the knowledge of incident waves. For a large circuit with cascaded modules, sequential and parallel algorithms are provided to connect them. With these connecting algorithms, time-domain diakoptics is one candidate method to realize modular and parallel computation in FDTD simulations. The validity of these algorithms is confirmed by comparison with simulated results from Microwave SPICE     

Pd-Ge contact to n-GaAs with the TiW diffusion barrier

Pd-Ge based ohmic contact to n-GaAs with a TiW diffusion barrier was investigated. Electrical analysis as well as Auger electron spectroscopy and the scanning electron microscopy were used to study the contact after it was subjected to different furnace and rapid thermal annealing and different aging steps. All analyses show that TiW can act as a good barrier metal for the Au/Ge/Pd/n-GaAs contact system. A value of 1.45 × 10⁻⁶ Ω-cm² for the specific contact resistance was obtained for the Au/TiW/Ge/Pd/n-GaAs contact after it was rapid thermally annealed at 425°C for 90 s. It can withstand a thermal aging at 350°C for 40 h with its ρ_c increasing to 2.94 × 10⁻⁶Ω-cm² and for an aging at 410°C for 40 h with its ρ_c increasing to 1.38 × 10⁻⁵ Ω-cm².     

Evaluation of absorption and emission cross sections of Er-dopedLiNbO3 for application to integrated optic amplifiers

The polarization-dependent absorption and emission spectra of the ⁴I_13/2-⁴I_15/2 transition (λ~1.5 μm) in single crystal bulk Er:LiNbO₃ have been measured. Low-temperature (10 K) measurements of the Stark split energy levels of these two manifolds indicate at least two Er³⁺ sites. McCumber theory is applied to determine the Er:LiNbO₃ absorption and emission cross sections. These values are used to calculate the gain characteristics of Er:LiNbO₃ channel waveguides. Calculations indicate that a gain of 10 dB is achievable in a waveguide of several centimeters using ~20-mW pump power