首页 | 本学科首页   官方微博 | 高级检索  
文章检索
  按 检索   检索词:      
出版年份:   被引次数:   他引次数: 提示:输入*表示无穷大
  收费全文   191篇
  免费   8篇
化学   52篇
晶体学   5篇
力学   12篇
数学   24篇
物理学   59篇
无线电   47篇
  2023年   1篇
  2022年   3篇
  2021年   3篇
  2020年   4篇
  2019年   3篇
  2018年   3篇
  2017年   4篇
  2016年   2篇
  2015年   9篇
  2014年   3篇
  2013年   11篇
  2012年   10篇
  2011年   7篇
  2010年   8篇
  2009年   6篇
  2008年   12篇
  2007年   13篇
  2006年   15篇
  2005年   7篇
  2004年   7篇
  2003年   8篇
  2002年   3篇
  2001年   4篇
  2000年   4篇
  1999年   2篇
  1998年   2篇
  1997年   3篇
  1996年   3篇
  1995年   1篇
  1994年   3篇
  1990年   2篇
  1989年   4篇
  1988年   2篇
  1987年   1篇
  1986年   3篇
  1985年   3篇
  1983年   4篇
  1982年   1篇
  1981年   2篇
  1980年   2篇
  1979年   4篇
  1978年   1篇
  1977年   2篇
  1976年   1篇
  1973年   1篇
  1972年   1篇
  1970年   1篇
排序方式: 共有199条查询结果,搜索用时 439 毫秒
81.
Here, a simple, nontoxic, and inexpensive “water‐inducement” technique for the fabrication of oxide thin films at low annealing temperatures is reported. For water‐induced (WI) precursor solution, the solvent is composed of water without additional organic additives and catalysts. The thermogravimetric analysis indicates that the annealing temperature can be lowered by prolonging the annealing time. A systematic study is carried out to reveal the annealing condition dependence on the performance of the thin‐film transistors (TFTs). The WI indium‐zinc oxide (IZO) TFT integrated on SiO2 dielectric, annealed at 300 °C for 2 h, exhibits a saturation mobility of 3.35 cm2 V?1 s?1 and an on‐to‐off current ratio of ≈108. Interestingly, through prolonging the annealing time to 4 h, the electrical parameters of IZO TFTs annealed at 230 °C are comparable with the TFTs annealed at 300 °C. Finally, fully WI IZO TFT based on YOx dielectric is integrated and investigated. This TFT device can be regarded as “green electronics” in a true sense, because no organic‐related additives are used during the whole device fabrication process. The as‐fabricated IZO/YOx TFT exhibits excellent electron transport characteristics with low operating voltage (≈1.5 V), small subthreshold swing voltage of 65 mV dec?1 and the mobility in excess of 25 cm2 V?1 s?1.  相似文献   
82.
Solution‐processed metal‐oxide thin films based on high dielectric constant (k) materials have been extensively studied for use in low‐cost and high‐performance thin‐film transistors (TFTs). Here, scandium oxide (ScOx) is fabricated as a TFT dielectric with excellent electrical properties using a novel water‐inducement method. The thin films are annealed at various temperatures and characterized by using X‐ray diffraction, atomic‐force microscopy, X‐ray photoelectron spectroscopy, optical spectroscopy, and a series of electrical measurements. The optimized ScOx thin film exhibits a low‐leakage current density of 0.2 nA cm?2 at 2 MV cm?1, a large areal capacitance of 460 nF cm?2 at 20 Hz and a permittivity of 12.1. To verify the possible applications of ScOx thin films as the gate dielectric in complementary metal oxide semiconductor (CMOS) electronics, they were integrated in both n‐type InZnO (IZO) and p‐type CuO TFTs for testing. The water‐induced full oxide IZO/ScOx TFTs exhibit an excellent performance, including a high electron mobility of 27.7 cm2 V?1 s?1, a large current ratio (Ion/Ioff) of 2.7 × 107 and high stability. Moreover, as far as we know it is the first time that solution‐processed p‐type oxide TFTs based on a high‐k dielectric are achieved. The as‐fabricated p‐type CuO/ScOx TFTs exhibit a large Ion/Ioff of around 105 and a hole mobility of 0.8 cm2 V?1 at an operating voltage of 3 V. To the best of our knowledge, these electrical parameters are among the highest performances for solution‐processed p‐type TFTs, which represents a great step towards the achievement of low‐cost, all‐oxide, and low‐power consumption CMOS logics.  相似文献   
83.
In order to improve the stability of polysilicon thin-film transistors (TFTs) several drain junction architectures have been proposed. In this paper, the hot-carrier (HC) related stability of the lightly doped drain (LDD) TFT architecture is analyzed by using an iterative algorithm that relates the HC induced damage to the carrier injection across the device interfaces with gate and substrate oxide. The resulting creation of interface states and trapped charge is taken into account by using a system of rate equations that implements mathematically the Lais two step model, in which the generation of interface states is attributed to the trapping of hot-holes by centres into the oxide followed by the recombination with hot electrons. The rate equations are solved self-consistently with the aid of a device simulation program. By successive iterations, the time evolution of the interface state density and positive trapped charge distribution has been reconstructed, and the electrical characteristics calculated with this model are in good agreement with experimental data. This algorithm represent an improvement of an already proposed degradation model, in which the interface states formation dynamics is accounted by using a phenomenological approach. The present model has been applied to reproduce the degradation pattern of LDD TFTs and it is found that generation of interface states proceed almost symmetrically on the front and back device interfaces, starting from the points in which the transverse electric field peaks, and moving toward the drain side of the device. The final interface states distribution determines a sort of "bottleneck" in the active layer carrier density, that can explain the sensitivity to HC induced damage of both transfer and output characteristics.  相似文献   
84.
85.
Summary A flow-through optosensing method for hydrogen sulphide analysis is described, which involves reflectance measurements through optical fibres on paper impregnated with lead acetate. Levels as low as 50 ppb H2S could be measured with high reproducibility within 10 s. The response was affected by flow rate and relative humidity, both of which were controlled during the measurement process. The method provides a sensitive real-time analysis of hydrogen sulphide and could be carried out remote from the instrumentation system.
Schwefelwasserstoffbestimmung durch Bleiacetat-imprägniertes Papier mit Hilfe eines optischen Sensors
  相似文献   
86.
Fine structure due to photothermal processes has been studied in the photoconductivity spectrum Si: S. For three levels (transitions of neutral donors with binding energies 109.5, 187.2 and 318.4 meV) excited states up to and including 4 p± are observed with linewidths limited by system resolution (? 0.2 meV). A new level is also tentatively identified with binding energy 0.155 eV. Resonance structure is observed in the continuum spectra of the two deepest levels due to excited state phonon replicas. The effect of electric fields up to 2 kV cm-1 is reported: the threshold shifts to lower energies, and highly excited states disappear, and a new line is observed.  相似文献   
87.
Conferenza tenuta il giorno 27 Aprile 1998  相似文献   
88.
Different drain field architectures have been recently investigated to reduce field-enhanced effects in conventional self-aligned polysilicon thin-film transistor (TFT) architecture, induced by the intense electric fields at the drain junction. Among these, gate overlapped lightly doped drain (GOLDD) architecture has been shown to be effective in reducing the drain field in both on and off states of the TFT, without introducing appreciable series resistance effects. In this paper, we investigate the electrical characteristics, both in the on- and in the off-regime, of GOLDD polysilicon TFTs, made with different LDD doses, by combining experimental data with two-dimensional (2-D) numerical analysis. We also demonstrate that both the on-state and off-state features of the GOLDD structure can be readily understood in terms of a simple, new model, based upon two TFTs series. This is consistent both with the experimental data and the results of full 2-D simulations. This paper not only clarifies the dependence of kink effect, leakage current, and series resistance upon the LDD-doping, but also provides the guidelines to optimize physical parameters of GOLDD TFTs.  相似文献   
89.
90.
Further investigation of global extracts from cultures of the marine deuteromycete Dendryphiella salina leads to the isolation of three novel trinor-eremophilanes esterified by branched C9-carboxylic acids, dendryphiellin B (= (+)-(1R*,2S*,7R*,8aR*)-1,2,6,7,8,8a-hexahydro-7-hydroxy-1,8a-dimethyl-6-oxonaphthalen-2-yl (6R*, 2E, 4E)-6-hydroxy-6-methylocta-2,4-dienoate; (+)- 2 ), dendryphiellin C (=(+)-(1R*, 2S*, 7R*, 8aR*)-1,2,6,7,8,8a-hexa-hydro-7-hydroxy-1,8a-dimethyl-6-oxonaphthalen-2-yl (6S, 2E, 4E)-6-methylocta-2,4-dienoate; (+)- 3 )), and dendryphiellin D (=(+)-(1R*, 2S*, 7R*, 8aR*)-1,2,6,7(8,8a-hexahydro-7-hydroxy-1,8a-dimethyl-6-oxonaphthalen-2-yl (6R*,2E,4E)-6-(hydroxymethyl)octa-2,4-dienoate; (+)- 4 ). An intact eremophilane, dendryphiellin E ( 5 ), and its ethanolysis product dendryphiellin F whose absolute configuration is represented by structural formula (+)- 6 are also isolated from the above extracts. Dendryphiellin E exists as an open form 5a in equilibrium with a closed form 5b . A similar equilibrium exists between the open form 8a and the closed form 8b of a non-esterified eremophilane, dendryphiellin G ( 8 ), which is isolated too from the above extracts and proves structurally related to the cyclic portion of 5 . Finally, the free, branched C9-carboxylic acids dendryphiellic acid A ((+)- 9 ) and B ((+)- 10 ) which correspond to side chains of the above esterified terpenes are also isolated from the above extracts.  相似文献   
设为首页 | 免责声明 | 关于勤云 | 加入收藏

Copyright©北京勤云科技发展有限公司  京ICP备09084417号