多层介质光学膜系的误差分析——膜层厚度变化的灵敏度因子

文中推导了对于给定膜系的特定膜层的厚度变化的灵敏度因子计算公式，并给出了用计算机对不同膜系的计算实例。分析了厚度灵敏度因子对膜系透射光谱的灵敏谱段、灵敏膜层等特性的影响规律，并由此给出了确定膜层厚度允差的方法。     

1477 nm LD泵浦掺铒光纤放大器的研究

报道了采用１４７７ｎｍ激光二极管（ＬＤ）泵浦的掺铒光纤放大器的实验结果。研究了放大器的增益和时域特性。对１５２０ｎｍ的信号光，获得了２３ｄＢ的增益，泵浦效率为２．２８ｄＢ／ｍＷ。低频脉冲信号经过放大器后未发生波形畸变。     

无源微波遥感用于地震预报的实验研究

对无源微波遥感用于地震预报在理论研究的基础上对不同岩性不同结构的岩石试件进行了加载实验，测量了岩石试件的微波辐射随载荷的变化．实验得出：岩石试件的微波辐射能量随岩石应力状态变化而显著变化；而且，不同的波段变化的幅度不同；同一波段不同极化方式的波随应力变化的变化量也不同；微波辐射能量的变化能够被卫星微波遥感探测器探测到．实验还发现，岩石试件临破裂前出现明显的微波辐射异常．     

Interfacial effects on stress distribution in model composites

Raman mechanical spectroscopy was used to examine interfacial effects on the stress distribution in model polydiacetylene fiber/epoxy composites. Epoxy release agents were coated on fiber surfaces to modify the interfacial adhesion properties. The modified fiber surfaces were then characterized by scanning electron microscopy and x-ray photoelectron spectroscopy as well as optical microscopy. No difference in the maximum stress value or stress distribution was observed for the two types of fibers, coated or uncoated, used in composites. This suggests that adhesion properties at the composite interface do not affect tensile stress transfer efficiency nor, therefore, the composite tensile modulus along the fiber axis direction in uniaxial composites. Experimental data were also compared with theoretical calculations assuming perfect bonding between fiber and matrix, and idealized frictional force transfer mechanism at the fiber–matrix interface.     

Plasma immersion ion implantation for SOI synthesis: SIMOX and ion-cut

We have demonstrated feasibility to form silicon-on-insulator (SOI) substrates using plasma immersion ion implantation (PIII) for both separation by implantation of oxygen and ion-cut. This high throughput technique can substantially lower the high cost of SOI substrates due to the simpler implanter design as well as ease of maintenance. For separation by plasma implantation of oxygen wafers, secondary ion mass spectrometry analysis and cross-sectional transmission electron micrographs show continuous buried oxide formation under a single-crystal silicon overlayer with sharp Si/SiO₂ interfaces after oxygen plasma implantation and high-temperature (1300°C) annealing. Ion-cut SOI wafer fabrication technique is implemented for the first time using PIII. The hydrogen plasma can be optimized so that only one ion species is dominant in concentration and there are minimal effects by other residual ions on the ion-cut process. The physical mechanism of hydrogen induced silicon surface layer cleavage has been investigated. An ideal gas law model of the microcavity internal pressure combined with a two-dimensional finite element fracture mechanics model is used to approximate the fracture driving force which is sufficient to overcome the silicon fracture resistance.     

“J—646”新型光学光敏胶胶合工艺简介

“J—646”光敏胶具有透光率好,收缩率小,粘接强度适中,耐老化,毒性小和成本低廉等特点。本文简要介绍了该胶的胶合工艺。     

不同激发密度下CdS晶体的光致发光和受激发射

本文主要研究在77-111K温度范围内、不同激发密度的N2激光器的337.1nm谱线激发下,激子-激子(Ex-Ex)、激子-载流子(Ex-e)的相互作用和发射一个LO声子(Ex-1LO)、两个LO声子(Ex-2LO)的自由激子的辐射复合行为.并在77K温度下观测到由Ex-Ex发射产生的受激发射.     

金催化化学发光新体系——苯并吡喃化学发光分析法测定金矿中的痕量金

本文提出了一种测定矿样中痕量金的化学发光分析法,氯化6,7-二羟基-2,4-二甲基苯并吡喃-H_2O_2化学发光体系,方法的检出限为7ppb。工作曲线线性范围是10～1000ppbAu,测定的相对标准偏差小于7％。应用本法测定矿样中的金,结果良好。