Exposure dose assessment and discussion on radioisotope production and application

The exposure dose status on radioisotope production and application in China has been assessed in the paper. The average annual occupational exposure dose received by workers in the radioisotope production is about one tenth of the annual dose limit in normal situation. It is less than one twentieth for workers in the radioisotope applications. However, the annual collective dose for the latter is higher than the former by one oder of magnitude due to the larger number of workers in the application field. Although the output of radioisotopes increased doubly in 1980's as compared with 1970's, the increase on the annual collective dose was not obvious. For exposure to the public,¹³¹I for example, the collective dose in the radioisotope production decreased by one to two orders of magnitude and the releasing factor reduced by two orders of magnitude. Therefore, the exposure dose received by workers in radioisotope production and application is lower in normal situation. However, the facts worth paying attention to are that there were many events and accidents which happened in the radioisotope applications, especially at the irradiation facilities. The probability of fatal accident was as high as 10^–3 per irradiator year. In order to improve the radiation safety situation, it is imperative to conduct the safety assessment for irradiation facilities, to enhance management of the radioactive wastes and spent sources and to establish the experience feedback system.     

Effects of injector geometry and sample matrix on injection and sample loading in integrated capillary electrophoresis devices

The double-T injector design employed in many microchip capillary electrophoresis devices allows for the formation of very small (50-500 pL) sample plugs for subsequent analysis on-chip. In this study, we show that sample plugs formed at the channel junction can be geometrically defined. The channel width and injector symmetry prove to be of great importance to good performance. A unique pushback of solvent into the side channels can be induced when the side channels have a very low resistance to flow, and this helps to better define the injected sample plug. Samples and running buffers of differing ionic strength (e.g., 10 mM KCl buffer and 20 mM KCl sample) can yield widely variable results in terms of plug shape and amount injected (variations of 1.5 to 10x). Applying bias voltages to all the intersecting channels aids in controlling the plug shape. However, when the ionic strengths of buffer and sample are not matched, the actual amount injected (up to 10x variations) can be inconsistent with the appearance of the plug formed in the injector (up to only 30 % variations). Operating at constant pH and ionic strength produced the most consistent results. This report examines the effects of altering the injector geometry and solution ionic strengths, and presents the results of using bias voltages to control plug formation. The observed results should provide a benchmark for modeling of the fluid dynamics in channel intersections.     

ON THE ESSENTIAL SPECTRUM OF PSEUDODIFFERENTIAL OPERATORS （Ⅱ）

This paper coutinues the studies of the essential spectrum of nonsemi-bounded pseudodifferential operators. The author improves the results in [5] in some sense. For the relativistic Schrodinger operator,√(-Δ+m^2)+v(x),complete results are obtained.