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81.
Rahul Sarpeshkar Richard F. Lyon Carver Mead 《Analog Integrated Circuits and Signal Processing》1998,16(3):245-274
Low-power wide-dynamic-range systems are extremely hard to build. The biological cochlea is one of the most awesome examples of such a system: It can sense sounds over 12 orders of magnitude in intensity, with an estimated power dissipation of only a few tens of microwatts. In this paper, we describe an analog electronic cochlea that processes sounds over 6 orders of magnitude in intensity, and that dissipates 0.5 mW. This 117-stage, 100 Hz to 10 KHz cochlea has the widest dynamic range of any artificial cochlea built to date. The wide dynamic range is attained through the use of a wide-linear-range transconductance amplifier, of a low-noise filter topology, of dynamic gain control (AGC) at each cochlear stage, and of an architecture that we refer to as overlapping cochlear cascades. The operation of the cochlea is made robust through the use of automatic offset-compensation circuitry. A BiCMOS circuit approach helps us to attain nearly scale-invariant behavior and good matching at all frequencies. The synthesis and analysis of our artificial cochlea yields insight into why the human cochlea uses an active traveling-wave mechanism to sense sounds, instead of using bandpass filters. The low power, wide dynamic range, and biological realism make our cochlea well suited as a front end for cochlear implants. 相似文献
82.
Guan L. Christou A. Halkias G. Barbe D.F. 《Electron Devices, IEEE Transactions on》1995,42(4):612-617
A model for the calculation of the current-voltage characteristics of strained In0.52Al0.48As/InxGa1-xAs on InP substrate High Electron Mobility Transistors (HEMT's), based on a variational charge control model, is presented. A polynomial fit of the two-dimensional electron gas (2DEG) density is used for the calculation of the current-voltage characteristics. The effect of strain is introduced into the 2DEG density versus gate voltage relation. Very good agreement between the calculated and measured I-V characteristics was obtained. In addition, our results show that, for an indium mole fraction of the InxGa1-xAs channel in the range 0.53-0.60, increasing the indium mole fraction lowers the threshold voltage and hence increases the drain current at the same gate bias 相似文献
83.
An OFDM scheme with a half complexity 总被引:2,自引:0,他引:2
The paper deals with an OFDM (orthogonal frequency division multiplexing) system based on filter-bank architecture. The known implementation uses a DFT (discrete Fourier transform) processor and a polyphase network (PPN). Even if it is based on complex components, in the final step it operates the real part extraction of the incoming signal. This leads to redundant operations in the DFT processor and in the PPN. Specifically, for the transmission of N complex symbol sequences at a given rate ½F, an N-point DFT processor and an N-branch PPN, both working at the rate F, are required. This implementation can be improved with a complexity reduction by a factor of two. In fact, in the paper an architecture is presented based on an N-point DFT processor and N-branch PPN at the rate F, for the transmission of 2N (in place of N) complex symbol sequences at the rate ½F 相似文献
84.
Algorithm for cosine transform of Toeplitz matrices 总被引:1,自引:0,他引:1
An algorithm for calculating the 2D cosine transform of a Toeplitz matrix is presented. The algorithm is based on the application of 1D cosine transforms. More specifically, four 1D cosine transforms of size N are needed to obtain the transform of a Toeplitz matrix of size N×N. This is an improvement over previously published algorithms. The algorithm is also simple and regular 相似文献
85.
P Sallagoity F Gaillard M Rivoire M Paoli M Haond S McClathie 《Microelectronics Reliability》1998,38(2):700
This paper presents Shallow Trench Isolation (STI) process steps for sub-1/4 μ CMOS technologies. Dummy active areas, vertical trench sidewalls, excellent gap filling, counter mask etch step and CMP end point detection, have been used for a 0.18 μm CMOS technology. Electrical results obtained with a 5.5 nm gate oxide thickness show good isolation down to 0.3 μm spacing. Good transistor performances have been demonstrated. 相似文献
86.
G. F. Brand 《Journal of Infrared, Millimeter and Terahertz Waves》1996,17(7):1253-1262
The transmission of millimeter waves through a semiconductor changes according to the amount of light falling on it. In the experiments reported here, a pattern of light and shadow is projected onto a sheet of semiconductor and the regions of greater and lesser transmission serve as a diffracting object for a millimeter-wave beam. The light source is a quartz tungsten halogen lamp. A lock-in amplifier is employed to overcome difficulties due to the differences in transmitted power being small. 相似文献
87.
A structured genetic algorithm (SGA) approach is developed for robust controller design based on the concept of an H∞ loop-shaping technique and the method of inequalities. Such an SGA is capable of simultaneously searching the orders and coefficients of the precompensator and postcompensator for the weighted plant. It is, therefore, not necessary to predefine the order of compensators as in usual practice. A multiple objective ranking approach is also incorporated so that the design criteria of extreme plants can be easily achieved. The effectiveness of such a technique is illustrated by a high-purity distillation column design example 相似文献
88.
A novel isolation scheme named planarized trench isolation and field oxide formation using poly-silicon (PLATOP) Is described. PLATOP is applicable to high-performance submicron VLSI since it results in encroachment-free shallow trenches, and planarized field oxide. The process offers poly silicon-filled deep trenches. The process also relies on noncritical lithography and novel etch processes to planarize the deposited poly-silicon from the top of the active areas, and oxidation to consume the poly-silicon in the field regions. Electrical results are presented proving the viability of the isolation scheme 相似文献
89.
This paper introduces genetic algorithms (GA) as a complete entity, in which knowledge of this emerging technology can be integrated together to form the framework of a design tool for industrial engineers. An attempt has also been made to explain “why” and “when” GA should be used as an optimization tool 相似文献
90.
W. Fallmann P. Hudek I. Kostic A. Neubauer D. Pum I. Rangelow K. Riedling F. Rüdenauer U. B. Sleytr G. Stangl 《e & i Elektrotechnik und Informationstechnik》1998,115(7-8):349-353
This contribution describes the preparation, based upon a chemically amplified novolak resist (CAR), electron beam lithography, and ECR plasma etching, of structures with a high aspect ratio (10∶1) and lateral dimensions in the sub-micrometer range (150nm–300nm) which may serve as collector surfaces for sub-μm dust particles in a space experiment. 相似文献