原位合成AlN及添加钇的复合AlN粉体

以Al-Mg和Al-Mg-Y合金为原料，通入高纯度的氮气，利用原位合成法制备了AlN粉体及含烧结助剂的复合AlN粉体。合成氮化产物的组织排列疏松，有利于粉化。粉化后的AlN粉体纯度较高，含氧量为1.23%，平均粒径为6.78μm，物相为单相AlN；复合AlN粉体物相组成为AlN主相与稀土钇的氧化物烧结助剂Y2O3相。粒径分布曲线呈双峰现象，从提高粉体的充填系数角度考虑，具有这种粒径分布的粉体有利于烧结致密化。     

Crystalline silicon surface passivation investigated by thermal atomic-layer-deposited aluminum oxide

Atomic-layer-deposited(ALD) aluminum oxide(Al_2O_3) has demonstrated an excellent surface passivation for crystalline silicon(c-Si) surfaces, as well as for highly boron-doped c-Si surfaces. In this paper, water-based thermal atomic layer deposition of Al_2O_3 films are fabricated for c-Si surface passivation. The influence of deposition conditions on the passivation quality is investigated. The results show that the excellent passivation on n-type c-Si can be achieved at a low thermal budget of 250℃ given a gas pressure of 0.15 Torr. The thickness-dependence of surface passivation indicates that the effective minority carrier lifetime increases drastically when the thickness of Al_2O_3 is larger than 10 nm. The influence of thermal post annealing treatments is also studied. Comparable carrier lifetime is achieved when Al_2O_3 sample is annealed for 15 min in forming gas in a temperature range from 400℃ to 450℃. In addition, the passivation quality can be further improved when a thin PECVD-SiN_x cap layer is prepared on Al_2O_3, and an effective minority carrier lifetime of2.8 ms and implied Voc of 721 mV are obtained. In addition, several novel methods are proposed to restrain blistering.     

Strain relaxation and optical properties of etched In0.19Ga0.81N nanorod arrays on the GaN template

InGaN/GaN epilayers,which are grown on sapphire substrates by the metal-organic chemical-vapour deposition(MOCVD) method,are formed into nanorod arrays using inductively coupled plasma etching via self-assembled Ni nanomasks.The formation of nanorod arrays eliminates the tilt of the InGaN(0002) crystallographic plane with respect to its GaN bulk layer.Photoluminescence results show an apparent S-shaped dependence on temperature.The light extraction efficiency and intensity of photoluminescence emission at low temperature of less than 30 K for the nanorod arrays are enhanced by the large surface area,which increases the quenching effect because of the high density of surface states for the temperature above 30 K.Additionally,a red-shift for the InGaN/GaN nanorod arrays is observed due to the strain relaxation,which is confirmed by reciprocal space mapping measurements.     

Strain relaxation and optical properties of etched In_0.19Ga_0.81 N nanorod arrays on the GaN template

InGaN/GaN epilayers,which are grown on sapphire substrates by the metal-organic chemical-vapour deposition(MOCVD) method,are formed into nanorod arrays using inductively coupled plasma etching via self-assembled Ni nanomasks.The formation of nanorod arrays eliminates the tilt of the InGaN(0002) crystallographic plane with respect to its GaN bulk layer.Photoluminescence results show an apparent S-shaped dependence on temperature.The light extraction efficiency and intensity of photoluminescence emission at low temperature of less than 30 K for the nanorod arrays are enhanced by the large surface area,which increases the quenching effect because of the high density of surface states for the temperature above 30 K.Additionally,a red-shift for the InGaN/GaN nanorod arrays is observed due to the strain relaxation,which is confirmed by reciprocal space mapping measurements.     

GaN基半导体在改变钙钛矿太阳能电池性能方面的理论分析

GaN基半导体在光电子、电子器件已具有重要应用,如何结合其良好的电学特性进行其他应用方面的理论或实验探索,是当前新的研究课题.本文利用SCAPS-1D软件从理论上计算了GaN在FTO/GaN/(FAPbI₃)_0.85(MAPbBr₃)_0.15/HTL电池结构中电子传输的理论机制.结果表明,引入GaN后,电池的开路电压,转换效率明显提高.通过进一步分析准费米能级分裂、界面电场、界面复合率、耗尽层厚度等因素的变化规律,分析了GaN的厚度和掺杂浓度对电池开路电压等器件参数的影响,并从GaN作为电子传输层的物理机制方面进行了讨论.