初相的解析表达

指出一些文献在初相解析表达中存在的错误,给出了正确的初相解析表达式.     

Influence of laser conditioning on defects of HfO2 monolayer films

<正>The influence of laser conditioning on defects of HfO_2 monolayer films prepared by electron beam evaporation (EBE) is investigated utilizing the spot-size effect of the laser-induced damage.It is found that the laser-induced damage threshold of HfO_2 monolayer films can be increased by a factor of 1.3-1.6.It is also found that the defects with low threshold can be removed by laser conditioning and defects with higher threshold may be removed partially.     

Design and Fabrication of Chirped Mirror

Chirped mirrors （CMs） are designed and manufactured. The optimized CM provides a group delay dispersion （ODD） of around -60fs^2 and average reflectivity of 99.4% with bandwidth 200 nm at a central wavelength of 800nm. The CM structure consists of 52 layers of alternating high refractive index Ta2O5 and low refractive index SiO2. Measurement results show that the control of CM manufacturing accuracy can meet our requirement through time control with ion beam sputtering. Because the ODD of CMs is highly sensitive to small discrepancies between the layer thickness of calculated design and those of the manufactured mirror, we analyze the error sources which result in thickness errors and refractive index inhomogeneities in film manufacture.     

A Thermal Approach to Model Laser Damage in KDP and DKDP Crystals

A thermal model is considered in order to better understand the mechanism of laser induced damage in KDP and DKDP crystals. We demonstrate that the expressions of pinpoint density and damage probability, predicted by the thermal model, are consistent with the experimental data. We also discuss the effect of particle interaction on the thermal model.     

氟化物材料在深紫外波段的光学常数

研究了紫外领域常用的6种大带隙的氟化物薄膜材料,在氟化镁单晶基底上用热舟蒸发镀制了三种高折射率材料薄膜LaF₃,NdF₃,GdF₃和三种低折射率材料薄膜MgF₂,AlF₃,Na₃AlF₆;用商用lambda900光谱仪测量了它们在190—500 nm范围的透射率光谱曲线;用包络法研究了它们的折射率和消光系数,研究了影响透射率和光学常数的主要因素,给出了6 关键词： 光学常数 包络法 氟化物材料 深紫外     

单晶Cu冲击加载及卸载下塑性行为的微观模拟

使用分子动力学方法对室温下单晶铜沿［001］和［111］方向冲击加载及卸载下的塑性行为进行了模拟,得到了Hugoniot关系以及冲击熔化压力,与实验基本符合. 加载过程中,较高的初始温度有利于位错的形核与发展. 通过对冲击波在自由表面卸载过程的模拟和分析发现：卸载过程呈现“准弹性卸载行为”;沿［001］方向卸载后大量不全位错环与堆积层错消失,而沿［111］方向卸载后只有少量层错消失,部分层错甚至会发展扩大. 关键词： 分子动力学 冲击波 塑性     

高压条件下高能重离子辐照材料研究进展

高能重离子辐照处于高压条件下材料的研究,是随着高能重离子加速器技术的快速发展而出现的一个新的研究领域, 研究结果涉及材料学、 地质学、地质年代学、核废料处理学等学科。简要介绍最近几年国内外在高能重离子辐照高压条件下材料研究领域的研究现状及已取得的结果,并对未来在兰州重离子加速器冷却储存环（HIRFL CSR）上开展相关研究工作的前景作了展望。With development of high energy heavy ion accelerator, it is possible to perform heavy ion irradiation experiments of pressurized materials in diamond anvil cells(DACs). It is a new research field. The results expected from irradiation experiments under high pressure will have impacts on several scientific fields such as materials science,geo science,geochronology,and nuclear waste storage. In this paper, some of recent works in this field are presented and reviewed. Furthermore,the research plan of materials under high pressure based on HIRFL-CSR is introduced.     

Design of single-material guided-mode resonance filter

In this letter, a guided-mode resonance （GMR） filter with the same material for both the grating layer and the waveguide layer is designed, and its optical properties are investigated. The GMR filter owns almost 100% reflection at the resonance wavelength of 800 nm with the full-width at half-maximum （FWHM） of 20 nm, and its sideband reflection from 700 to 1000 nm is less than 5%. As the resonance wavelength is influenced by more than one parameter during the fabrication process, GMR filter with the same resonance wavelength can be obtained by adjusting other parameters or even one parameter to deviate from the design value.     

基于图像锁相的薄膜吸收多通道检测技术

从理论和应用两方面对光学薄膜吸收缺陷的检测方法进行了研究.基于CCD摄像机的网像锁相技术,提出了不同于传统逐点扫描方法的多通道薄膜吸收检测方法.基于逐点扫描法和图像检测法,分别计算了大区域内薄膜单点缺陷所对应的吸收分布,结果证明了图像法应用于较大口径薄膜元件吸收检测的可行性.计算和实验表明:相对于逐点法,图像法测量薄膜速度可以提高上百倍,避免了逐点扫描法中耗时长、效率低的不足,扩展了光热技术在大口径镀膜光学元件中的应用.     

电子束蒸发氧化锆薄膜的粗糙度和光散射特性

利用电子束蒸发工艺，以Ag层为衬底，沉积了中心波长为632.8nm的氧化锆(ZrO₂)薄膜，膜层厚度在80—480nm范围内变化.研究了不同厚度样品的粗糙度变化规律和表面散射特性.结果发现，随着膜层厚度的逐渐增加，其表面均方根(RMS)粗糙度和总积分散射(TIS)均呈现出先减小后增大的趋势.利用非相关表面粗糙度的散射模型对样品的TIS特性进行了理论计算，所得结果与测量结果相一致. 关键词： 氧化锆 表面粗糙度 标量散射 电子束蒸发