Room-temperature operating extended short wavelength infrared photodetector based on interband transition of InAsSb/GaSb quantum well

Here in this paper,we report a room-temperature operating infrared photodetector based on the interband transition of an In As Sb/Ga Sb quantum well.The interband transition energy of 5-nm thick In As_(0.91)Sb_(0.09) embedded in the Ga Sb barrier is calculated to be 0.53 e V(2.35μm),which makes the absorption range of In As Sb cover an entire range from short-wavelength infrared to long-wavelength infrared spectrum.The fabricated photodetector exhibits a narrow response range from 2.0μm to 2.3μm with a peak around 2.1μm at 300 K.The peak responsivity is 0.4 A/W under-500-m Vapplied bias voltage,corresponding to a peak quantum efficiency of 23.8%in the case without any anti-reflection coating.At 300 K,the photodetector exhibits a dark current density of 6.05×10~(-3)A/cm~2under-400-m V applied bias voltage and3.25×10~(-5)A/cm~2under zero,separately.The peak detectivity is 6.91×10~(10)cm·Hz~(1/2)/W under zero bias voltage at 300 K.     

Growth of Semi-Insulating GaN by Using Two-Step AIN Buffer Layer

Semi-insulating GaN is grown by using a two-step A1N buffer layer by metalorganic chemical vapour deposition. The sheet resistance of as-grown semi-insulating GaN is dramatically increased to 10^13 Ω/sq by using two-step A1N buffer instead of the traditional low-temperature GaN buffer. The high sheet resistance of as-grown GaN over 10^13 Ω/sq is due to inserting an insulating buffer layer （two-step A1N buffer） between the high-temperature GaN layer and a sapphire substrate which blocks diffusion of oxygen and overcomes the weakness of generating high density carrier near interface of GaN and sapphire when a low-temperature GaN buffer is used. The result suggests that the high conductive feature of unintentionally doped GaN is mainly contributed from the highly conductive channel near interface between GaN and the sapphire substrate, which is indirectly manifested by room-temperature photoluminescence excited by an incident laser beam radiating on growth surface and on the substrate. The functions of the two-step A1N buffer layer in reducing screw dislocation and improving crystal quality of GaN are also discussed.     

r面蓝宝石衬底上采用两步AlN缓冲层法外延生长a面GaN薄膜及应力研究

采用MOCVD技术在r面蓝宝石衬底上采用两步AlN缓冲层法外延制备了a面GaN薄膜.利用高分辨X射线衍射技术和Raman散射技术分析了样品的质量以及外延膜中的残余应力.实验结果表明:样品的(1120)面的X射线双晶摇摆曲线的半峰宽仅为0.193°,Raman光谱中E2高频模的半峰宽仅为3.9cm-1,这些说明a面GaN薄膜具有较好的晶体质量;X射线研究结果表明样品与衬底的位相关系为:[11(2)0]GaN ||[1(1)02]sapphire,[0001]Gan||[(11)01]sapphire和[(11)00]GaN[11(2)0]sapphire;高分辨X射线和Raman散射谱的残余应力研究表明,采用两步AlN缓冲层法制备的a面GaN薄膜在平面内的残余应力大小与用低温GaN缓冲层法制备的a面GaN薄膜不同,我们认为这是由引入AlN带来的晶格失配和热失配的变化引起的.     

GaAsSOI衬底上PHEMT器件特性演示

利用分子束外延生长了 Ga As/Al As/Ga As夹层结构材料 ,通过侧向湿法热氧化技术 ,成功制作了Ga As SOI衬底 ,并在其上生长了 PHEMT材料结构。X射线双晶摇摆曲线分析证明材料结构完整 ,晶体质量良好。器件结果显示了优良的 I-V特性 ,零偏压下漏源电流为 3 2 0 m A/mm,最大跨导为 2 5 0 m S/mm,器件具有良好的夹断性能 ,极好的电荷控制能力和高线性特性     

Ad Hoc的FSLS路由算法的实现和仿真

无线Ad Hoc网络是目前国际上前沿和热点的研究领域,具有分布式的体系结构。其组织网络灵活,支持随时随地通信。该文介绍了移动Ad Hoc网络的特点,重点介绍了FSLS路由算法的基本原理,并对FSLS路由算法进行了仿真,对仿真结果进行了分类,对比和分析。     

AlN外延薄膜的生长和特征

文章研究了AlN薄膜的晶体质量、表面形貌、应力等性质与AlN生长工艺的依赖关系。通过对低温成核厚度、成核温度和高温生长AlN所用Ⅴ／Ⅲ比的研究，制备出了具有较好晶体质量的AlN薄膜。高分辨三晶X射线衍射给出AlN薄膜的（002）和（105）的半高宽分别为16．9arcsec和615arcsec，接近国际上报道的较好结果。原子力显微镜对表面形貌的分析表明AlN薄膜的粗糙度为5．7nm。拉曼光谱表明E2（high）模向高能方向移动，说明蓝宝石上外延的AlN薄膜处于压应变状态。光学吸收谱在204nm处具有陡峭的带边吸收，也表明了AlN外乏正薄膜具有辅好妯晶体盾量。     

AlN外延薄膜的生长和特征

文章研究了AlN薄膜的晶体质量、表面形貌、应力等性质与AlN生长工艺的依赖关系.通过对低温成核厚度、成核温度和高温生长AlN所用Ⅴ/Ⅲ比的研究,制备出了具有较好晶体质量的AlN薄膜.高分辨三晶X射线衍射给出AlN薄膜的(002)和(105)的半高宽分别为16.9arcsec和615arcsec,接近国际上报道的较好结果.原子力显微镜对表面形貌的分析表明AlN薄膜的粗糙度为5.7nm.拉曼光谱表明E2(high)模向高能方向移动,说明蓝宝石上外延的AlN薄膜处于压应变状态.光学吸收谱在204nm处具有陡峭的带边吸收,也表明了AlN外延薄膜具有较好地晶体质量.     

Luminescent Characteristics of Near Ultraviolet InGaN/GaN MQWs Grown on Grooved Sapphire Substrates Fabricated by Wet Chemical Etching

InGaN/GaN multiple quantum wells （MQWs） are grown on planar and maskless periodically grooved sapphires by metal organic vapour phase epitaxy （MOCVD）. High-resolution x-ray rocking curves and transmission electron microscopy （TEM） are adopted to characterize the film quality. Compared with the MQWs grown on planar sapphire, the sample grown on grooved sapphire shows better crystalline quality： a remarkable reduction of dislocation densities is achieved. Meanwhile, the MQWs grown on grooved sapphire show two times larger PL intensity at room temperature. Temperature-dependent PL measurements are adopted to investigate the luminescence properties. The luminescence thermal quenching based on a fit to the Arrhenius plot of the normalized integrated PL intensity over the measured temperature range suggests that the nonradiative recombination centres （NRCs） are greatly reduced for the sample grown on grooved sapphire. We assume that the reduction of dislocations which act as NRCs is the main reason for the sample grown on pattern sapphire having higher PL intensity.     

（英）分子束外延生长InAsSb材料的组分控制

采用分子束外延方法在GaAs和GaSb衬底上生长了一系列InAsSb薄膜,研究了Sb组分与Sb4束流间关系.实验发现,在分子束外延生长中,相比As原子, Sb原子更易并入晶格中.利用该特性可较好实现InAsSb材料的组分控制.     

Growth and Characteristics of Epitaxial AlxGa1-xN by MOCVD1

AlxGa1-xN epilayers with a wide Al composition range （0.2 ≤ x ≤0.68） were grown on AlN/sapphire templates by low-pressure metalorganic chemical vapour deposition （LP-MOCVD）. X-ray diffraction results reveal that both the （0002） and （1015） full widths at half-maximum （FWHM） of the AlxGa1-xN epilayer decrease with increasing Al composition due to the smaller lattice mismatch to the AlN template. However, the surface morphology becomes rougher with increasing Al composition due to the weak migration ability of Al atoms. Low temperature photolumineseence （PL） spectra show pronounced near band edge （NBE） emission and the NBE FWHM becomes broader with increasing Al composition mainly caused by alloy disorder. Meanwhile, possible causes of the low energy peaks in the PL spectra are discussed.