Write-Once Medium with Fe-Doped BiOx Thin Films for Blue Laser Recording

Fe：BiOx films are fabricated on K9 glass substrates by rf-magnetron sputtering of a BiFeO target under argon atmosphere with increasing sputtering power from 80 to 200 W at room temperature. It is found that the thin films grown at the sputtering power of 160 W can be formed at an appropriate deposition rate and have an improved surface morphology. The XPS result reveals that the films investigated are comprised of Bi, Fe and O elements. A typical XRD pattern shows that no phase transition occurs in the films up to 400℃. The results of the blue laser recording test demonstrate that the Fe：BiOx films have good writing sensitivity for blue laser beam （406.7nm） and good stability after reading 10000 times. The recording marks of 200nm or less are obtained. These results indicate that the introduction of Fe into BiOx films can reduce the mark size and improve the stability of the films.     

Effects of oxygen partial pressure on optical properties of NiO_x films deposited by reactive DC-magnetron sputtering

The influence of oxygen partial pressure on the optical properties of NiOx thin films deposited by reactive DC-magnetron sputtering from a nickel metal target in a mixture gas of oxygen and argon was presented. With the oxygen ratio increasing, the reflectivity of the as-deposited films decreased, and optical band gap increased. Thermogravimetric analysis (TGA) showed that the decompose temperature of the films was above 250℃. After annealed at 400℃, only films deposited at 5% O2/Ar ratio showed high optical contrast which was about 52%. Scanning electron microscope (SEM) results revealed that the changes of surface morphology were responsible for the optical property variations of the films after annealing. Its thermal stability and high optical contrast before and after annealing made it a good potential write-once optical recording medium.     

无机激光热刻蚀材料的研究进展

激光热刻蚀技术是近年发展起来的利用激光热刻蚀薄膜的热变化阈值特性突破光学衍射极限进行纳米图形制备的新技术,在亚波长纳米结构器件和高密度光盘母盘制造等领域具有广阔的应用前景.阐述了激光热刻蚀技术的基本原理和特点,以及对激光热刻蚀材料性质的要求,综述了相变型激光热刻蚀薄膜材料(包括硫系相变薄膜材料、金属亚氧化物薄膜材料和陶...     

高密度蓝光存储的写策略

蓝光存储技术被认为是第三代光存储的主流技术．在蓝光存储技术中,由于数据传输速度的提高,特别是在高倍速蓝光光盘中记录数据,需要光盘和刻录机之间非常精密的配合,因此对写策略提出了更高的要求．介绍了用于蓝光存储的写策略的研究现状,并对其发展前景进行了展望．     

热致NiOx薄膜的结构和光学性质变化

利用直流磁控反应溅射技术制备了氧气和氩气的分压比为5∶100的NiOx薄膜。利用X射线衍射仪(XRD)、扫描电镜(SEM)、原子力显微镜(AFM)和光谱仪研究了热处理对薄膜的微观结构和光学性质的影响,并对沉积态薄膜的粉末进行了热分析。沉积态的NiOx薄膜在262℃时开始分解,导致NiOx薄膜的透过率增加和反射率降低。X射线衍射和示差扫描量热曲线(DSC)分析表明,在热处理过程中并无物相的变化,光学性质的变化是由于NiOx薄膜热分解引起薄膜表面形貌发生变化而引起的。通过Kissinger公式计算出热分解所需克服的活化能为230.46kJ/mol,显示出很好的热稳定性。NiOx薄膜的热稳定性和热处理前后在波长为405nm处高的反射率差值,使其很有可能成为可录蓝光光盘的记录介质。     

极紫外光刻材料研究进展

极紫外光刻是微电子领域有望用于下一代线宽为22nm及以下节点的商用投影光刻技术,光刻材料的性能与工艺是其关键技术之一。为我国开展极紫外光刻材料研究提供参考,综述了最近几年来文献报道的研究成果,介绍了极紫外光刻技术发展历程、现状、光刻特点及对光刻材料的基本要求,总结了极紫外光刻材料的研究领域和具体分类,着重阐述了主要光刻材料的组成、光刻原理,光刻性能所达到的水平和存在的主要问题,最后探讨了极紫外光刻材料未来的主要研究方向。