快速热退火对带有 InGaAs盖层的 InAs/GaAs量子点发光特性的影响

系统地研究了快速热退火对带有 3nm Inx Ga1 - x As(x=0 ,0 .1,0 .2 )盖层的 3nm高的 In As/ Ga As量子点发光特性的影响 .随着退火温度从 6 5 0℃上升到 85 0℃ ,量子点发光峰位的蓝移趋势是相似的 .但是 ,量子点发光峰的半高宽随退火温度的变化趋势明显依赖于 In Ga As盖层的组分 .实验结果表明 In- Ga在界面的横向扩散在量子点退火过程中起了重要的作用 .另外 ,我们在较高的退火温度下观测到了 In Ga As的发光峰     

纳米半导体材料及其纳米器件研究进展

(接上期第21页)4.2.2量子点激光器 应变自组装量子点材料与量子点激光器的研制已成为近年来国际研究热点.应用这种技术已制备出量子点激光器,波长覆盖了近红外和红光波段.1992年Ueno等人报道了单层InGaAs/A1GaAs量子点结构,实现了室温激射,阈值电流密度(Jth)为950A/cm2;1994年俄德联合小组首先研制成功InAs/GaAs量子点材料;1996年Alferov等人研制成功有源区为三层结构 (垂直耦合)的量子点激光器,Jth为680A/cm2;同年Ledentsov等人[24]又报道了10层垂直耦合InGaAs/GaAs量子点结构激光器,室温Jth为90A/cm2;1997年Ustinov等人又报道了Jth低达60A/cm2的量子点激光器,其结果已接近当前最好的量子阱激光器的性能1996年量子点激光器室温连续输出功率达1W,阈值电流密度为290A/cm2,1998年达1.5W;1999年InAlAs/InAs量子点激光器283K温度下最大连续输出功率(双面)高达3.5W.     

不同尺寸分布的自组织In_(0.55)Al_(0.45)As/Al_(0.5)Ga_(0.5)As量子点的静压光谱

在 1 5K测量了不同尺寸分布的 In0 .55Al0 .4 5As/Al0 .5Ga0 .5As量子点的静压光致发光 ,静压范围为 0 - 1 .3GPa.常压下观察到三个发光峰 ,分别来源于不同尺寸的量子点 (横向直径分别为2 6、52和 62 nm)的发光 .它们的压力系数分别为 82、94和 98me V/GPa,都小于 In0 .55Al0 .4 5As体材料带边的压力系数 ,特别是尺寸为 2 6nm的小量子点比 In0 .55Al0 .4 5As体材料带边小 1 7% ,并且压力系数随量子点尺寸的变小而减小 .理论计算表明有效质量的增大和 Γ- X混合是量子点压力系数变小的主要原因 ,并得到横向直径为 2 6和 52 nm的小量子点的 Γ- X混合势为     

Characterization of 4H-SiC substrates and epilayers by Fourier transform infrared reflectance spectroscopy

The infrared reflectance spectra of both 4H–SiC substrates and epilayers are measured in a wave number range from 400 cm 1 to 4000 cm 1 using a Fourier-transform spectrometer. The thicknesses of the 4H–SiC epilayers and the electrical properties, including the free-carrier concentrations and the mobilities of both the 4H–SiC substrates and the epilayers, are characterized through full line-shape fitting analyses. The correlations of the theoretical spectral profiles with the 4H–SiC electrical properties in the 30 cm 1 –4000 cm 1 and 400 cm 1 –4000 cm 1 spectral regions are established by introducing a parameter defined as error quadratic sum. It is indicated that their correlations become stronger at a higher carrier concentration and in a wider spectral region (30 cm 1 –4000 cm 1 ). These results suggest that the infrared reflectance technique can be used to accurately determine the thicknesses of the epilayers and the carrier concentrations, and the mobilities of both lightly and heavily doped 4H–SiC wafers.     

Confined and Interface Phonons in Chirped GaAs-A1GaAs Superlattices

The confined longitudinal optical, transverse optical and interface phonon modes in chirped GaAs-AIGaAs superlattices grown on the （O01）-oriented GaAs substrate are studied by the micro-Raman spectroscopy. The phonon modes are probed at the （001） and （110） faces. The temperature dependence of the longitudinal optical, transverse optical and interface phonon modes are achieved. The temperature dependence of the longitudinal optical phonon frequencies demonstrates that a tensile strain exists in the GaAs layers of the chirped superlattices, which is significant for analyzing the device failure of a terahertz quantum cascade laser.     

Effects of V/III ratio on a-plane GaN epilayers with an InGaN interlayer

The effects of V/Ill growth flux ratio on a-plane GaN films grown on r-plane sapphire substrates with an InGaN interlayer are investigated. The surface morphology, crystalline quality, strain states, and density of basal stacking faults were found to depend heavily upon the V/III ratio. With decreasing V/III ratio, the surface morphology and crystal quality first improved and then deteriorated, and the density of the basal-plane stacking faults also first decreased and then increased. The optimal V/III ratio growth condition for the best surface morphology and crystalline quality and the smallest basal-plane stacking fault density of a-GaN films are found. We also found that the formation of basal-plane stacking faults is an effective way to release strain.     

多孔波导小发散角量子级联激光器

本文报道了激射波长为4.5μm带有多孔结构波导的量子级联激光器,具体器件工艺首先采用电化学腐蚀方法在脊形两侧制作出树枝状多孔结构,后续步骤在其中填充入金属材料。与普通脊形器件相比,带有多孔结构的新型器件具有更好的光束质量。此种半导体-金属混合结构对高阶模光反馈吸收作用较强,可对高阶横模产生明显的抑制作用,最终实现远场发散角达4.9°的基横模激射。     

高电子迁移率GaAs／Al_xGa_（1－x）As二维电子气（2DEG）异质结结构参数优化研究

本文采用三角附近似，考虑了ＧａＡｓ／ＡｌｘＧａ（１－）ｘＡｓ二维电子气（２ＤＥＧ）异质结中七种主要的散射机制，计算了２ＤＥＧ电子迁移率与隔离层厚度（ｄ）和Ａｌ组分（ｘ）的关系，对ＧａＡｓ／ＡｌｘＧａ（１－ｘ）ＡＳ异质结的结构参数进行了优化分析．就作者所知，本文首次计算了２ＤＥＧ电子迁移率与Ａｌ组分ｘ的关系，得到了与实验规律一致的结果．     

GaAs超高速电压比较器及利用低温MBE GaAs缓冲层的改进设计

简要介绍了ＧａＡｓ超高速电压比较器的国内外发展水平。设计并研制了具有１．０ＧＨｚ时钟频率的高性能电压比较器。该器件采用亚微米ＧａＡｓＭＥＳＦＥＴ工艺技术，其电压分辨率高达１１．３ｍＶ，功耗仅为２７４ｍｗ。最后给出了利用低温分子束外延生长ＧａＡｓ作缓冲层的进一步改进设计。     

SI-GaAs单晶热稳定性及其电学补偿机理研究

本文利用多种实验手段,包括OTCS,DLTS,低温PL等,对影响LEC SI-GaAs单晶电学性质热不稳定的可能因素进行了系统研究.在仔细分析对比文献发表的实验结果的基础上,提出了普遍成立的多能级电学补偿模型.这个模型不但能成功地对SI-GaAs单晶热不稳定的本质进行合理解释,而且还为研制高热稳定的GaAs材料提供了科学依据.