量子点超辐射发光管研究进展(续)

3 SLD应用及其性能要求 SLD具有高亮度、宽光谱、弱时间相干性、低噪声、高光纤耦合效率等优点,被广泛应用于光纤陀螺仪(FOG)[40-42]、光学相干断层成像术(OCT)[43-44]、光纤通信[45-46]、光时域反射计[47]、波长可调谐激光器[48]等领域,展示了广阔的军用、民用应用前景和重要的实用价值.     

利用GaAs基上InGaAs应变层制备有序排列的InAs量子点

在GaAs基In x Ga1-xAs( x =0.15)应变层上生长了InAs 量子点(QD)层,通过分析各层之间的应力状况和位错的演变过程,配合生长过程中对反射式高能电子衍射仪(RHEED)实时监测,并观察生长后的表面形貌,发现可以通过控制应变层厚度来控制应变层表面布纹结构的宽度,而且在应变层厚度低于位错增殖的临界厚度时布纹宽度较窄.如果同时控制QD层在刚刚出点,则QD主要沿着较窄的布纹结构排列,从而得到有序排列的QD.     

Holographic fabricated continuous wave operation of distributed feedback quantum cascade lasers atλ≈8.5μm

The fabrication and characterization of distributed feedback（DFB） quantum cascade lasers emitting atλ≈8.5μm are reported.The first-order DFB grating structure was defined using the holographic lithography technique.Reliable dynamic single-mode emission with a side-mode suppression ratio of 20 dB and a tuning coefficient of-0.277 cm^-1/K from 93 to 210 K is obtained in continuous wave mode by using high-reflectivity coating on the rear facet.The output power is over 100 mW at a temperature of 80 K.     

Active multi-mode-interferometer broadband superluminescent diodes

We report a new quantum dot superluminescent diode with a new device structure. In this device, a multi-mode-interferometer configuration and a J-bend structure were monolithically integrated. Owing to the multi-mode-interferometer structure, the superluminescent diode exhibits 60% increase in output power and 43% reduction in the differential resistance compared with the uniform waveguide width superluminescent diode fabricated from the same wafer. Our device produces an emission spectrum as wide as 103.7 nm with an output power of 2.5 mW at 600 mA continue-wave injection current. This broadband emission spectrum makes the axial resolution of the optical coherence tomography system employing the superluminescent diode to 6 μ m in theory, which is high enough for most tissue imaging.     

InAs/GaAs量子点光致发光光谱多峰结构发光本质

研究了InAs/GaAs量子点光致发光光谱中出现的多峰结构.观察到随着激发功率的增加光谱中发光峰的数目逐渐增多并且部分发光峰的峰位随激发功率的增加向高能量方向移动.解释了各发光峰的来源并结合量子点能级结构的特点,计算了量子点中电子和空穴各子带间的能级间距.     

半导体量子点及其应用(Ⅰ)

量子点，又称“人造原子”，它是纳米科学与技术研究的重要组成部分，由于载流子在半导体量子点中受到三维限制而具有的优异性能，构成了量子器件和电路的基础，在未来的纳米电子学、光电子学，光子、量子计算和生命科学等方面有着重要的应用前景，受到人们广泛重视，文章分为Ⅰ、Ⅱ两个部分：第Ⅰ部分介绍了半导体量子点结构的制备和性质；第Ⅱ部分介绍了量子点器件的可能应用。     

N型GaN的持续光电导

本文报道了金属有机物化学气相外延（ＭＯＶＰＥ）生长的未人为掺杂和掺Ｓｉｎ－ＧａＮ的持续光电导（ＰｅｒｓｉｓｔｅｎｔＰｈｏｔｏｃｏｎｄｕｃｔｉｖｉｔｙ——ＰＰＣ）．在不同温度下观察了光电导的产生和衰变行为．实验结果表明,未人为掺杂和掺Ｓｉｎ－ＧａＮ的持续光电导和黄光发射可能起源于深能级缺陷,这些缺陷可以是ＶＧａ空位、ＮＧａ反位或者ＶＧａ－ＳｉＧａ络合物．和未人为掺杂样品Ａ相比,样品Ｂ中因Ｓｉ的并入导致ＧａＮ中的深能级缺陷增加,提高了ＧａＮ中黄光发射,使持续光电导衰变减慢,但实验未发现黄光的加强和光电导衰变特     

解理面预处理方法对二次外延的影响

利用超晶格解理面方法制备定位生长的InAs量子线.首先以分子束外延技术在OaAs衬底上生长GaAs/AlGaAs超晶格,然后将样品取出外延系统进行解理,对解理面进行预处理之后在(110)解理面上进行二次外延.实验结果显示超晶格解理面的预处理方法对二次外延有重大影响,其中择优腐蚀比自然氧化更有利于量子线的定位生长,过高温度的脱氧除气会导致解理面的GaAs部分出现坑状结构,表明(110)面上的Ga原子容易脱附.同时,Ga原子在(110)面上的迁移长度比较大,原子的择优扩散方向为[001]方向.     

Influence of Ⅴ/Ⅲ ratio on the structural and photoluminescence properties of In0.52AlAs/In0.53GaAs metamorphic high electron mobility transistor grown by molecular beam epitaxy

A series of metamorphic high electron mobility transistors （MMHEMTs） with different Ⅴ/Ⅲ flux ratios are grown on CaAs （001） substrates by molecular beam epitaxy （MBE）. The samples are analysed by using atomic force microscopy （AFM）, Hall measurement, and low temperature photoluminescence （PL）. The optimum Ⅴ/Ⅲ ratio in a range from 15 to 60 for the growth of MMHEMTs is found to be around 40. At this ratio, the root mean square （RMS） roughness of the material is only 2.02 nm; a room-temperature mobility and a sheet electron density are obtained to be 10610.0cm^2/（V.s） and 3.26×10^12cm^-2 respectively. These results are equivalent to those obtained for the same structure grown on InP substrate. There are two peaks in the PL spectrum of the structure, corresponding to two sub-energy levels of the In0.53Ga0.47As quantum well. It is found that the photoluminescence intensities of the two peaks vary with the Ⅴ/Ⅲ ratio, for which the reasons are discussed.     

InAlA5量子点材料的AFM和拉曼散射研究

对分子束外延（MBE）自组织生长的InAlAs量子点材料进行了拉曼散射实验。结合原子力显微镜（AnD对量子点形貌观察的结果,分析了InAlAs量子点生长过程中尺寸、密度和均匀性的改变,并研究了三维岛的结构对拉曼谱线的影响。对InAlAs淀积厚度不同样品的拉曼谱分析表明,岛状结构的尺寸横纵比与类GaAsLO模和类AlAs LO模的半高全宽有密切关系。不同偏振下的拉曼实验证实了该结构中的光学声子在Z（X,X）Z偏振条件下为非拉曼活性。