局域单PT对称势中基态孤子的传输特性研究

具有Parity-Time (PT)对称性的光学系统是近年提出的一种新型光学结构,在光开关、光子信息处理器件等方面具有潜在的应用.文章数值研究了局域单PT对称光学系统中基态孤子的存在范围与稳定特性.研究结果表明:基态孤子存在一临界传播常数,该传播常数对应线性模下的本征值.孤子的能量随着传播常数的增加而增加,但随着PT对称势的调制深度的增加而减少.基态孤子在较深和较浅的PT对称势中都能稳定地传输.     

Effect of Cr,Mo, and Nb additions on intergranular cohesion of ferritic stainless steel: First-principles determination

Effects of Cr, Mo, and Nb on the ferritic stainless steel ]2（210） grain boundary and intragranularity are investigated using the first-principles principle. Different positions of solute atoms are considered. Structural stability is lowered by Cr doping and enhanced by Mo and Nb doping. A ranking on the effect of solute atoms enhancing the cohesive strength of the grain boundary, from the strongest to the weakest is Cr, Mo, and Nb. Cr clearly prefers to locate in the intragranular region of Fe rather than in the grain boundary, while Mo and Nb tend to segregate to the grain boundary. Solute Mo and Nb atoms possess a strong driving force for segregation to the grain boundary from the intragranular region, which increases the grain boundary embrittlement. For Mo- and Nb-doped systems, a remarkable quantity of electrons accumulate in the region close to Mo （Nb）. Therefore, the bond strength may increase. With Cr, Mo, and Nb additions, an anti-parallel island is formed around the center of the grain boundary.     

加权正则函数的一些性质

正则函数是Clifford分析中的一类重要函数,加权正则函数是正则函数的进一步发展,也是一类重要的函数,因此具有一定的研究意义.在正则函数的研究基础上,并利用加权正则函数自身的性质,讨论了加权正则函数的平均值定理,最大模原理,Weierstrass定理以及一些其它推论.     

Syntheses,Crystal Structures and Catalytic Properties of Copper(Ⅱ) and Cobalt(Ⅱ) Complexes Containing 5,6-Dimethylbenzimidazole

Two new complexes, [Cu(DMB)2(NAA)2](1) and [Co(DMB)2(NAA)2](2)(DMB = 5,6-dimethylbenzimidazole, HNNA = 1-naphthylacetic acid), were hydrothermally synthesized and characterized by elemental analysis, IR spectroscopy, TGA, PXRD and single-crystal X-ray diffraction analysis. The coordination geometry of the metal centers is a perfect square plane for 1 and a distorted tetrahedron for 2. In compound 1, the mononuclear units are linked by N–H···O hydrogen bonds to form a 1D chain structure, while mononuclear motifs of 2 are extended via N–H···O hydrogen bonding and π-π stacking interactions into a 2D supramolecular layer. The remarkable catalytic properties of the two complexes for the degradation of Congo red dye have been found.     

添加液晶对PDLC膜电-光性能参数的影响

以甲基丙烯酸β羟乙酯为聚合单体,以SLC7011-100为液晶材料,利用紫外光聚合分相法制备了PDLC薄膜。通过调节单体和液晶成分的比例,在尽可能提高膜的对比度的情况下降低驱动电压,以获得电-光性能良好的PDLC膜。分别向体系添加壬烷氧基和癸烷氧基联苯氰基液晶、烷基联苯氰基类液晶5CB和8CB,考察了PDLC膜电-光性能的变化,结果表明,添加液晶的含量和分子结构对PDLC膜的折射率、对比度等电-光性能参数有较大影响。     

Low-Voltage Depletion-Mode Indium-Tin-Oxide Thin-Film Transistors Gated by Ba0.4Sr0.6TiO3 Dielectric

We report on the fabrication and characterization of low-voltage indium-tin-oxide （ITO） thin-film transistors （TFTs） gated by a0.4Sr0.6TiO3 （BST） gate dielectric deposited at room temperature. The 400-nm-thick BST film shows a low leakage current density of 6 × 10^-8 A/cm^2 and a high specific capacitance of 83 nF/cm^2 （corresponding εr= 37）. The ITO TFTs gated by such BST dielectric operate in a depletion mode with an operation voltage of 5.0 V. The device exhibits a threshold voltage of -3.7 V, a subthreshold swing of 0.5 V/decade, a field effect mobility of 3.2cm^2/Vs and a current on/off ratio of 1.4× 10^4.     

小型化宽谱段星敏感器光学系统设计

星敏感器是航天飞行器实现姿态自主导航的关键测量设备,传统星敏感器由于体积与质量较大,难以满足微纳卫星的应用需求,光学系统是星敏感器小型化的核心及瓶颈技术.分析了实现全天恒星识别的星敏感器光学系统参数需求,完成一种基于全球面透镜的微小型宽谱段透射式光学系统设计,实现了光学系统焦距40 mm,视场角26.4°,相对孔径F/...     

高层组合墙片模型的拟静力试验

着重介绍高层组合墙片的拟静力试验.通过试验更加深入地了解高层组合墙片在竖向压力和侧向分布荷载共同作用下的破坏机理及抗侧承载力.从而为进一步提出组合墙体抗侧承载力的计算公式打下基础.     

稀土硫化物—聚苯乙烯纳米复合材料的制备与表征

采用原位合成法制备了稀土硫化物—聚苯乙烯纳米复合材料 .通过荧光光谱、磁性、光电子能谱、透射电镜等手段对材料进行表征 .荧光光谱测试可见Eu3+ 的特征发射峰 ;磁性测试表明与H2 S反应后复合材料的饱和磁化强度降低 ;TEM测试表明反应后复合材料的微观结构发生了变化 .分析了产生上述变化的原因     

极紫外光刻离轴照明技术研究

离轴照明技术(OAI)是极紫外光刻技术中提高光刻分辨率的关键技术之一。为了实现考虑掩模阴影效应情况下离轴照明的优化选择,构造了一种新型实现OAI曝光的成像模型。将照射到掩模上的非相干光等效为一系列具有连续入射方向的等强度平行光,基于阿贝成像原理分别对掩模进行成像,最终在像面进行强度叠加实现OAI方式下空间成像的计算;并通过向投影系统函数添加离焦像差项实现不同离焦面上空间成像计算。该模型极大地简化了OAI条件下对掩模阴影效应的计算,提高了成像质量计算效率。结合光刻胶特性及投影曝光系统焦深设计要求,以显影后光刻胶轮廓的侧壁倾角为判据,获得了采用数值孔径为0.32的投影系统实现16 nm线宽黑白线条曝光的最优OAI参数。