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Diffraction Properties for 1000 Line/mm Free-Standing Quantum-Dot-Array Diffraction Grating Fabricated by Focused Ion Beam 下载免费PDF全文
In the research of inertial confinement fusion (ICF), diagnosis of soft x-ray spectra radiated from pellet implosion is a crucial approach to compre- hend the space-time characteristic of plasma and the laser-plasma interactions. Conventional black- white transmission grating (TG) as a speetrophotom- etry element has been widely used in the region of op- tical measurements. However, the inherent high-order diffraction of black-white TG can overlap the informa- tion from the first order diffraction. The uncertainty of unfolding the complex process is the main diffi- culty in precise spectral analysis, which greatly hin- ders being able to stripe out the reasonably physical information. Quantum-dot-array diffraction grat- ing (QDADG) proposed by Cao, where the trans- mittance distribution obeys the sine form exactly, is an ideal amplitude TG and has perfect properties of pro- ducing just one pair of conjugate first order diffraction lines and suppressing the high order diffraction.The traditional fabrication technique for QDADG is the electron beam lithography (EBL) and the x-ray lithog- raphy (XRL). Owing to its capability of gen- erating patterns and the high resolution, EBL plays an increasingly important role in the micromachining, and is recognized as the main approach of fabricating a mask. The fabrication of nanoscale patterns with steep cross section is the superiority of XRL, which possesses the advantages of high efficiency, nanoscale resolution and great penetration capability. On the basis of the above-mentioned processing technique, 1000 line/mm quasi-sinusoidal single-order diffraction TG with the minimal feature structure of 500 nm was reported by Kuang et al., and can be applied in the ICF research. For single order diffraction grating, unfortunately, the promotion and application of EBL and XRL are restricted by the complex process, long period, difficult manufacture and the existence of the supporting film that absorbs x-rays and distorts the light information. 相似文献
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提出一种基于掠入射微柱面反射镜阵列的X射线成像型平响应低通滤波技术.根据X射线光学理论,介绍了基于微柱面反射镜阵列的平响应低通滤波原理,分析了元件透射谱的计算方法.基于电子束刻蚀技术在聚酰亚胺衬底上制作了金柱体直径200nm、深度1.3μm、占空比0.393的微柱面镜阵列样品,根据理论计算在2°掠射角时其截止能量为1250eV,响应不平整度为5.7%.利用转角精度优于0.1°的三维精密转角机构,在北京同步辐射装置的4B7B软X射线束线站标定样品在不同掠入射角下的透射率,得到初步标定结果.标定结果显示,在1keV以上的不同能点各曲线均有下降趋势,且角度越大下降能点越偏软,说明掠射角的增大对较高能的X射线具有明显抑制效果.由于电子束刻蚀的技术局限性,样品的深宽比、侧壁垂直度、侧壁粗糙度等参数并未达到理论要求,所以标定结果与理论计算值有一定差异. 相似文献
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Gabor波带片是一种理想的单级聚焦光学元件,但制备困难.本文采用聚焦离子束直写技术成功制备出30环、20扇区的二值化Beynon-Gabor波带片,其有效面积半径为700μm,第一环半径90μm.利用各向异性腐蚀液对硅基底进行开孔,实现了Beynon-Gabor波带片二值化、自支撑、镂空的结构特征.在波长为355 nm的激光下测试其光学性能,结果表明所制备的Beynon-Gabor波带片主光轴上只存在1级衍射叠加后的焦点,不存在高级衍射焦点,具有优异的单级聚焦性能. 相似文献
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3333lp/mm X射线透射光栅的研制 总被引:1,自引:1,他引:1
针对X射线透射光栅摄谱仪中的高线密度光栅,研究了采用电子束曝光和X射线曝光技术结合制作高线密度X射线透射光栅的工艺技术.首先利用电子束曝光和微电镀技术在镂空的薄膜上制备母光栅X射线掩模版,然后利用X射线曝光和微电镀技术小批量复制光栅.在国内首次完成了3333lp/mm X射线透射光栅的研制,栅线宽度为150nm,周期为300nm,金吸收体厚度为500nm.衍射效率标定的结果表明,该光栅的占空比合理、侧壁陡直,具有良好的色散特性,能够满足空间探测、同步辐射和变等离子诊断等多个领域的应用. 相似文献
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为了满足单级衍射光栅的应用需求,在器件研制中对X射线光刻的关键技术进行优化,克服了曝光中图形畸变的问题,并利用同步辐射光源对单级衍射光栅进行了高效率的批量复制。通过对X射线光谱成分进行模拟,在X射线束线中插入铬反射镜和氮化硅滤片,得到了能量范围为0.5~2 keV的大面积均匀光斑;根据具体情况对掩模图形进行+5~+35 nm的校正,克服了X射线曝光图形扩展的问题;通过控制掩模与基片软接触产生的莫尔条纹,使曝光间隙降到3μm以下,保证了稳定的曝光结果与高分辨率;所制备的多种单级衍射光栅图形结构复杂,具有纳米尺度特征线宽,剖面陡直,满足单级衍射光栅设计对纳米加工技术的苛刻要求。 相似文献
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针对X射线自支撑透射光栅在多能点单色成像光栅谱仪中的应用,采用电子束和光学匹配曝光、微电镀和高密度等离子体刻蚀技术,成功制备了周期为500nm、金吸收体厚度为350nm、占空比接近1∶1,满足三个能点成像需求的2000lp/mm X射线自支撑透射光栅。首先利用电子束光刻和微电镀技术制备金光栅图形,然后采用紫外光刻和微电镀技术制作自支撑结构,最后通过腐蚀体硅和感应耦合等离子体刻蚀聚酰亚胺完成X射线自支撑透射光栅的制作。在电子束光刻中,采用几何校正和高反差电子束抗蚀剂实现了对纳米尺度光栅图形的精确控制。实验结果表明,同一个器件分布的三块光栅占空比合理,栅线平滑,可以满足单能点单色成像谱仪的要求。 相似文献
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