荧光波长对共焦显微镜成像特性的影响

导出了共焦显微镜中不同荧光波长情况下的荧光功率传输函数、三维脉冲响应函数（3D－PSF）和三维光学传递函数（3D－OTF）。结果表明，不同的荧光波长对共焦显微镜的空间截止频率、分辨率、光学传递函数存在明显的影响。当激发波长与荧光波长的比值下降到一定程度时，可以看到明显的失锥现象。     

PECVD制备a-C:H:N薄膜的微观结构研究

非晶含氢碳膜(amorphous ydmgenated arbon a-C：H films)在力学、热学、电学、化学、光学等方面具有优异的性能，被广泛应用于诸多领域，有巨大的应用前景。随着a-C：H薄膜制备技术的进一步完善，在此基础上的改性材料又引起了人们的注意。氮掺杂类金刚石薄膜(a-C：H：N)近年来成为人们研究的     

减反射薄膜的制备及其性能

使用射频溅射和溶胶-凝胶(Sol—Gel)两种方法在玻璃表面制备SiO2减反射薄膜，比较两种方法制备的薄膜减反效果。分析了Sol—Gel方法中溶胶浓度、陈化时间以及退火温度对薄膜透过率的影响。当溶胶浓度为0．4M、陈化时间为6天以及退火温度达450℃时，制得的样品透过率可达99．3％，采用红外光谱分析了SiO2溶胶及凝胶的结构变化过程，发现随着陈化时间和退火温度增加，Si—O—Si键增强。     

浆纱工艺的优化和控制

应用微机现场检测、显示、采集浆纱生产过程工艺参数，采用ＳＮ比正交试验优化浆纱工艺，并对最佳工艺实施控制和生产工序进行科学管理，从而提高布机织造质量和效率，取得显著经济效益。     

重化工业与新型工业化是辩证的统一

重化工业与新型工业化事实上是辩证统一的关系，以信息化带动工业化不仅是新型工业化的指导思想，也是重化工业自身发展的必然要求。一方面，包括信息工业在内的高科技产业的研究成果将广泛应用和服务于重化工业；另一方面，重化工业对高科技产业又提出了技术方面的要求，并为其发展提供必要的资金和人力资源的支持。这样，通过重化工业与高科技产业的相互融合、相互促进，将会有力地推动粗放型工业化向集约型工业化的转变。     

电信英语及其缩略语解释（二十八）

DSR Dynamie Souree Routing 动态源路由DSRC DedieatedS}lort Range Comrnunieation 专用短程通信nSRS Data Signal Rate Seleetion 数据信号速率选择DSS Data Storage System 数据存储系统DSS Deeision Support System 决策支持系统DSS Digital Satellite System 数字卫星系统DSS Digital Signa一ure Standard 数字签名标准 这是用于电子商务的安全标准。DSS Digital Subseriber Serviee 数字用户业务DSS Direet Satellite System 直播卫星系统DSS Direetory Serviee System 目录服务系统DSSI Digital Subser…     

Ohmic Radio-Frequency Synergy Current Drive and Transformer Recharging Experiments in the HT-7 Tokamak

Lower hybrid current drive (LHCD) experiments for investigating the interaction between lower hybrid (LH) wave and residual dc electric field were performed in extensive plasma parameter ranges in the HT-7 superconducting tokamak. The experimental results are well fitted to the Karney-Fisch theory on the efficiency of LH waves energy converted to poloidal magnetic field energy. The fraction of absorbed LH power is about 0.75 for the HT-7 machine, and the upshift of the LH-wave parallel refraction index during LHCD experiments have been derived by the optimizing fitting parameters. The LH wave is also used for the transformer recharging when the plasma current is maintained unchanged. The highest efficiency about 7% has been achieved in HT-7 machine.     

Fabrication and Characterization of Ni Thin Films Using Direct-Current Magnetron Sputtering

Ni films are deposited by using ultra high vacuum dc magnetron sputtering onto silicon substrates at room temperature, and the high-quality and high-density films are prepared. The parameters, such as thickness, density and surface roughness, are obtained by using small-angle x-ray diffraction (XRD) analyses with the Marquardt gradient-expansion algorithm. The deposition rate is calculated and the Ni single layer can be fabricated precisely. Based on the fitting results, we can find that the surface roughness of the Ni films is about 0.7nm, the densities of Ni films are around 97% and the deposition rate is 0.26nm/s. The roughness of the surface is also characterized by using an atomic force microscope (AFM). The changing trend of the surface roughness in the simulation of XRD is in good agreement with the AFM measurement.     

系列类立方烷型Fe4S4簇合物的XPS分析

对7种类立方烷型Fe_4S_4簇合物进行了XPS分析,得到了中心离子Fe的价态,给出了系列Fe_4S_4中骨架硫的结合能,由峰合成结果给出各种S、N的比例与按结构式计算的结果相同。