一种基于滤波器组的自适应门限窄带干扰抑制方法

针对直接序列扩频(DSSS)通信中的强窄带干扰,提出了一种基于重叠变换滤波器组的自适应门限窄带干扰抑制技术.该技术根据接收信号经过滤波器组后的统计特性,确定窄带干扰与扩频信号之间的阈值.通过降低高于阈值的子带信号的强度,降低了处理后的信号中的干扰能量,使接收信号的信噪比大大提高.     

先进的微生物芯片检测系统及其应用

发展了一种先进的微生物芯片检测方法,并研制用于芯片检测的新型数字化成像扫描检测系统。采用激光诱导荧光的检测原理设计一种新颖的CCD数字化成像扫描检测系统结构,荧光信号采集端的数值孔径NA=0．72,工作距离3．22 mm,系统检测灵敏度小于每平方微米1个荧光分子。以微生物大肠杆菌和黄单胞菌检测为例,设计基因芯片,并应用所研制的芯片检测系统实现了微生物的正确鉴定,提供了一种高效的食品安全检测整体解决方法。实验结果表明两种微生物的芯片检测实验结果稳定可靠,与国外共焦扫描仪检测的结果完全一致。     

全面了解高清晰度电视兼议地面广播移动接收

高清晰度电视(以下简称高清电视)是在现代微电子技术、通信技术和信息技术高度发展的基础上集多方面的成就于一身的高科技产物,在我国已是热门话题。它的发展标志着一个国家的技术水平和经济实力,并能带动整个电子信息技术及相关产业领域的发展,成为技术发展的驱动器和经济发展的倍增器。高清电视是在现行三大彩色电视广播制式存在着一系列缺陷的情况下开发研制出来的新的电视系统。日本N H K率先从上世纪六十年代末开始探索新的电视系统,提出了H D T V这个术语并被各国普遍接受。“高清晰度电视”一词名称的概念是不完整、不确切的,它容…     

Coherent Scattering of Light by Bose-Einstein Condensation in a Tight Confinement

We have observed strong scattering of a probe light by dilute Bose-Einstein condensate （BEC） ^87Rb gas in a tight magnetic trap. The scattering light forms fringes at the image plane. It is found that we can infer the real size of the condensation and the number of the atoms by modelling the imaging system. We present a quantitative calculation of light scattering by the condensed atoms. The calculation shows that the experimental results agree well with the prediction of the generalized diffraction theory, and thus we can directly observe the phase transition of BEC in a tight trap.     

解读"十一五"发展纲要中推进三网融合的含义

2006年3月14日我国政府正式公布的“十一五”发展纲要提出：“加强宽带通信网、数字电视网和下一代互联网等信息基础设施建设,推进‘三网融合’,健全信息安全保障体系”,对前一个五年规划中“促进电信、电视、计算机三网融合”的提法做了进一步的界定.     

All-Optical RZ-to-NRZ Format Conversion with a Tunable Fibre Based Delay Interferometer

All-optical format conversion from return-to-zero （RZ） to non-return-to-zero （NRZ） is demonstrated with temperaturecontrolled all-fibre delay interferometer （DI） at 20 Gb/s. The operation principle is theoretical analysed with the help of numerical simulation and spectra analysis. Theoretical analysis results are consistent well with the experimental results. The format conversion can be achieved with power penalty of 0.54 dB and with output extinction ratio 20 dB.     

Growth and Characterization of A1GaN/A1N/GaN HEMT Structures with a Compositionally Step-Graded A1GaN Barrier Layer

A new A1GaN/A1N/GaN high electron mobility transistor （HEMT） structure using a compositionally step-graded A1GaN barrier layer is grown on sapphire by metalorganic chemical vapour deposition （MOCVD）. The structure demonstrates significant enhancement of two-dimensional electron gas （2DEG） mobility and smooth surface morphology compared with the conventional HEMT structure with high A1 composition A1GaN barrier. The high 2DEG mobility of 1806 cm2/Vs at room temperature and low rms surface roughness of 0.220 nm for a scan area of 5μm×5 μm are attributed to the improvement of interracial and crystal quality by employing the stepgraded barrier to accommodate the large lattice mismatch stress. The 2DEG sheet density is independent of the measurement temperature, showing the excellent 2DEG confinement of the step-graded structure. A low average sheet resistance of 314.5Ω/square, with a good resistance uniformity of 0.68%, is also obtained across the 50 mm epilayer wafer. HEMT devices are successfully fabricated using this material structure, which exhibits a maximum extrinsic transconductance of 218 mS/ram and a maximum drain current density of 800 mA/mm.     

Ab Initio Comparative Study of Zincblende and Wurtzite ZnO

By employing the first-principles pseudopotential plane-wave method, the physical properties of zincblende ZnO are investigated in comparison with those of the common wurtzite structure. Zincblende ZnO is predicted to be a direct gap semiconductor. Compared to the wurtzite structure, the zincblende ZnO is characterized by smaller bandgap and pressure coefficient, larger electron effective mass, increasing static dielectric constants and more covalent bonding. Furthermore, the optical properties including dielectric function and energy loss function of zincblende ZnO were obtained and analysed with some features. These aspects reveal promising applications of zincblende ZnO in optoelectronic devices.     

含有低温AlN插入层的厚膜GaN的氢化物气相外延生长

研究了采用低温氮化铝(LT-AlN)插入层的厚膜GaN的氢化物气相外延生长(HVPE),并比较了7nm厚的LT-AlN插入层在经过不同退火时间后对GaN膜生长的影响.结果表明,退火后的LT-AlN插入层表面形貌发生很大变化.在一定的退火条件下,AlN插入层能有效地改善HVPE生长的GaN外延层的结晶质量.     

AlN外延薄膜的生长和特征

文章研究了AlN薄膜的晶体质量、表面形貌、应力等性质与AlN生长工艺的依赖关系。通过对低温成核厚度、成核温度和高温生长AlN所用Ⅴ／Ⅲ比的研究，制备出了具有较好晶体质量的AlN薄膜。高分辨三晶X射线衍射给出AlN薄膜的(002)和(105)的半高宽分别为16．9arcsec和615arcsec，接近国际上报道的较好结果。原子力显微镜对表面形貌的分析表明AlN薄膜的粗糙度为5．7nm。拉曼光谱表明E2(high)模向高能方向移动，说明蓝宝石上外延的AlN薄膜处于压应变状态。光学吸收谱在204nm处具有陡峭的带边吸收，也表明了AlN外延薄膜具有较好地晶体质量。