ZnCdSe量子点的MOCVD生长及其演变

利用应力释放模型计算了 Zn Cd Se/Ga As间的临界厚度 ,并以该临界厚度为基础 ,用 MOVCD设备在Stranski-Krastanow (S-K)生长模式下 ,外延生长了 Zn Cd Se量子点。用原子力显微镜和光谱测量的方法研究了量子点的演化过程。随着时间的推移 ,量子点发生了两种变化 ,即 Ostwald熟化过程和量子点的生成过程。另外 ,量子点由尖塔状逐渐演化为圆顶状。这种形状的变化可以用晶体生长模型进行解释。通过分析量子点样品的发光光谱 ,发现了两种发光机制 ,一种是零维量子点激子的发光 ,另一种是二维激子的发光。随着量子点生长完毕与加盖层之间间隔时间的增加 ,零维激子对二维激子发光的比值增加 ,且发光峰位明显红移。这从另一方面验证了由原子力显微镜直接观测到的量子点的演化过程     

Growth and optical characteristics of ZnCdSe/ZnSe QWs on Si substrate with ZnO buffer

In this paper, the growth and characteristics of ZnCdSe/ZnSe quantum wells (QWs) prepared on ZnO-Si (111) templates are reported. An oriented ZnO thin film with a smooth surface was employed to be the buffer layer for the ZnCdSe/ZnSe QWs growth. Scanning electron microscopy (SEM) patterns showed that the ZnO buffer layer improved the smoothness of the ZnCdSe/ZnSe sample. Up to the 3rd longitudinal optical phonon of Zn0.56Cd0.44Se observed in Raman spectra suggests that the crystal quality of ZnCdSe/ZnSe QWs is reasonably good. The influence of quantum confinement effect on exciton characters of the QWs was also demonstrated.     

Spectroscopy of the Forming Process of Quantum Dots Accompanied by the Thinning of Wetting Layer

A series of Cd0.44Zn0.56Se/ZnSe sandwich structures with different Cd0.44Zn0.56Se embedded layer thicknesses were fabricated by metal organic chemical vapor deposition. When the embedded layer thickness exceeded 3.0 nm, the photoluminescence spectra of the sample changed into the two-band structure from the one-band structure, and atomic force microscopy images indicate that Cd0.44Zn0.56Se quantum dots were formed. In the two-band photoluminescence spectrum, the band at the low energy side was attributed to be from quantum dots, and the high-energy one arose from the wetting layer. Thinning of the wetting layer with quantum dots forming was confirmed indirectly by the significant blue shift of the wetting-layer photoluminescence band compared to the photoluminescence band of the samples for which the Cd0.44Zn0.56Se layer thickness was less than 3.0nm. This thinning arose from mass migration during the Stranski-Krastanow growth of Cd0.44Zn0.56Se quantum dots.     

ZnO-based deep-ultraviolet light-emitting devices

Deep-ultraviolet(DUV) light-emitting devices(LEDs) have a variety of potential applications.Zinc-oxide-based materials,which have wide bandgap and large exciton binding energy,have potential applications in high-performance DUV LEDs.To realize such optoelectronic devices,the modulation of the bandgap is required.This has been demonstrated by the developments of Mg_xZn_(1-x)O and Be_xZn_(1-x)O alloys for the larger bandgap materials.Many efforts have been made to obtain DUV LEDs,and promising successes have been achieved continuously.In this article,we review the recent progress of and problems encountered in the research of ZnO-based DUV LEDs.     

ZnCdSe量子点的激子行为研究

用金属有机化学气相沉积(MOCVD)的方法在晶格失配较小的情况下制备了ZnCdSe量子点。并用原子力显微镜(AFM)和极低温度下的发光光谱确认了量子点的形成。原子力显微镜观测的形貌变化发现。随着生长后时间的增加,量子点的尺寸逐渐增大。而密度减小,这是由于熟化过程作用的结果。随着量子点生长完毕与加盖层之间间隔时间的增加,量子点的发光峰位明显红移,且由变温光谱得到的激子束缚能逐渐变小。这可以解释为随着间隔时间的增加,量子点的熟化过程导致量子点的尺寸增大,量子限域效应减弱所致。     

梯度组分缓冲层诱导的单一立方相Mg_(0.3)Zn_(0.7)O薄膜外延生长

为了实现MgZnO合金带隙全跨度调制,利用低压MOCVD设备,在c面蓝宝石衬底上采用MgO籽晶层和组分渐变缓冲层控制立方相MgxZn1-xO薄膜的生长,获得了Zn组分达到0.7的单一立方相MgxZn1-xO薄膜,把MgZnO合金带隙调制范围从MgO一侧扩展到了4.45 eV,覆盖了整个日盲紫外波段。对比实验分析表明,这种高Zn组分立方相MgZnO薄膜的生长得益于缓冲层晶格模板的结构诱导作用和适宜的生长温度(350~400℃)。Mg0.3Zn0.7O基MSM结构紫外探测器响应峰位于270 nm,截止波长295 nm。     

硼对氮掺杂的p型ZnO薄膜的影响

利用分子束外延设备在蓝宝石衬底上生长了B/N共掺的p型ZnO薄膜,对比了B/N共掺和N单掺杂样品的物理学性能。通过X射线光电子能谱测试证明了在薄膜中存在有B和B-N键。B/N共掺样品的空穴浓度比单一N掺杂样品高近两个量级。且ZnO：（B,N）薄膜在两年多的时间内一直显示稳定的p型电导。这是由于B-N键的存在提高了N在ZnO薄膜中的固溶度,且B-N键之间强的键能和B占据Zn位所表现的弱施主特性不会带来强的施主补偿效应,说明B是N掺杂ZnO薄膜的一种良好的共掺元素。