微流路生物芯片的研制

运用光刻、刻蚀技术在载玻片上刻蚀出条宽70μm、深30μm、长7cm的沟槽，与另一载玻片键合，形成一微流路沟道，研制出了用于生物电泳技术的微流路生物芯片。在该芯片的研制中，克服了湿法腐蚀、断线、键合等技术难题。该芯片已经交付合作单位使用，能够满足应用中的基本性能要求。     

220 GHz折叠波导UV-LIGA微加工工艺

真空电子器件的频率正向太赫兹频段发展,折叠波导慢波结构是行波管的核心部件,由于真空器件的尺寸与波长具有共渡性,频率越高,互作用结构的尺度越小,加工误差的要求越严格。传统的加工方法很难实现如此微小尺寸的结构,UV-LIGA技术对于制造这种微型结构是一种很有前途的方法。用UV-LIGA方法制备真空器件的慢波结构,涉及到两个主要的问题:一是SU8厚胶匀胶过程中如何确保其厚度及其一致性;二是横向贯穿折叠波导中心的电子注通道如何成型。以220 GHz折叠波导为研究对象,针对上述两个问题开展了相关的工艺试验,使用特制的PDMS模具,采用重力匀胶法,实现了大厚度SU8胶匀胶,表面平整,高度一致。在SU8光刻胶中通过专用夹具,嵌入透明有机丝,形成细长电子注通道。而后,采用脉冲电铸电源,在硫酸铜电铸液中电铸,获得了表面平整的无氧铜微结构。     

Photoelectric characteristics of silicon P–N junction with nanopillar texture:Analysis of X-ray photoelectron spectroscopy

Silicon nanopillars are fabricated by inductively coupled plasma(ICP) dry etching with the cesium chloride(CsCl)islands as masks originally from self-assembly. Wafers with nanopillar texture or planar surface are subjected to phosphorus(P) diffusion by liquid dopant source(POCl3) at 870℃ to form P–N junctions with a depth of 300 nm. The X-ray photoelectron spectroscopy(XPS) is used to measure the Si 2p core levels of P–N junction wafer with nanopillar texture and planar surface. With a visible light excitation, the P–N junction produces a new electric potential for photoelectric characteristic, which causes the Si 2p core level to have a energy shift compared with the spectrum without the visible light.The energy shift of the Si 2p core level is-0.27 eV for the planar P–N junction and-0.18 eV for the nanopillar one. The difference in Si 2p energy shift is due to more space lattice defects and chemical bond breaks for nanopillar compared with the planar one.     

新型LIGA掩摸板制造工艺研究

LIGA掩模板的制备是LIGA技术中的关键工艺。利用最近发展起来的硅感应耦合等离子体（ICP）深层刻蚀工艺开发出了新型LIGA掩模板。与其它类型的LIGA掩模板相比，该掩模板具有加工工艺简单、价格低廉等优点。利用该LIGA掩模板进行了LIGA技术的研究，得到了比较理想的结果。     

LIGA技术制造微流量计的研究

介绍了利用ＬＩＧＡ技术中的同步辐射光刻、微电铸技术和微装配技术制作微流量计的研究，讨论了微流量计的结构和工作原理。设计和研制了一种微流量计。     

Investigation of GEM-Micromegas detector on X-ray beam of synchrotron radiation

To reduce the discharge of the standard bulk Micromegas and GEM detectors, a GEM-Micromegas detector was developed at the Institute of High Energy Physics. Taking into account the advantages of the two detectors, one GEM foil was set as a preamplifier on the mesh of Micromegas in the structure and the GEM preamplification decreased the working voltage of Micromegas to significantly reduce the effect of the discharge. At the same gain, the spark probability of the GEM-Micromegas detector can be reduced to a factor 0.01 compared to the standard Micromegas detector, and an even higher gain could be obtained. This paper describes the performance of the X-ray beam detector that was studied at 1W2B Laboratory of Beijing Synchrotron Radiation Facility. Finally, the result of the energy resolution under various X-ray energies was given in different working gases. This indicates that the GEM-Micromegas detector has an energy response capability in an energy range from 6 keV to 20 keV and it could work better than the standard bulk-Micromegas.     

电铸在LIGA技术中的应用

近年来，电铸在微细加工中的应用得到了较快发展，尤其在近几年高速发展的ＬＩＧＡ技术的掩模加工和其应用产品中，该技术充分体现出了字的优越性能和潜在的应用前景。本文结合ＬＩＧＡ技术掩模的加工及其电铸产品，用已取得的实验结果来说明电铸的应用潜力。     

LIGA和微细EDM技术制造不锈钢微结构的研究

通过LIGA技术与微细电火花技术相结合，可以在硬质合金、不锈钢等材料上加工出微结构，这一新的方法必将拓宽微细加工的能力和应用范围。利用LIGA技术制备线宽70μm、厚度达730μm的铜工具电极，采用微细电火花技术在不锈钢片上加工出线宽90μm、具有复杂形状的微结构。     

micro-bulk工艺micromegas的研究

本文介绍了micromegas探测器的主要工艺----micro-bulk工艺.并使用⁵⁵Fe放射源对制作完成的micro-bulk工艺原理探测器 进行了测试,对比了与绝缘丝工艺原理探测器能量分辨率的差别,并进一步研究了micro-bulk工艺探测器电子透过率等性能测试 的结果.     

BSRF上同步辐射深度光刻的实验研究

大结构深度和高深宽比是同步辐射深度光刻的突出优点.提出采用现有掩模,进行多次曝光、显影的方法,实验获得厚2.2mm的胶结构.系列研究掩模、光刻胶、基底、光谱和光强对深宽比的影响,实验获得深宽比104的胶结构.