解读"十一五"发展纲要中推进三网融合的含义

2006年3月14日我国政府正式公布的“十一五”发展纲要提出：“加强宽带通信网、数字电视网和下一代互联网等信息基础设施建设,推进‘三网融合’,健全信息安全保障体系”,对前一个五年规划中“促进电信、电视、计算机三网融合”的提法做了进一步的界定.     

NiFe/Ag/NiFe纳米结自旋晶体管研究

利用直流磁控溅射工艺和掩膜技术研制出新型NiFe/Ag/NiFe全金属自旋晶体管试样。该薄膜磁阻系数ΔR/R≥9%,全金属自旋晶体管试样集电极电流变化MC>587%(常温),且其性能随基极Ag层厚度减小而增强。全金属自旋晶体管具有电流放大、存贮及逻辑电路等功能,,有望替代现有的晶体管而应用于半导体大规模集成电路。     

All-Optical RZ-to-NRZ Format Conversion with a Tunable Fibre Based Delay Interferometer

All-optical format conversion from return-to-zero （RZ） to non-return-to-zero （NRZ） is demonstrated with temperaturecontrolled all-fibre delay interferometer （DI） at 20 Gb/s. The operation principle is theoretical analysed with the help of numerical simulation and spectra analysis. Theoretical analysis results are consistent well with the experimental results. The format conversion can be achieved with power penalty of 0.54 dB and with output extinction ratio 20 dB.     

Growth and Characterization of A1GaN/A1N/GaN HEMT Structures with a Compositionally Step-Graded A1GaN Barrier Layer

A new A1GaN/A1N/GaN high electron mobility transistor （HEMT） structure using a compositionally step-graded A1GaN barrier layer is grown on sapphire by metalorganic chemical vapour deposition （MOCVD）. The structure demonstrates significant enhancement of two-dimensional electron gas （2DEG） mobility and smooth surface morphology compared with the conventional HEMT structure with high A1 composition A1GaN barrier. The high 2DEG mobility of 1806 cm2/Vs at room temperature and low rms surface roughness of 0.220 nm for a scan area of 5μm×5 μm are attributed to the improvement of interracial and crystal quality by employing the stepgraded barrier to accommodate the large lattice mismatch stress. The 2DEG sheet density is independent of the measurement temperature, showing the excellent 2DEG confinement of the step-graded structure. A low average sheet resistance of 314.5Ω/square, with a good resistance uniformity of 0.68%, is also obtained across the 50 mm epilayer wafer. HEMT devices are successfully fabricated using this material structure, which exhibits a maximum extrinsic transconductance of 218 mS/ram and a maximum drain current density of 800 mA/mm.     

Room-Temperature Ferromagnetism of Co-Doped CeO2 Thin Films on Si（111） substrates

Using Co2O3 as the Co source, doped cerium oxide thin films with the composition of Ce0.97C00.03O2-δ （CCO） are deposited on Si（111） and glass substrates by pulse laser deposition technique. X-ray diffraction reveals that CCO films with （111） preferential orientation are grown on Si, while the fihn on glass is polycrystalline with nanocrystal. X-ray photoelectron spectroscopy shows that the （Jo displaces the （;e atom and exists in high spin state rather than low spin state, which contributes to the room-temperature ferromagnetism confirmed by vibration sample magnetometer. I~ilms on Si and glass are different in ferromagnetism, which is believed to be induced by different film microstructures. Based on these results, the possible ferromagnetism in this insulating film is discussed. Anyway, successful fabrication of CCO films with room-temperature ferromagnetism on Si substrates is of great importance in both technological and theoretical aspects.     

Ab Initio Comparative Study of Zincblende and Wurtzite ZnO

By employing the first-principles pseudopotential plane-wave method, the physical properties of zincblende ZnO are investigated in comparison with those of the common wurtzite structure. Zincblende ZnO is predicted to be a direct gap semiconductor. Compared to the wurtzite structure, the zincblende ZnO is characterized by smaller bandgap and pressure coefficient, larger electron effective mass, increasing static dielectric constants and more covalent bonding. Furthermore, the optical properties including dielectric function and energy loss function of zincblende ZnO were obtained and analysed with some features. These aspects reveal promising applications of zincblende ZnO in optoelectronic devices.     

含有低温AlN插入层的厚膜GaN的氢化物气相外延生长

研究了采用低温氮化铝(LT-AlN)插入层的厚膜GaN的氢化物气相外延生长(HVPE),并比较了7nm厚的LT-AlN插入层在经过不同退火时间后对GaN膜生长的影响.结果表明,退火后的LT-AlN插入层表面形貌发生很大变化.在一定的退火条件下,AlN插入层能有效地改善HVPE生长的GaN外延层的结晶质量.     

AlN外延薄膜的生长和特征

文章研究了AlN薄膜的晶体质量、表面形貌、应力等性质与AlN生长工艺的依赖关系。通过对低温成核厚度、成核温度和高温生长AlN所用Ⅴ／Ⅲ比的研究，制备出了具有较好晶体质量的AlN薄膜。高分辨三晶X射线衍射给出AlN薄膜的(002)和(105)的半高宽分别为16．9arcsec和615arcsec，接近国际上报道的较好结果。原子力显微镜对表面形貌的分析表明AlN薄膜的粗糙度为5．7nm。拉曼光谱表明E2(high)模向高能方向移动，说明蓝宝石上外延的AlN薄膜处于压应变状态。光学吸收谱在204nm处具有陡峭的带边吸收，也表明了AlN外延薄膜具有较好地晶体质量。     

索尼BETACAM-SP录像机故障码的作用

文章讲解了索尼BETACAM-SP录像机故障码的含义以及排查故障的方法,并列举了一些常见故障的解决方法。     

美丽文件带着走 电子文件网上飞──华康科技推出便携文件专家DynaDoc3.5

随着电子信息时代的来临，电子文件的传递交流在人们的日常工作中所占的位置越来越重要。但由于不同的平台、不同的语种、不同的应用软件等原因，给文件的交流造成了极大的困扰，例如显示乱码，显示、打印格式与原排版格式不同等。华康科技开发有限公司最近推出便携文件专...