On the energy distribution profile of interface states obtained by taking into account of series resistance in Al/TiO2/p-Si (MIS) structures

The energy distribution profile of the interface states (N_ss) of Al/TiO₂/p-Si (MIS) structures prepared using the sol-gel method was obtained from the forward bias current-voltage (I-V) characteristics by taking into account both the bias dependence of the effective barrier height (?_e) and series resistance (R_s) at room temperature. The main electrical parameters of the MIS structure such as ideality factor (n), zero-bias barrier height (?_b0) and average series resistance values were found to be 1.69, 0.519 eV and 659 Ω, respectively. This high value of n was attributed to the presence of an interfacial insulator layer at the Al/p-Si interface and the density of interface states (N_ss) localized at the Si/TiO₂ interface. The values of N_ss localized at the Si/TiO₂ interface were found with and without the R_s at 0.25-E_v in the range between 8.4×10¹³ and 4.9×10¹³ eV⁻¹ cm⁻². In addition, the frequency dependence of capacitance-voltage (C-V) and conductance-voltage (G/ω-V) characteristics of the structures have been investigated by taking into account the effect of N_ss and R_s at room temperature. It can be found out that the measured C and G/ω are strongly dependent on bias voltage and frequency.     

Synthesis, interface (Au/M2Pc2/p-Si), electrochemical and electrocatalytic properties of novel ball-type phthalocyanines

The phthalodinitrile derivative (3) was prepared by the reaction of 4,4'-(octahydro-4,7-methano-5H-inden-5-ylidene)bisphenol (1) and 4-nitrophthalonitrile (2) with dry DMF as the solvent in the presence of the base K(2)CO(3) by the method of nucleophilic substitution of an activated nitro group in an aromatic ring. The template reaction of 3 with the corresponding metal salts gave the novel bi-nuclear ball-type metallophthalocyanines, MPcs {M = Co (4), Cu (5), Zn (6)}. Newly synthesized compounds were characterized by elemental analysis, UV-vis, FT-IR (ATR), MALDI-TOF mass and (1)H-NMR spectroscopy techniques. The electronic spectra exhibit an intense π→π* transition of characteristic Q and B bands of the Pc core. The dielectric properties and interface between the spin coated films of 4-6 and a p-type silicon substrate have been studied by fabricating metal-insulator-semiconductor capacitors. The results indicated that the frequency dependence of the dielectric permittivity, ε'(ω), exhibits non-Debye type relaxation for all the temperatures investigated. The ac conductivity results indicated that the conduction mechanism can be explained by a hopping model at low temperatures (<430 K) and a free band conduction mechanism at high temperatures (≥430 K). The density of interface state calculations on these novel compounds showed that the combination of Au/4/p-Si is a promising structure with a high dielectric constant and a low interface trap density suitable for metal-oxide-semiconductor devices. The electrochemical properties of the Pc complexes were examined by cyclic voltammetry, differential voltammetry and controlled potential coulometry on platinum in non-aqueous media. The complexes showed ring-based and/or metal-based mixed-valence behaviours as a result of the remarkable interaction between the two Pc rings and/or metal centres. The mixed-valence splitting values for the complexes suggested that the mixed valence species are considerably stable. The Vulcan XC-72(VC)/Nafion(Nf)/4 modified glassy carbon electrode showed much a higher catalytic performance towards oxygen reduction than those of VC/Nf/5 and VC/Nf/6 modified ones.     

The effect of gamma irradiation on electrical and dielectric properties of organic-based Schottky barrier diodes (SBDs) at room temperature

The effect of ⁶⁰Co (γ-ray) irradiation on the electrical and dielectric properties of Au/Polyvinyl Alcohol (Ni,Zn-doped)/n-Si Schottky barrier diodes (SBDs) has been investigated by using capacitance-voltage (C-V) and conductance-voltage (G/ω-V) measurements at room temperature and 1 MHz. The real capacitance and conductance values were obtained by eliminating series resistance (R_s) effect in the measured capacitance (C_m) and conductance (G_m) values through correction. The experimental values of the dielectric constant (ε′), dielectric loss (ε″), loss tangent (tanδ), ac electrical conductivity (σ_ac) and the real (M′) and imaginary (M″) parts of the electrical modulus were found to be strong functions of radiation and applied bias voltage, especially in the depletion and accumulation regions. In addition, the density distribution of interface states (N_ss) profile was obtained using the high-low frequency capacitance (C_HF-C_LF) method for before and after irradiation. The N_ss-V plots give two distinct peaks for both cases, namely before radiation and after radiation, and those peaks correspond to two different localized interface states regions at M/S interface. The changes in the dielectric properties in the depletion and accumulation regions stem especially from the restructuring and reordering of the charges at interface states and surface polarization whereas those in the accumulation region are caused by series resistance effect.