大面积α-Fe2O3纳米线及纳米带阵列的制备研究

以铁箔为原材料和基片,通过控制热氧化过程中的宏观实验条件(载气流量及其组分、压强、温度分布和反应时间等),实现了α-Fe₂O₃一维纳米结构的可控生长,获得了大面积(10mm×10mm)、单分散性好、沿［110］方向生长的α-Fe₂O₃纳米带或纳米线阵列. 对不同宏观实验条件下所制备的样品进行形貌和晶格结构表征和分析,认为热氧化过程中α-Fe₂O₃一维纳米结构的生长遵循类似气- 关键词： 2O₃')" href="#">α-Fe₂O₃ 一维纳米结构 热氧化法     

Free-space Fresnel diffraction for the approximation of fractional Fourier transform

Fractional Fourier transformation of an object can be approximated by the object's free-space Fresnel diffraction pattern under some restricted conditions and plane wave illumination according to Hua's method. A better approximation is achieved under least-squared conditions developed in this paper. Simulation results verify that our theoretical development works for any fractional order a compared with the previous approach.     

纳米晶Y_2SiO_5∶Eu的浓度猝灭研究

报道了分别用溶胶－凝胶法合成的Ｙ２ＳｉＯ５∶Ｅｕ纳米晶和用高温固相法合成常规尺度的Ｙ２ＳｉＯ５∶Ｅｕ材料的光致发光光谱和猝灭浓度的实验研究．结果表明：纳米Ｙ２－ｘＥｕｘＳｉＯ５比常规尺度的Ｙ２－ｘＥｕｘＳｉＯ５有更高的猝灭浓度和更高的发光亮度．理论分析认为这是由于在纳米材料中能量共振传递被阻断和猝灭中心在各个纳米晶内分布的涨落造成的．这个结果为高亮度的Ｙ２ＳｉＯ５∶Ｅｕ纳米材料的实际开发应用展示了广阔前景．     

Repetition rate multipliers for efficient implementation of multiphoton and pump-probe fluorescence microscopy

With the advances in pulsed laser systems, microscopic imaging techniques such as multiphoton and pump-probe fluorescence microscopy have developed into effective tools for investigating intensity and time-resolved phenomena inside biological systems. However, pulsed lasers used in these techniques usually are commercial systems with repetition frequencies of around 80 MHz. While these systems have proven to be adequate for multiphoton and pump-probe microscopic imaging applications, the temporal separation of the laser pulse train (around 12.5 ns) is long compared to the fluorescence lifetimes of many common fluorescence species. In this work, we present the designs of repetition rate multipliers based on passive optical components that can be used to increase the efficiency in multiphoton and pump-probe fluorescence microscopy. Depending on the lifetime of fluorescence molecules under investigation, the passive repetition rate multiplier can increase the duty cycle of multiphoton or pump-probe microscopy up to fourfold.     

Strain effects on optical properties of pyramidal InAs/GaAs quantum dots

Strain distribution and optical properties in a self-assembled pyramidal InAs/GaAs quantum dot grown by epitaxy are investigated. A model, based on the theory of linear elasticity, is developed to analyze three-dimensional induced strain field. In the model, the capping material in the heterostructure is omitted during the strain analysis to take into account the sequence of the fabrication process. The mismatch of lattice constants is the driving source of the induced strain and is treated as initial strain in the analysis. Once the strain analysis is completed, the capping material is added back to the heterostructure for electronic band calculation. The strain-induced potential is incorporated into the three-dimensional steady-state Schrödinger equation with the aid of Pikus–Bir Hamiltonian with modified Luttinger–Kohn formalism for the electronic band structure calculation. The strain field, the energy levels and wave functions are found numerically by using of a finite element package FEMLAB. The energy levels as well as the wave functions of both conduction and valence bands of quantum dot are calculated. Finally, the transition energy of ground state is also computed. Numerical results reveal that not only the strain field but also all other optical properties from current model show significant difference from the counterparts of the conventional model.     

大面积α-Fe2O3纳米线及纳米带阵列的制备研究

以铁箔为原材料和基片,通过控制热氧化过程中的宏观实验条件(载气流量及其组分、压强、温度分布和反应时间等),实现了α-Fe2O3一维纳米结构的可控生长,获得了大面积(10mm×10mm)、单分散性好、沿[110]方向生长的α-Fe2O3纳米带或纳米线阵列. 对不同宏观实验条件下所制备的样品进行形貌和晶格结构表征和分析,认为热氧化过程中α-Fe2O3一维纳米结构的生长遵循类似气-固机制的顶端生长模式,生长点铁原子和氧原子比是控制α-Fe2O3一维纳米结构生长的关键因素.     

Evaluation of natural recharge of Chingshui geothermal reservoir using tritium as a tracer

Naturally existing tritium in groundwater was applied as a tracer to evaluate the natural recharge of the Chingshui geothermal reservoir. The residence time (or, age) of Chingshui geothermal water was first determined with tritium data at 15.2 and 11.3 year using the plug flow and dispersive model, respectively. The annual natural recharge was then estimated by combining the use of the residence time and the fluid-in-place of the Chingshui geothermal reservoir. The natural recharge for Chingshui geothermal reservoir was estimated at 5.0 × 10⁵ and 6.7 × 10⁵ m³ year^?1 using the plug flow and dispersive model, respectively. Chingshui geothermal water is largely from a fractured zone in the Jentse Member of the Miocene Lushan Formation. The dispersive model more adequately represents the fracture flow system than the simple plug flow model.     

Optimization of microcrystalline silicon thin film solar cell isolation processing parameters using ultraviolet laser

This study used ultraviolet laser to perform the microcrystalline silicon thin film solar cell isolation scribing process, and applied the Taguchi method and an L₁₈ orthogonal array to plan the experiment. The isolation scribing materials included ZnO:Al, AZO transparent conductive film with a thickness of 200 nm, microcrystalline silicon thin film at 38% crystallinity and of thickness of 500 nm, and the aluminum back contact layer with a thickness of 300 nm. The main objective was to ensure the success of isolation scribing. After laser scribing isolation, using the minimum scribing line width, the flattest trough bottom, and the minimum processing edge surface bumps as the quality characteristics, this study performed main effect analysis and applied the ANOVA (analysis of variance) theory of the Taguchi method to identify the single quality optimal parameter. It then employed the hierarchical structure of the AHP (analytic hierarchy process) theory to establish the positive contrast matrix. After consistency verification, global weight calculation, and priority sequencing, the optimal multi-attribute parameters were obtained. Finally, the experimental results were verified by a Taguchi confirmation experiment and confidence interval calculation. The minimum scribing line width of AZO (200 nm) was 45.6 μm, the minimum scribing line width of the microcrystalline silicon (at 38% crystallinity) was 50.63 μm and the minimum line width of the aluminum thin film (300 nm) was 30.96 μm. The confirmation experiment results were within the 95% confidence interval, verifying that using ultraviolet laser in the isolation scribing process for microcrystalline silicon thin film solar cell has high reproducibility.