Effective-Field Theory on High Spin Systems with Biaxial Crystal Field

Based on the effective-field theory with self-spin correlations and the differential operator technique,physical properties of the spin-2 system with biaxial crystal field on the simple cubic, body-centered cubic, as well as faced-centered lattice have been studied. The influences of the external longitudinal magnetic field on the magnetization,internal energy, specific heat, and susceptibility have been discussed in detail. The phenomenon that the magnetization in the ground state shows quantum effects produced by the biaxial transverse crystal field has been found.     

Orlicz范数下的Hardy-Hilbert不等式

给出了Orlicz范数下的Hardy-Hilbert不等式的一种形式,建立了当N-函数M(u)及其余N-函数N(u)均满足Δ′条件时Orlicz范数下的积分型及双级数型Hardy-Hilbert不等式.     

在可交换四元数空间中的双曲方程的特征边值问题

讨论了一阶和二阶双曲复方程的特征边值问题.对其中两种线性方程,分别在不同的情况下获得通解和可解条件.而对于拟线性的二阶双曲复方程,证明了解的存在性和唯一性.     

属性区间识别理论模型研究及其应用

根据程乾生教授创立的属性识别理论模型[1] ,提出了属性测度区间的概念 ,建立了属性区间识别理论模型 ,并在自然科学学术期刊质量评价中进行了应用 .     

函数模拟法求解锥形模超塑挤压的力学场——超塑挤压解析理论之一

本文首次用模拟位移函数的方法,给出锥形模超塑挤压力学场的解析式以及应变、应变速率和应力的约束方程。由于实验选用的是典型超塑性合金ZnAl₅,所以结果有相当的包络性。即使对于非典型超塑性材料,这种方法亦有普遍意义。     

标准体系的比例型寿命使用期模型与分析

本文在基于标准被废除按比例进行时的标准体系使用期的两个新模型。首先给出了模型假设条件,然后定义了标准使用期。根据假设给出了两个模型条件下的标准使用期公式,最后通过数值示例说明了标准使用期的公式使用。     

High-density plasma etching of indium-zinc oxide films in Ar/Cl2 and Ar/CH4/H2 chemistries

The dry etching characteristics of transparent and conductive indium-zinc oxide (IZO) films have been investigated using an inductively coupled high-density plasma. While the Cl₂-based plasma mixture showed little enhancement over physical sputtering in a pure argon atmosphere, the CH₄/H₂/Ar chemistry produced an increase of the IZO etch rate. On the other hand, the surface morphology of IZO films after etching in Ar and Ar/Cl₂ discharges is smooth, whereas that after etching in CH₄/H₂/Ar presents particle-like features resulting from the preferential desorption of In- and O-containing products. Etching in CH₄/H₂/Ar also produces formation of a Zn-rich surface layer, whose thickness (∼40 nm) is well-above the expected range of incident ions in the material (∼1 nm). Such alteration of the IZO layer after etching in CH₄/H₂/Ar plasmas is expected to have a significant impact on the transparent electrode properties in optoelectronic device fabrication.     

中物院远红外自由电子激光实验研究

中国工程物理研究院基于射频直线加速器技术的远红外自由电子激光(FIR-FEL)实验取得阶段性进展,于2005年3月24晚8时30分首次出光, 并多次重复. 中心波长115μm, 谱宽1%.介绍了实验系统的主要组成部分和主要实验结果.