Study of ultrathin iron silicide films grown by solid phase epitaxy on the Si(001) surface

Ultrathin films of iron silicide have been grown by high-temperature annealing of 0.14-to O.5O-nm-thick Fe films deposited on the Si(001) surface at room temperature. It has been found that annealing leads to the formation of nanoislands of iron silicide on the surface, so that their type depends on the thickness of the Fe film. High-energy electron diffraction and atomic force microscopy measurements have revealed that the deposition of Fe films less than 0.32 nm thick on the Si(001) surface stimulates epitaxial growth of both three-dimensional β-FeSi₂ and two-dimensional γ-FeSi₂ islands. It has been found that, for Fe coverages of more than 0.32 nm thick, a complete transition to solide phase epitaxy is observed only for two-dimensional β-FeSi₂ islands. The effect of prolonged annealing at 850°C on the morphology of the surface of the iron silicide film has been investigated.     

Influence of defects in a silicon dioxide thin layer on the processes of silicidation in the Fe/SiO2/Si(001) system

The kinetics of the evolution of the structure and phase composition of the Fe/SiO₂/Si(001) system under different conditions for deposition of the iron layer and subsequent annealing is considered. It is established that the SiO₂ thin layer (∼1 nm) is not destroyed during iron deposition over a wide temperature range from 20 to 650°C. As a result, iron films with different morphologies are formed on the surface of the oxide. Annealing leads to the destruction of the SiO₂ layer at defect sites. This brings about the interaction of iron atoms with the silicon substrate and subsequent formation of iron silicides. Original Russian Text ? V.V. Balashev, V.V. Korobtsov, T.A. Pisarenko, E.A. Chusovitin, 2009, published in Fizika Tverdogo Tela, 2009, Vol. 51, No. 3, pp. 565–571.     

ESI‐MS/MS of expanded porphyrins: a look into their structure and aromaticity

Electrospray mass spectrometry/mass spectrometry was used to investigate the gas‐phase properties of protonated expanded porphyrins, in order to correlate those with their structure and conformation. We have selected five expanded meso‐pentafluorophenyl porphyrins, respectively, a pair of oxidized/reduced fused pentaphyrins (22 and 24 π electrons), a pair of oxidized/reduced regular hexaphyrins (26 and 28 π electrons) and a regular doubly N‐fused hexaphyrin (28 π electrons). The gas‐phase behavior of the protonated species of oxidized and reduced expanded porphyrins is different. The oxidized species (aromatic Hückel systems) fragment more extensively, mainly by the loss of two HF molecules. The reduced species (Möbius aromatic or Möbius‐like aromatic systems) fragment less than their oxidized counterparts because of their increased flexibility. The protonated regular doubly fused hexaphyrin (non‐aromatic Hückel system) shows the least fragmentation even at higher collision energies. In general, cyclization through losses of HF molecules decreases from the aromatic Hückel systems to Möbius aromatic or Möbius‐like aromatic systems to non‐aromatic Hückel systems and is related to an increase in conformational distortion. Copyright © 2016 John Wiley & Sons, Ltd.