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151.
R. Reichel J. G. Partridge S. A. Brown 《Applied Physics A: Materials Science & Processing》2009,97(2):315-321
Bismuth and antimony clusters have been deposited onto spin coated PMMA layers patterned by electron-beam exposure. The probability
of reflection or adhesion of the clusters from the PMMA depended on its surface roughness, determined by the electron-beam
exposure dose. The Bi and Sb clusters exhibited a significantly higher probability of reflection from unexposed PMMA than
from Si3N4 (grown by plasma enhanced chemical vapor deposition) despite the approximately equal surface roughness of these layers. By
exploiting this difference in adhesion/reflection, a cluster-assembled wire was grown between four-point planar electrodes.
Four-probe electrical measurements yielded linear current-voltage (I(V)) characteristics whilst non-linear I(V) characteristics were obtained from two-probe measurements. An established model provided good agreement with two-probe conductance-voltage
and resistance-temperature data. Tunneling barriers between the cluster wire and the planar electrodes are believed to have
caused the non-linear two-point I(V) characteristics. 相似文献
152.
M. R. Field J. G. Partridge J. du Plessis D. G. McCulloch 《Applied Physics A: Materials Science & Processing》2009,97(3):627-633
The electrical and structural characteristics of hafnium oxide thin films reactively deposited from a filtered cathodic vacuum
arc have been investigated. X-ray photoelectron spectroscopy was used to determine the deposition conditions (Ar/O2 ratio) which produced stoichiometric HfO2 films. Cross-sectional transmission electron microscopy showed that the micro-structure of the films was highly disordered
with electron-diffraction analysis providing evidence for the presence of sub-nano-metre crystallites of the monoclinic HfO2 (P21/c) phase. Further evidence for the presence of this phase was provided by measuring the O k-edge using electron energy loss spectroscopy and comparing it with calculations performed using FEFF8.2, a multiple scattering
code. Surface imaging revealed that local film damage occurred in films deposited with substrate bias voltages exceeding −200 V.
The current-leakage characteristics of the HfO2 films deposited with a bias of approximately −100 V suggest that device grade HfO2 films can be produced from a filtered cathodic vacuum arc. 相似文献
153.
Journal of the Operational Research Society - 相似文献
154.
Vitamin D3 metabolites. I. Synthesis of 25-hydroxycholesterol 总被引:1,自引:0,他引:1
155.