Shape and topology optimization based on the phase field method and sensitivity analysis

This paper discusses a structural optimization method that optimizes shape and topology based on the phase field method. The proposed method has the same functional capabilities as a structural optimization method based on the level set method incorporating perimeter control functions. The advantage of the method is the simplicity of computation, since extra operations such as re-initialization of functions are not required. Structural shapes are represented by the phase field function defined in the design domain, and optimization of this function is performed by solving a time-dependent reaction diffusion equation. The artificial double well potential function used in the equation is derived from sensitivity analysis. The proposed method is applied to two-dimensional linear elastic and vibration optimization problems such as the minimum compliance problem, a compliant mechanism design problem and the eigenfrequency maximization problem. The numerical examples provided illustrate the convergence of the various objective functions and the effect that perimeter control has on the optimal configurations.     

Stereoselective synthesis of tetrahydrofuran-3-carbaldehyde

Trans-tetrahydrofuran-3-carbaldehydes are prepared by ruthenium-catalyzed isomerization of 4,7-dihydro-1,3-dioxepines and subsequent Lewis acid-catalyzed 1,3-alkyl migration.     

Highly refractive polymer resin derived from sulfur‐containing aromatic acrylate

New sulfur‐containing polymers with high‐refractive indices and low birefringences have been developed as UV‐curable high‐refractive polymer resins. The polymers derived from 2,7‐bis[(2‐acryloylethyl)sulfanyl]thianthrene (2,7‐BAST) and 4,4′‐bis[(acryloyloxyethylthio)diphenylsulfide (4,4′‐BADS) were prepared by photopolymerization under UV irradiation. Transparent UV‐cured films were obtained in both cases. Both polymers showed good thermal stability, such as a 5% weight‐loss temperature at 355 °C under nitrogen and glass transition temperatures (T_g) in the range of 94–143 °C. They also showed high‐refractive indices of 1.6531 and 1.6645 at 632.8 nm and low birefringences of 0.0039 and 0.0069 in addition to high transparency in the visible region. © 2010 Wiley Periodicals, Inc. J Polym Sci Part A: Polym Chem 48: 2604–2609, 2010     

Specific recognition of syndiotactic poly(methacrylic acid) in porous isotactic poly(methyl methacrylate) thin films based on the effects of stereoregularity,temperature, and solvent

The effects of stereoregularity, temperature, and solvent on the specific recognition of syndiotactic (st)‐poly(methacrylic acid) (PMAA) in macromolecularly porous isotactic (it)‐poly(methyl methacrylate) films were investigated to give important insights into the regularity and stability of nanospaces in the it‐PMMA films as well as template polymerization. The porous it‐PMMA films were fabricated on quartz crystal microbalance (QCM) substrates via the layer‐by‐layer (LbL) assembly of it‐PMMA/st‐PMAA, plus the st‐PMAA extraction from the assembly. QCM analysis and infrared spectroscopy revealed the first case of stereocomplex formation using st‐PMAA with lower stereoregularity (rr = 73%) in the LbL films, while st‐PMAA obtained with conventional free radical polymerization (rr = 62%) was barely incorporated into the porous it‐PMMA films. The maximum st‐PMAA incorporation increased from 25 to 40 °C, but there were almost no difference between 40 and 55 °C, indicating that the it‐PMMA crystallization would also be accelerated with increasing temperature. The studies on st‐PMAA incorporation with various complexing solvents revealed that the host it‐PMMA in the porous films could only form the original stereocomplex with 2/1 unit‐molar stoichiometry (st‐PMAA/it‐PMMA) in acetonitrile/water or ethanol/water. © 2010 Wiley Periodicals, Inc. J Polym Sci Part A: Polym Chem 48: 3651–3657, 2010     

Direct patterning of poly(amic acid) and low‐temperature imidization using a crosslinker,a photoacid generator,and a thermobase generator

A positive‐type photosensitive polyimide (PSPI) based on poly(amic acid) (PAA), a crosslinker 1,1,1‐tris{4‐[2‐(vinyloxy)ethoxy]phenyl}ethane (TVPE), a photoacid generator (PAG) (5‐propylsulfonyloxyimino‐5H‐thiophen‐2‐ylidene)‐2‐(methylphenyl)acetonitrile (PTMA), and a thermobase generator (TBG) t‐butyl 2,6‐dimethylpiperidine‐1‐carboxylate (BDPC) has been developed as a promising material in microelectronics. The PAA was prepared from 3,3′,4,4′‐biphenyltetracarboxylic dianhydride (BPDA) and 4,4′‐oxydianiline (ODA) in dimethyl sulfoxide (DMSO). The PSPI, consisting of PAA (69 wt %), TPVE (21 wt %), PTMA (3 wt %), and BDPC (7 wt %), showed high sensitivity of 21 mJ/cm² and a high contrast of 6.8 when it was exposed to a 436‐nm line (g‐line), postbaked at 90 °C for 5 min, and developed with 1.69 wt % TMAHaq. A clear positive image of 8 μm line and space pattern was printed on film, which was exposed to 50 mJ/cm² of g‐line by a contact printing mode and fully converted to the corresponding polyimide (PI) pattern on heating at 200 °C, confirmed by FTIR spectroscopy. Thus, this system will be a good candidate for next generation PSPIs. © 2009 Wiley Periodicals, Inc. J Polym Sci Part A: Polym Chem 47: 3362–3369, 2009