The First and Facile Synthesis of (±) Syringaresinol

The first and facile synthesis of (±)syringaresinol was described.     

关于群胚作用和李双代数胚态射

在这篇文章中，我们讨论了李双代数胚之间的态射，得到了一些李双代数胚之间态射的性质．研究了泊松群胚在泊松流形上的泊松作用，以及这个泊松作用与被作用流形的切李双代数胚到作用泊松群胚的切李双代数胚之间的态射的关系，得到了一些有用的结论。     

溴分子[^2Π3／2]4d里德堡态的转动谱的计算模拟

对溴分子在６８８００－７２００ｃｍ＾－１范围内的两个被观察到的［＾２Π３／２］４ｄ偶宇称里堡态的转动光谱进行了计算模拟，确定了转动常数，并且证实了原先对实验光谱的传动结构和电子角动量的标识。     

}MSo浸种对大麦种子萌发及若干性状的影响

本文报道二甲亚矾(DMSO)浸种影响大麦“早熟3号”种子的萌发以及浸种后种子的渗漏和呼吸强度等的变化.结果表明:在24℃条件干浸种，。.1%和5芳的DMSO明显促进种子的萌发，5劣DMSO浸种的促进作用尤为明显.然而这种影响效应在zs c条件下浸种则完全相反，对种子萌发有抑制作用，表现明显的温度效应.     

苯基取代聚乙炔中的元激发

苯环取代聚乙炔是一类具有简并基态的发光聚合物.利用扩展的SuSchriefferHeeger模型,研究了这类聚合物链中的孤子、极化子等元激发特性.结果表明:由于苯环与聚乙炔主链间的强π电子耦合,苯环取代抑制了聚乙炔主链的二聚化,减小了导带与价带之间的能隙;因此取代聚乙炔中的元激发具有较小的激发能,同时具有更大的相干长度.尽管苯基取代对元激发有很大的影响,但是非取代聚乙炔中元激发的基本物理规律依然成立,表明这些元激发的基本特性不受取代基团的影响 关键词： 孤子 极化子 苯基取代聚乙炔     

四（对-羟基苯基）卟啉氧合配合物的室温固相合成，表征及氧合能力

采用固相反应合成了四羟基苯基卟啉与与Fe^2＋,Co^2＋金属离子的配合物,在室温下,将其与分子O2作用,提纯后得到两种固态氧合配合物．通过元素分析、红外光谱（IR）、核磁共振氢谱（^1HNMR）、电导、热分析（TG／DTA）、紫外光谱（UV）等测试手段确定了氧合配合物的组成为[Co·THPP·O2]（NO3）2·2H2O、[Fe·THPP·O2]Cl2·2H2O]，可知1mol配合物吸收了1molO2,采用失重法测定了氧合配合物中的配位氧,确定1mol金属配合物吸收1molO2形成超氧配合物．     

Carnot-Caratheodory空间中的变换论

Klein发表著名的埃尔兰根纲领,由群论角度研究了空间变换群的不变量,从而引进了各种不同的几何学．本文利用Felix Klein的观念,研究Carnot-Caratheodory空间{M,Q,g}(又称为次黎曼流形)上的类似问题,给出了次黎曼流形中的共形不变量和射影不变量．本文给出的共形和射影不变量可视为黎曼情形的一种自然推广．由于次黎曼流形与黎曼流形之间有着本质的差异,故此,本文通过次黎曼流形上存在的唯一非完整联络(Nonholonomic connections)来刻画所提的问题．     

A complete global solution to the pressure gradient equation

We study the domain of existence of a solution to a Riemann problem for the pressure gradient equation in two space dimensions. The Riemann problem is the expansion of a quadrant of gas of constant state into the other three vacuum quadrants. The global existence of a smooth solution was established in Dai and Zhang [Z. Dai, T. Zhang, Existence of a global smooth solution for a degenerate Goursat problem of gas dynamics, Arch. Ration. Mech. Anal. 155 (2000) 277-298] up to the free boundary of vacuum. We prove that the vacuum boundary is the coordinate axes.     

Formation of Interfacial Layers in LaAlO3/Silicon during Film Deposition

We have studied the interracial reactions between amorphous LaAlO3 thin films and Si substrates, using high- resolution transmission electron microscopy and x-ray photoelectron spectroscopy. It has been shown that the interracial layer between LaAlO3 film and Si substrate chemical states show that the ratio of La 4d3/2 to Al 2p is SiLaxAlyOz. The depth distributions of La, Si and Al of the interfacial layer remains unchanged with the depth compared to that of the LaAlO3 film. Moreover, the Si content, in the interracial layer gradually decreases with increasing thickness of the interracial layer. These results strongly suggest that the Al element is not deficient in the interracial layer, as previously believed, and the formation of a SiLaxAlyOz interracial layer is mainly due to the diffusion of Si from the substrate during the LaAlO3 film deposition. With the understanding of the interracial layer formation, ones can control the interface characteristics to ensure the desired performances of devices using high-k oxides as gate dielectrics.