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Black phosphorus saturable absorber for ultrafast mode‐locked pulse laser via evanescent field interaction 下载免费PDF全文
Kichul Park Junsu Lee Young Tack Lee Won‐Kook Choi Ju Han Lee Yong‐Won Song 《Annalen der Physik》2015,527(11-12):770-776
Black phosphorus, or BP, has found a lot of applications in recent years including photonics. The most recent studies have shown that the material has an excellent optical nonlinearity useful in many areas, one of which is in saturable absorption for passive mode‐locking. A direct interaction scheme for mode‐locking, however, has a potential to optically cause permanent damage to the already delicate material. Evanescent field interaction scheme has already been proven to be a useful method to prevent such danger for other 2‐dimensional nanomaterials. In this report, we have utilized the evanescent field interaction to demonstrate that the optical nonlinear characteristics of BP is sufficiently strong to use in such an indirect interaction method. The successful demonstration of the passive mode‐locking operation has generated pulses with the pulse duration, repetition rate, and time bandwidth product of 2.18 ps, 15.59 MHz, and 0.336, respectively. 相似文献
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B. Q. Yao F. Chen C. T. Wu Q. Wang G. Li C. H. Zhang Y. Z. Wang Y. L. Ju 《Laser Physics》2011,21(3):468-471
In this paper, we presented experimental results concerning on the laser characteristics of two microchip lasers emitting
in the 2 μm range, Tm:Ho:YVO4 microchip laser and Tm:Ho:GdVO4 microchip laser. At a heat sink temperature of 283 K, the maximum output power of Tm:Ho:YVO4 laser and Tm:Ho:GdVO4 laser is 47 and 34 mW under absorbed pump power of 912 mW, respectively. High efficiency can be achieved for both lasers
at room temperature. Nevertheless, compared with Tm:Ho:GdVO4 laser, Tm:Ho:YVO4 laser can operate on single frequency with high power easily. At the heat sink temperature of 288 K, as much as 16.5 mW of
2052.3 nm single-longitudinal-mode (SLM) laser was achieved for Tm:Ho:YVO4 laser. Under the same condition, only 8 mW of 2048.5 nm SLM laser was achieved for Tm:Ho:GdVO4 laser. 相似文献
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Automatic image registration for MRI applications generally requires many iteration loops and is, therefore, a time-consuming task. This drawback prolongs data analysis and delays the workflow of clinical routines. Recent advances in the massively parallel computation of graphic processing units (GPUs) may be a solution to this problem. This study proposes a method to accelerate registration calculations, especially for the popular statistical parametric mapping (SPM) system. This study reimplemented the image registration of SPM system to achieve an approximately 14-fold increase in speed in registering single-modality intrasubject data sets. The proposed program is fully compatible with SPM, allowing the user to simply replace the original image registration library of SPM to gain the benefit of the computation power provided by commodity graphic processors. In conclusion, the GPU computation method is a practical way to accelerate automatic image registration. This technology promises a broader scope of application in the field of image registration. 相似文献
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The purpose of this study was to evaluate the changes of noise and computer tomography (CT) number in each dental substance, by using the metal artefact reduction algorithm; we used dual CT for this study. For the study, we produced resin, titanium, gypsum, and wax that are widely used by dentists. In addition, we made nickel to increase the artefact. While making the study materials, we made sure that there is no difficulty when inserting the substances inside phantom. In order to study, we scanned before and after using the metal artefact reduction algorithm. We conducted an average analysis of CT number and noise, before and after using the metal artefact reduction algorithm. As a result, there was no difference in CT number and noise before and after using the metal artefact reduction algorithm. However, when it comes to the noise value in each substance, wax's noise value was the lowest whereas titanium's noise value was the highest, after applying the metal artefact reduction algorithm. In nickel, CT number and noise value from artefact area showed a decreased noise value when applying the metal artefact reduction algorithm. In conclusion, we assumed that we could increase the effectiveness of CT examination by applying dual energy's metal artefact reduction algorithm. 相似文献
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Kyung Dong Lee S.S. Dahiwale Young Do Kim Jong-Han Lee Seongtak Kim Soohyun Bae Sungeun Park Sung Ju Tark Donghwan Kim 《Current Applied Physics》2013,13(1):241-245
The Hydrogenated silicon nitride (SiNx:H) using plasma enhanced chemical vapor deposition is widely used in photovoltaic industry as an antireflection coating and passivation layer. In the high temperature firing process, the SiNx:H film should not change the properties for its use as high quality surface layer in crystalline silicon solar cells. For optimizing surface layer in crystalline silicon solar cells, by varying gas mixture ratios (SiH4 + NH3 + N2, SiH4 + NH3, SiH4 + N2), the hydrogenated silicon nitride films were analyzed for its antireflection and surface passivation (electrical and chemical) properties. The film deposited with the gas mixture of SiH4 + NH3 + N2 showed the best properties in before and after firing process conditions.The single crystalline silicon solar cells fabricated according to optimized gas mixture condition (SiH4 + NH3 + N2) on large area substrate of size 156 mm × 156 mm (Pseudo square) was found to have the conversion efficiency as high as 17.2%. The reason for the high efficiency using SiH4 + NH3 + N2 is because of the good optical transmittance and passivation properties. Optimized hydrogenated silicon nitride surface layer and high efficiency crystalline silicon solar cells fabrication sequence has also been explained in this study. 相似文献
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