Glasses for lithography

The highest resolution in a lithographic process is often determined by the properties of the resist material. With the currently used polymeric resists, a resolution of better than 100 nm has been achieved under manufacturing conditions, but the future nanoscale devices will require a 10 times superior resolution. In this paper we present an overview of the resist materials, especially with regard to limiting resolution. In principle, inorganic resists should have higher limiting resolution than polymer resists due to smaller fundamental structural units and stronger bonds in the former. However, compositional and/or structural inhomogeneities may limit their ultimate resolution. New results are presented that indicate chalcogenide glasses as promising photo and electron beam resists, which also have the advantages of greater hardness, resistance to acids, easy fabrication in thin film form, and the unique phenomena like radiation enhanced diffusion.     

Model based online diagnosis of unbalance and transverse fatigue crack in rotor systems

A model based technique for online identification of malfunctions in rotor systems is discussed. Presence of fault changes the dynamic behavior of the system. This change is taken into account by equivalent loads acting on the undamaged system model. Equivalent loads are fictitious forces and moments acting on the undamaged system model, which generate a dynamic behavior identical to that of the real damaged system. The mathematical representation of equivalent loads is referred to as Fault Model. The work focuses on developing a fault model for a transverse fatigue crack in shaft and testing it through simulated studies. The basic principle of the technique is validated for unbalance identification, through numerical simulations as well as by experiments on a real rotor system.     

Production of helium fragments in197Au-emulsion collisions at 10.6 A GeV

We present a systematic analysis on the helium projectile fragments produced from 10.6 A GeV¹⁹⁷Auemulsion interactions in an experiment conducted at the Brookhaven AGS. Total charge changing and partial production cross-sections are measured experimentally on the basis of helium multiplicity. The multiplicity distribution of helium fragments which are produced collectively obey a KNO scaling. The transverse momentum distribution of these particles indicates that they are produced from two different independent sources.We are thankful to the BNL technical staff and specially to Dr. D. Beavis for his help in the exposure of emulsion stacks. Thanks are due to Profs. Y. Takahashi and G. Romano for their help in the preparation and development of the emulsion stacks. We appreciate the discussions with Prof. H. Stocker and J. Aichelin. This work was supported by D.O.E. under Grant No. DE-FGO2-90ER 40566.