A More General Treatment of Abrasion-Chipping Processes applicable to FAG/SAG Milling

Equations are derived for the rate of loss of mass from a screen interval when the size reduction process is an abrasion-chipping process which follows a wear law of the Bond form or the Davis form, giving cores and fragments. The treatment is extended to steady-state continuous grinding in a fully-mixed reactor, and to the case where first-order disintegrative fracture processes also occur.     

Estimation of eigenvalues using padé approximants. Stark effect for a model system

The perturbation series for a one-dimensional model system in a static electric field is obtained and shown to be divergent. Padé approximants to the series are calculated and found to converge, and to provide a good estimation of the Stark eigenvalue.     

A geometric proof of the bireflectionality of the Weyl group of typeF 4

A geometric proof is provided to demonstrate that any element of the Weyl group of type F₄ can be written as a product of two involutions.     

The Problems of Quantifying Mineral Liberation: A review

A review is given of recent publications concerning the theory of liberation of component B from AB material as particle size is reduced, with a view to combining models of liberation with models of size reduction. Although a number of approaches are promising, it is concluded that there is no adequate model of liberation of binary systems suitable for incorporation into a mill model.     

Biological Bose condensation and the time threshold for biological effects

Fröhlich's model of Bose condensation in biological systems is analyzed using finite temperature Green's function techniques. The appropriate biological system excitation lifetime is calculated and represents the time needed to produce the condensed state. The possible relevance of this calculated lifetime to experiments concerning the microwave irradiation of biological organisms is discussed.     

Near-field scanner for moving molecules

We have fabricated using electron beam nanolithography a fixed slit near-field optical scanning device which uses near-field fluorimetry to achieve 200 nm spatial resolution of objects moving over the slits. We explore the basic physics of operating narrow slits in the waveguide cutoff mode and present data from the passage of extended double-stranded DNA molecules passing over the slits as a first example of how this device can be used to do ultrahigh spatial resolution mapping of long polymers.