Ge2 Sb2 Te5相变薄膜光学及擦除性能研究

利用蓝绿激光对非晶态Ge2Sb2Te5 相变薄膜进行擦除性能的研究,分别用1000 ns,500 ns,100 ns,60 ns脉宽的蓝绿激光进行实验.结果表明,一定脉宽下,反射率对比度随擦除功率的增加而增大.并且,在1000 ns,500 ns,100 ns,60 ns的激光作用时间范围内,非晶态薄膜均可转变成晶态.对于脉宽为60 ns的蓝绿激光,擦除功率大于4.49 mW以后,薄膜的反射率对比度高于15％,这表明Ge2Sb2Te5相变薄膜在短脉宽、低擦除功率条件下,可具有较高的晶化速度.同时,分析了非晶态和晶态Ge2Sb2Te5相变薄膜的光谱特性,对比研究了780 nm,650 nm,514 nm和405 nm波长处的反射率和反射率对比度,提出了Ge2Sb2Te5相变薄膜用于蓝光光盘的改进方法.     

亚酞菁薄膜的折射率和吸收特性

通过真空镀膜法在单晶硅片上制备了一种新的严酞菁（三硝基溴硼亚酞菁）薄膜,利用全自动椭圆偏振光谱仪研究了该薄膜的椭偏光谱,测量了其复折射率,复介电常数和吸收系数,估算了薄膜在窗口区域的俘获能级并对其吸收谱的成因作了分析。     

偶氮金属螯合物的合成及其光学和热学性质

偶氮金属螯合物的合成及其光学和热学性质;噻唑基偶氮金属螯合物;光学性质     

Short-Wavelength Recording Properties of TeOx Thin Films

We prepare TeOx thin films by vacuum evaporation of TeO2 powder.It is found that the as-deposited TeOx films can represent a two-component system comprising crystalline tellurium particles dispersed in an amorphous TeO2 matrix.Results of the static recording test show that the TeOx films have good writing sensitivity for shortwavelength laser beam (514.5nm).Primary results of the dynamic recording test at 514.5 nm are also reported.The carrier-to-noise ratio of 30dB is obtained for the disc using a TeOx film as the recording medium.Atomic force microscopy is used to study the microstructure of recorded marks.Micro-area morphology images show that the marks are mechanically deformed,and depressions and bulges have been imaged in the recorded marks,resulting in the scattering of the reading laser beam.The analytical results of transmission electron microscopy show that there is not obvious difference between the phase states of the tellurium particles before and after laser irradiation.Recording mechanisms of the TeOx thin films are discussed based on the experimental results.     

Laser induced crystallization of as-deposited amorphous Ge_2Sb_2Te_5 films

Crystallization is induced by pulsed laser irradiation of as-deposited amorphous Ge_2Sb_2Te_5 films. Changes of the irradiated areas have been analyzed with the reflectivity contrast. As laser fluences increasing, the reflectivity contrast increases from 0%-2% to 14%-16%, which indicates the structure of asdeposited films transforms from amorphous to crystalline phases. The process of crystallization driven by the movement and rearrangement of atoms is described. And also the influence of the pulse duration on the threshold of crystallization is discussed, the results show that a lower threshold of crystallization can be produced for as-deposited films irradiated by the laser with short pulse duration. However, by the laser with long pulse duration, crystallization can only be formed with a higher threshold. The crystallization of films by irradiation of laser pulses is studied by Raman spectra.     

Two- and three-photon absorption in a novel fluorene-based compound

A novel symmetrical charge transfer fluorene-based compound 2,7-bis (4-methoxystyryl)-9, 9-bis (2-ethylhexyl)-9H-fluorene (abbreviated as BMOSF) was synthesized and its nonlinear absorption was investigated using two different laser systems: a 140-fs, 800-nm Ti:sapphire laser operating at 1-kHz repetition rate and a 38-ps, 1064-nm Nd:YAG pulsed laser operating at 10-Hz repetition rate, respectively. Unique nonlinear absorption properties in this new compound were observed that rise from multiphoton absorption. The nonlinear absorption coefficients were measured to be 6.02×10-3 cm/GW (due to two-photon absorption, exciting wavelength is 800 nm) and 3.6×10-20 cm3/W2 (due to three-photon absorption, exciting wavelength is 1064 nm). This new compound possesses strong fluorescence induced by two-photon absorption and obvious three-photon absorption optical limiting effects.     

双光子吸收有机材料及其在三维数字光存储中的应用

信息技术的发展要求存储器件必须具备超高存储密度、超快存取速率以及长存储寿命.而目前普遍应用的光数据存储的存储密度已经接近其物理极限.双光子吸收技术以其强的穿透能力和高的空间分辨率能够实现多层存储,存储密度高达10~(12)bits/cm~3,但能否开发出具有大的双光子吸收截面的材料成为制约其发展的一个重要因素.本文在综述近年来双光子吸收有机材料研究的基础上,介绍了双光子吸收有机材料在三维数字光存储中应用研究的最新进展.     

花菁化合物薄膜的光存储性能

采用旋涂工艺制备了花菁染料薄膜,测试了薄膜吸收、透过和反射光谱,通过椭圆偏振光谱计算了薄膜的光学常数,以该花菁染料薄膜为记录层的可录光盘的动态性能和优化功率测试表明,光盘的最佳写入功率在７ｍＷ左右,载楷（ＣＮＲ）可达４７ｄＢ。利用原子力显微镜观测了以不同功率记录后可录光盘的预刻槽形貌。     

酞菁铜薄膜的光记录特性

研究了有机染料酞菁铜（ＣｕＰｃ）真空蒸镀薄膜在可见及近红外区域的吸收光谱和光学常数，发现酞菁铜薄膜在５５０－７５０ｎｍ波长范围内具有较强的吸收，在静态测试仪上测试了酞菁铜薄膜的光存储记录特性，发现用低功率氦氖激光照样品时薄膜反射率变化较大，在酞菁记录层上覆盖金属反射层将提高写入激光的阈值能量并且增大反射率的对比度。     

沢吨染料的光化漂白动力学及全息特性研究

研究了以三乙醇胺作为引发剂,五种沢吨染料的光化漂白过程.实验结果表明五种染料的光化漂白速率大小顺序是藻红B(ErB)＞曙红Y(EY)＞孟加拉玫瑰红B(RsB)＞罗丹明B(RoB)＞荧光素(F).并研究了曝光强度及染料浓度对漂白过程的影响,以及这五种染料的全息记录性能.