Upgrading design of the 3B1A beamline for x-ray nanometre lithography of microelectronic devices at BSRF

Beijing Synchrotron Radiation Facility is a partly dedicated synchrotron radiation source operated in either parasitic or dedicated mode. The 3B1A beamline, extracted from a bending magnet, was originally designed as a soft x-ray beamline for submicro x-ray lithography with critical lateral size just below 1μm in 1988 and no change has been made since it was built. But later the required resolution of x-ray lithography has changed from sub-micrometre to the nanometre in the critical lateral size. This beamline can longer more meet the requirement for x-ray nano lithography and has to be modified to fit the purpose. To upgrade the design of the 3B1A beamline for x-ray nano lithography, a mirror is used to reflect and scan the x-ray beam for the nano lithography station, but the mirror's grazing angle is changed to 27.9mrad in the vertical direction, and the convex curve needs to be modified to fit the change; the tiny change of mirror scanning angle is firstly considered to improve the uniformity of the x-ray spot on the wafer by controlling the convex curve.     

四边形单元h－收敛误差估计的探讨*

本文证明了四边形单元的h-收敛性,给出了相应的引理和定理,讨论了误差估计问题,为四边形单元h-收敛自适应有限元分析准备了基础。     

双材料微梁阵列非制冷红外成像技术--微梁阵列热变形的光学读出

针对双材料微梁阵列非制冷红外成像技术的光学读出系统,提出了在谱平面上进行刀口滤波将阵列转角转化为像平面上光强变化的高灵敏度测量技术,并对光学探测灵敏度进行了理论分析.利用该光学读出系统在实验中得到了120℃红外物体的热图像.通过对实验结果的分析和图像处理消除噪声技术,得到该系统在成像温度范围的噪声等效温度差(NETD)约为5K,并对系统噪声进行了讨论.     

电活性超支化聚合物的合成与性质

通过分子设计, 利用A2+B3反应合成了一种新型电活性超支化聚合物材料. 该材料在保持聚苯胺的电活性基础上, 还具有超支化聚合物特有的低黏度(其特性黏度为0.33 dL/g)、低结晶性及良好的溶解性. 利用紫外-可见光谱对聚合物的氧化过程进行了监测. 热失重分析显示, 该材料具有较好的热稳定性, 失重10%时的温度高达517 ℃. 该材料具有较高的介电常数, 有望成为一种具有实际应用价值的高介电材料.     

A novel anti-shock silicon etching apparatus for solving diaphragm release problems

This paper presents a novel anti-shock bulk silicon etching apparatus for solving a universal problem which occurs when releasing the diaphragm (e.g.\ SiNx), that the diaphragm tends to be probably cracked by the impact of heating-induced bubbles, the swirling of heating-induced etchant, dithering of the hand and imbalanced etchant pressure during the wafer being taken out. Through finite element methods, the causes of the diaphragm cracking are analysed. The impact of heating-induced bubbles could be the main factor which results in the failure stress of the SiNx diaphragm and the rupture of it. In order to reduce the four potential effects on the cracking of the released diaphragm, an anti-shock bulk silicon etching apparatus is proposed for using during the last etching process of the diaphragm release. That is, the silicon wafer is first put into the regular constant temperature etching apparatus or ultrasonic plus, and when the residual bulk silicon to be etched reaches near the interface of the silicon and SiNx diaphragm, within a distance of 50--80~\mu m (the exact value is determined by the thickness, surface area and intensity of the released diaphragm), the wafer is taken out carefully and put into the said anti-shock silicon etching apparatus. The wafer's position is at the geometrical centre, also the centre of gravity of the etching vessel. An etchant outlet is built at the bottom. The wafer is etched continuously, and at the same time the etchant flows out of the vessel. Optionally, two symmetrically placed low-power heating resistors are put in the anti-shock silicon etching apparatus to quicken the etching process. The heating resistors' power should be low enough to avoid the swirling of the heating-induced etchant and the impact of the heating-induced bubbles on the released diaphragm. According to the experimental results, the released SiNx diaphragm thus treated is unbroken, which proves the practicality of the said anti-shock bulk silicon etching apparatus.     

光学读出微梁阵列红外成像性能分析与优化

系统响应率是光学读出微梁焦平面阵列(Focal Plane Array,FPA)红外成像的关键性能参数。在刀口滤波光学读出技术中,系统响应率的主要组成部分——光学读出灵敏度与微梁反光板的长度密切相关,并受到反光板弯曲变形的严重影响。由于残余应力在制作过程中不可避免地存在,微梁反光板都有弯曲变形,膜厚相同的反光板具有相同的变形曲率半径。本文利用傅里叶光学分析了反光板长度和弯曲变形对光学读出灵敏度的影响,构建并实验验证光学读出灵敏度理论模型。根据该模型,分析了系统响应率与反光板长度之间关系,理论分析与实验结果相符。结果表明,通过减薄SiNx厚度并使反光板处于该厚度下的最优长度,不仅能提高红外成像的系统响应率,而且能同时提高红外成像的空间分辨率。     

Transient analysis of artificial mechanical valve-blood interaction

Using finite element method, this paper has analyzed the blood-mechanical heart valve interaction system subjected to a step pressure when the value is, at closing position. As demonstrated in the present study, in, such conditions mechanical values made of pyrolytic carbon, Ti alloy, Co-Cr alloy and ceramics tend to be very stiff which result in high impinging pressure. The impinging pressure acted on the value of the blood-valve system can be reduced by decreasing the elastic modulus of the mechanical value. Project supported by the National Natural Science Foundation and Doctoral Foundation of China     

两种人工机械心瓣启闭过程的ALE有限元分析*

本文采用任意拉格朗日-欧拉(ALE)有限单元法,将血液视为不可压缩粘性流体,同时将人工机械瓣简化为定轴转动刚体,建立了机械心瓣/血液耦合运动的二维计算模型。在此基础上。计算了顺向人工机械瓣(DDM)的开闭过程,并与St.Jude瓣(SJM)进行了对比。由本文研究可得以下主要结论:1.DDM瓣与SJM相比,开启较为迅速,关闭则较为柔和。2.DDM瓣的峰值回流量较之SJM瓣小。本文研究表明DDM瓣由于更好利用了天然心瓣的关闭机理,而具有较高的耐久性潜力。     

On the two bifurcations of a white-noise excited Hopf bifurcation system

I.IntroductionNonlinearanalysiseffortsmainlyincluderesearchesonthestablemotionofasystem.investigationsonitsstabilityfeaturesandtheinstantaneousmotionofadynamicalsystemwhenchangesoccurtoitsgoverningparameters.Theso-calledstochasticbifurcationimpliesthetran…     

"冰毒"拉曼散射振动模式的研究

利用显微拉曼技术对致幻药物－“冰毒”做了测试分析研究。在激发光５１４．５ｎｍ和室温环境下,得到了“冰毒”分子的拉曼散射谱。根据两种分子同属单取代苯类,具有Ｃｙ２ｖ对称性,对安非他明和甲基安非他明分子的拉曼振动模式进行了识别。只出现在甲基安非他明拉曼谱中的２４５９ｃｍ＾－１谱线,是其他毒品分子拉曼谱中都湍有的,我们认为极可能是Ｃ－Ｎ＾＋－Ｃ之间的伸缩振动。