Ce3+掺杂CeO2纳米粉体的物相组成及储氧性能研究

采用水热法制备了不同Bi3添加量的CeO2纳米粉体.用XRD,HRTEM,XPS以及Raman光谱仪对样品进行了表征,物相分析结果表明,当Bi3+添加量不超过20at;时,粉末样品为立方萤石结构的CeO2.Bi3+添加量继续增加至40at;,样品中开始出现Bi2O3第二相.氢气程序温控还原测试(H2-TPR)结果表明,所有样品的低温储氧量和低温还原活性均随着Bi3+含量的增加逐渐提高,且样品的储氧能力与物相组成有着密切联系:当样品中没有出现第二相Bi2O3时,储氧性能的提高可归因于Bi3+的掺杂.当样品中出现第二相以后,尽管CeO2与Bi2O3混合氧化物的低温储氧能力有明显提高,但从H2-TPR曲线可发现,该样品的低温还原峰有明显劈裂现象,表明此时氢气的消耗量分别源于还原CeO2和Bi2O3两个反应的叠加.     

平面摇摆式抛光去除模型研究

为了完善平面摇摆式抛光的理论并指导加工,基于Preston方程建立了平面摇摆式加工的去除模型,并使用该模型在Matlab中仿真计算元件上各点在不同加工参数情况下的去除量,最终得到不同加工参数情况下所产生的不同去除形貌。通过控制不同参数在430 mm430 mm平面石英元件上进行抛光实验,验证去除模型的正确性,对比相同参数下仿真得到的去除形貌和加工后检测得到的面形图可知该去除模型能够正确预测不同加工参数时的去除量,从而证实了该模型能够准确、有效地指导摇摆式抛光。     

线性规划中一个避免人工变元的方法的改进

有许多文献讨论了线性规划问题中单纯形方法的改进(如文献[1～5]等)。我们在文献[1]的基础上,突破了传统方法中要求单纯形表中的基变量始终非负的想法,给出了求解线性规划问题中一个新的避免人工变量的方法,使其计算量得到减少。     

高光谱分辨率激光雷达鉴频器的设计与分析

提出了利用Fabry-Perot干涉仪的反射场实现高光谱分辨率激光雷达精细探测大气光学参量的新方法和思路.设计了高光谱分辨率的分光系统,并分析了干涉仪反射场的光谱透过特征曲线.结合高光谱激光雷达探测信号特征,讨论分析了谱分离比和瑞利信号透过率随反射率和腔长的变化曲线,同时结合误差传递公式,建立了仿真分析模型,讨论了回波光束发散角和入射角变化对激光雷达探测结果的影响.结果表明,所提出的Fabry-Perot干涉仪反射场可以实现高光谱分辨率激光雷达探测系统的精细分光,同时探测结果误差随回波光束发散角变化不敏感,控制发散角在10 mrad以内,入射角在1.5 mrad以内时,可以实现气溶胶光学参数廓线的高精度探测.     

Correlation of polishing-induced shallow subsurface damages with laser-induced gray haze damages in fused silica optics

Laser-induced damage in fused silica optics greatly restricts the performances of laser facilities. Gray haze damage,which is always initiated on ceria polished optics, is one of the most important damage morphologies in fused silica optics.In this paper, the laser-induced gray haze damages of four fused silica samples polished with CeO_2, Al_2O_3, ZrO_2, and colloidal silica slurries are investigated. Four samples all present gray haze damages with much different damage densities.Then, the polishing-induced contaminant and subsurface damages in four samples are analyzed. The results reveal that the gray haze damages could be initiated on the samples without Ce contaminant and are inclined to show a tight correlation with the shallow subsurface damages.     

熔石英元件抛光表面的亚表面损伤研究

通过结合HF酸洗和微分干涉差显微成像对两组抛光元件的亚表面损伤进行直接观测和分析。结果显示微分干涉差显微成像相比于传统的明场成像具有更好的分辨率,可以更有效检测HF酸洗后暴露的各种浅塑性亚表面损伤。对两组抛光元件的亚表面损伤的对比分析发现熔石英元件在抛光中会产生大量的亚表面损伤,这些亚表面损伤绝大多数是浅塑性的划痕和坑,仅有少量的脆性断裂损伤,较大的抛光颗粒会产生更多更严重的亚表面损伤,并且这些亚表面损伤被表面沉积层所掩盖,表面粗糙度不能反映亚表面损伤的严重程度。     

Improved AFEM algorithm for bioluminescence tomography based on dual-mesh alternation strategy

Adaptive finite element method (AFEM) is broadly adopted to recover the internal source in biological tissues. In this letter, a novel dual-mesh alternation strategy (dual-mesh AFEM) is developed for biolumi- nescence tomography. By comprehensively considering the error estimation of the finite element method solution on each mesh, two different adaptive strategies based on the error indicator of the reconstructed source and the photon flux density are used alternately in the process. Combined with the constantly adjusted permissible region in the adaptive process, the new algorithm can achieve a more accurate source location compared with the AFEM in the previous experiments.     

空气环型二维光子晶体完全带隙特性研究

采用平面波展开法, 系统研究了空气环型二维光子晶体的完全光子带隙随结构参数变化而改变的规律, 并将其与普通的空气孔型和介质柱型二维光子晶体的完全带隙进行了比较. 研究表明: 空气环型二维光子晶体不仅可以获得更宽的完全带隙, 而且, 当介质折射率较低时, 其可以获得普通空气孔型和介质柱型二维光子晶体在低折射率条件下所无法获得的完全带隙. 关键词： 空气环型二维光子晶体 完全带隙 平面波展开法     

Voxel classification methodology for rapid Monte Carlo simulation of light propagation in complex media

Monte Carlo (MC) method is a statistical method for simulating photon propagation in media in the optical molecular imaging field.However,obtaining an accurate result using the method is quite time-consuming,especially because the boundary of the media is complex.A voxel classification method is proposed to reduce the computation cost.All the voxels generated by dividing the media are classified into three types (outside,boundary,and inside) according to the position of the voxel.The classified information is used to determine the relative position of the photon and the intersection between photon path and media boundary in the MC method.The influencing factors and effectiveness of the proposed method are analyzed and validated by simulation experiments.     

超二代与三代像增强器低照度分辨力的比较

比较了超二代像增强器和三代像增强器在不同照度下的分辨力.结果表明,增益、极限分辨力、信噪比以及调制传递函数相同的超二代像增强器和三代像增强器,当照度大于4.3×10-3 lx时,分辨力均为常数,均不随照度的变化而变化;当照度小于4.3×10-3 lx时,分辨力均不为常数,均随照度的降低而降低,并且超二代像增强器的分辨力...