表面热透镜技术应用于薄膜微弱吸收测量的理论和实验

由薄膜表面光热形变简化理论和表面热透镜衍射理论导出表面热透镜信号表达式，从理论上证明了表面热透镜信号和薄膜吸收率的线性关系. 应用表面热透镜技术研制了薄膜吸收测量仪，测量结果表明其吸收率测量灵敏度和精度均达10^-6量级. 关键词： 吸收测量 表面热透镜 光热形变 薄膜     

高色散镜的设计和制备

设计和制备了两种高色散镜,分别在780-870 nm波长范围内提供约-800 fs² 群延迟色散补偿(group-delay dispersion,GDD)和在1030-1050 nm的波长范围内提供约-2500 fs²的群延迟色散补偿.设计的高色散镜用双离子束溅射方法进行制备.从白光干涉仪的测试结果可以看出,得到的-800 fs² GDD高色散镜和设计符合得比较好;-2500 fs² GDD的高色散镜用在掺Yb光纤激光器中很好的抑制了脉冲展宽.这是制备得到的国产高色散镜及在光纤激光器中应用的首次报道. 关键词： 高色散镜 群延迟色散 色散补偿 Yb光纤激光器     

Study on absorbance and laser damage threshold of HfO_2 films prepared by ion-assisted reaction deposition

Using a new kind of EH1000 ion source, hafnium dioxide (HfO2) films are deposited with different deposition techniques and different conditions. The absorbance and the laser damage threshold of these films have been measured and studied. By comparing these characteristics, one can conclude that under right conditions, such as high partial pressure of oxygen and right kind of ion source, the ion-assisted reaction deposition can prepare HfO2 films with higher laser induced damage threshold.     

Form Birefringence in Thin Films with Oblique Columnar Structures

Effective medium theory is useful for designing optical elements with form birefringent subwavelength structures. Thin films fabricated by oblique deposition are similar to the two-dimensional surface relief subwavelength gratings. We use the effective medium theory to calculate the anisotropic optical properties of the thin films with oblique columnar structures. The effective refractive indices and the directions are calculated from effective medium theory. It is shown that optical thin films with predetermined refractive indices and birefringence may be engineered.     

Study on absorbance and laser damage threshold of HfO2 films prepared by ion-assisted reaction deposition

Using a new kind of EH1000 ion source, hafnium dioxide (HfO2) films are deposited with different deposition techniques and different conditions. The absorbance and the laser damage threshold of these films have been measured and studied. By comparing these characteristics, one can conclude that under right conditions, such as high partial pressure of oxygen and right kind of ion source, the ion-assisted reaction deposition can prepare HfO2 films with higher laser induced damage threshold.     

沉积温度对氧化钇稳定氧化锆薄膜残余应力的影响

采用自制掺摩尔分数12%的YzO2的ZrO2混合颗粒料为原料,在不同的沉积温度下用电子束蒸发方法沉积氧化钇稳定氧化锆(YSZ)薄膜样品.利用ZYGO MarkⅢ-GPI数字波面干涉仪对氧化钇稳定氧化锆薄膜的残余应力进行了研究,讨论了沉积温度对残余应力的影响.实验结果表明:随沉积温度升高,氧化钇稳定氧化锆薄膜中残余应力状态由张应力变为压应力.且压应力值随着沉积温度升高而增大;用X射线衍射仪表征了不同沉积温度下氧化钇稳定氧化锆薄膜的微观结构,探讨了薄膜微观结构与其应力的对应关系,并对比了纯ZrO2薄膜表现出的应力状念.     

Design and Fabrication of Chirped Mirror

Chirped mirrors （CMs） are designed and manufactured. The optimized CM provides a group delay dispersion （ODD） of around -60fs^2 and average reflectivity of 99.4% with bandwidth 200 nm at a central wavelength of 800nm. The CM structure consists of 52 layers of alternating high refractive index Ta2O5 and low refractive index SiO2. Measurement results show that the control of CM manufacturing accuracy can meet our requirement through time control with ion beam sputtering. Because the ODD of CMs is highly sensitive to small discrepancies between the layer thickness of calculated design and those of the manufactured mirror, we analyze the error sources which result in thickness errors and refractive index inhomogeneities in film manufacture.     

基于图像锁相的薄膜吸收多通道检测技术

从理论和应用两方面对光学薄膜吸收缺陷的检测方法进行了研究.基于CCD摄像机的网像锁相技术,提出了不同于传统逐点扫描方法的多通道薄膜吸收检测方法.基于逐点扫描法和图像检测法,分别计算了大区域内薄膜单点缺陷所对应的吸收分布,结果证明了图像法应用于较大口径薄膜元件吸收检测的可行性.计算和实验表明:相对于逐点法,图像法测量薄膜速度可以提高上百倍,避免了逐点扫描法中耗时长、效率低的不足,扩展了光热技术在大口径镀膜光学元件中的应用.     

Effect of Process Parameters on Laser Damage Threshold of TiO2 Coatings

We investigate the laser damage behaviour of an electron-beam-deposited TiO2 monolayer at different process parameters. The optical properties, chemical composition, surface defects, absorption and laser-induced damage threshold （LIDT） of films are measured. It is found that TiO2 films with the minimum absorption and the highest LIDT can be fabricated using a TiO2 starting material after annealing. LIDT is mainly related to absorption and is influenced by the non-stoichiometric defects for TiO2 films. Surface defects show no evident effects on LIDT in this experiment.     

1 053，527，351 nm倍频分离膜的制备与性能研究

 用电子束蒸发及光电极值监控技术在石英基底上沉积了三倍频分离膜，将部分样品置空气中于250 ℃温度下进行3 h热退火处理。然后用Lambda900分光光度计测量了样品的光谱性能；用表面热透镜技术测量了样品的弱吸收值；用调Q脉冲激光装置测试了样品分别在355 nm和1 064 nm的抗激光损伤阈值。实验结果发现，样品的实验光谱性能良好，退火前后其光谱性能几乎没有发生温漂，说明薄膜的温度稳定性好；同时弱吸收平均值从退火前的1.07×10^-4下降到退火后的6.2×10^-5，从而使对基频的抗激光损伤阈值提高，从14.6 J/cm²上升到18.8 J/cm²，但是三倍频阈值在退火后有显著降低，从7.5 J/cm²下降到2.5 J/cm²。