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HfO2 films are deposited on BK7 glass substrates by electron beam evaporation. The influences of annealing between 100℃ and 400℃ on residual stresses and structures of HfO2 films are studied. It is found that little differences of spectra, residual stresses and structures are obtained after annealing at lower temperatures. After annealing at higher temperatures, the spectra shift to short wavelength, the residual stress increases with the increasing annealing temperature. At the same time, the crystallite size increases and interplanar distance decreases. The variations of optical spectra and residual stress correspond to the evolutions of structures induced by annealing. 相似文献
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根据钛宝石激光器的要求,实验设计了中心波长800 nm带宽200 nm的啁啾镜,在700—900 nm波长范围内提供约-60 fs2群延迟色散(group delay dispersion,GDD).采用双射频离子束溅射方法进行制备,用实验室搭建的白光干涉仪进行色散性能测试,从测试结果可以看出,制备的啁啾镜的性能和设计值符合得比较好.制备得到的非成对啁啾镜在钛宝石激光谐振腔中进行色散补偿,锁模后分别获得了12 fs和9.5 fs的激光脉冲输出.这是目前报道的使用国产啁啾镜获得的最短的
关键词:
啁啾镜
群延迟色散
色散补偿
钛宝石激光器 相似文献
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利用电子束蒸发方法在Yb∶YAG晶体和熔融石英衬底上沉积单层ZrO2薄膜,分别在673 K和1 073 K的温度下经过12 h退火以后,通过X射线衍射(XRD)分析了薄膜晶相,计算了薄膜的晶粒尺寸;利用表面热透镜技术获得了薄膜的吸收;测量了退火后薄膜的激光损伤阈值。实验结果表明:两种衬底上的薄膜结构受到退火温度和衬底表面结构的影响,高温退火有利于单斜相的形成,含单斜相的ZrO2薄膜具有较高的激光损伤阈值,而由于衬底的吸收,Yb∶YAG晶体上薄膜的损伤阈值远小于石英衬底上薄膜的损伤阈值。 相似文献
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Comparison of TiO2 and ZrO2 Films Deposited by Electron-Beam Evaporation and by Sol-Gel Process 下载免费PDF全文
TiO2 and ZrO2 films are deposited by electron-beam (EB) evaporation and by sol-gel process. The film properties are characterized by visible and Fourier-transform infrared spectrometry, x-ray diffraction analysis, surface roughness measure, absorption and laser-induced damage threshold (LIDT) test. It is found that the sol-gel films have lower refractive index, packing density and roughness than EB deposited films due to their amorphous structure and high OH group concentration in the film. The high LIDT of sol-gel films is mainly due to their amorphous and porous structure, and low absorption. LIDT of EB deposited film is considerably affected by defects in the film, and LIDT of sol-gel deposited film is mainly effected by residual organic impurities and solvent trapped in the film. 相似文献
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将Sc2O3替代层引入到532 nm高反膜(HfO2/SiO2)n中,利用Sc2O3在盐酸中具有较好的溶解性这个特点,把膜层与基片脱离,以方便基片返修,缩短返修周期,降低成本。能量色散谱元素测试表明,脱离后Sc元素残留率为0。用Lamada900分光光度计、WykoNT1100轮廓仪和ZYGO干涉仪分别表征了替代层引入对高反膜的光谱、表面粗糙度和应力的影响,并测试了膜系在532 nm的激光损伤阈值的变化,结果表明Sc2O3替代层的引入对高反膜的性能几乎没有负面影响。 相似文献
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Chirped mirrors (CMs) are designed and manufactured. The optimized CM provides a group delay dispersion (ODD) of around -60fs^2 and average reflectivity of 99.4% with bandwidth 200 nm at a central wavelength of 800nm. The CM structure consists of 52 layers of alternating high refractive index Ta2O5 and low refractive index SiO2. Measurement results show that the control of CM manufacturing accuracy can meet our requirement through time control with ion beam sputtering. Because the ODD of CMs is highly sensitive to small discrepancies between the layer thickness of calculated design and those of the manufactured mirror, we analyze the error sources which result in thickness errors and refractive index inhomogeneities in film manufacture. 相似文献
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