Enhanced deep ultraviolet emission from Si-doped AlxGa1-xN/AlN MQWs

Undoped and Si-doped AlGaN/AlN multiple quantum wells(MQWs) were grown on AlN/Sapphire templates by metalorganic phase vapor epitaxy.High-resolution x-ray diffraction measurements showed the high interface quality of the MQWs little affected by Si-doping.Room-temperature(RT) cathodoluminescence measurements demonstrated a significant enhancement of the RT deep ultraviolet emission at about 240 nm from the AlGaN/AlN MQWs by Si doping.The mechanism of the improved emission efficiency was that the Si-doping partially screens the internal electric field and thus leads to the increase of the overlap between electron and hole wavefunctions.Further theoretical simulation also supports the above results.