Rapid Thermal Annealing Effects on Structural and Optical Properties of Self-Assembled InAs／GaAs Quantum Dots Capped by InAIAs／InGaAs Layers

Effects of rapid thermal annealing on the optical and structural properties of self-assembled InAs/GaAs quantum dots capped by the InAlAs/InGaAs combination layers are studied by photoluminescence and transmission electron microscopy. The photoluminescence measurement shows that the photoluminescence peak of the sample after 850℃ rapid thermal annealing is blue shifted with 370meV and the excitation peak intensity increases by a factor of about 2.7 after the rapid thermal annealing, which indicates that the InAs quantum dots have experienced an abnormal transformation during the annealing. The transmission electron microscopy shows that the quantum dots disappear and a new InAlGaAs single quantum well structure forms after the rapid thermal annealing treatment. The transformation mechanism is discussed. These abnormal optical properties are attributed to the structural transformation of these quantum dots into a single quantum well.     

半导体量子点及其应用(Ⅱ)

理论分析表明，基于三维受限量子点的分离态密度函数的量子器件，以其独特的优异电学、光学性能和极低功耗，在纳米电子学、光电子学，生命科学和量子计算等领域有着极其广泛的应用前景，本文仅就量子点在量子点激光器、量子点红外探测器、单光子光源、单电子器件和量子计算机等方面的应用作一简单的介绍．     

钝化低温法生长多层InGaN量子点的结构和光学特性

采用一种新方法生长多层InGaN/GaN量子点,研究所生长样品的结构和光学特性。该方法采用了低温生长和钝化工艺,所以称之为钝化低温法。第一层InGaN量子点的尺寸平均宽度40nm,高度15nm,量子点密度为6.3×10¹⁰/cm²。随着层数的增加,量子点的尺寸也逐渐增大。在样品的PL谱测试中,观察到在In(Ga)As材料系中普遍观察到的量子点发光的温度特性---超长红移现象。它们的光学特性表明:采用钝化低温法生长的纳米结构中存在零维量子限制效应。     

沸石分子筛中半导体量子纳米团簇的组装及应用前景

在沸石分子筛中可以形成稳定的，分子尺寸的半导体团族，这类团族具有单相性，均匀性好的特点，并可形成三维量子超晶格结构。本文简单介绍沸石分子筛的结构及反应性之后，对团族的组装技术及表征方法进行了详细的讨论，对半导体团族的特征，性质及应用前景进行了较系统的论述。并指出了这类团族材料应用存在的问题及发展方向。     

High power terahertz quantum cascade laser

We present high power terahertz quantum laser at about 3 THz based on bound-to-continuum active region design. At 10 K, corrected by the collection efficiency, the maximum peak power of 137 mW is obtained in pulsed mode. What＇s more, we firstly introduce Inonolithically integrated THz quantum cascade laser （QCL） array and the maximum peak power increased to 218 mW after correction. In total, the array shows better performance than single device, implying cheerful prospect.     

掺铒氢化非晶氧化硅1.54μm发光性质的研究

采用等离子体增强化学汽相沉积技术生长不同氧含量的氢化非晶氧化硅薄膜(a-SiOx:H),离子注入铒及退火后在室温观察到很强的光致发光.当材料中氧硅含量比约为1和1.76时,分别对应77K和室温测量时最强的1.54μm光致发光.从15到250K的变温实验显示出三个不同的强度与温度变化关系,表明氢化非晶氧化硅中铒离子的能量激发和发光是一个复杂的过程.提出氢化非晶氧化硅薄膜中发光铒离子来自于富氧区,并对实验现象进行了解释.氢化非晶氧化硅中铒发光的温度淬灭效应很弱.从15到250K,光致发光强度减弱约1/2.     

A 10Gb/s Directly-Modulated 1.3μm InAs/GaAs Quantum-Dot Laser

We demonstrate 10 Gb/s directly-modulated 1.3 μm InAs quantum-dot （QD） lasers grown on GaAs substrates by molecular beam epitaxy. The active region of the QD lasers consists of five-stacked InAs QD layers. Ridge-waveguide lasers with a ridge width of 4 μm and a cavity length of 600 μm are fabricated with standard lithography and wet etching techniques. It is found that the lasers emit at 1293 nm with a very low threshold current of 5 mA at room temperature. Furthermore, clear eye-opening patterns under 10 Gb/s modulation rate at temperatures of up to 50oC are achieved by the QD lasers. The results presented here have important implications for realizing low-cost, low-power-consumption, and high-speed light sources for next-generation communication systems.     

半导体量子点激光器研究进展

首先简要地回顾了半导体激光器发展的历史和量子点激光器所特有的优异性能,进而介绍半导体量子点及其三维量子点阵列的制备技术,然后分别讨论了量子点激光器（能带）结构设计思想,实现基态激射时所必须具备的条件和近年来国内外半导体量子点器的研究进展。最后分析讨论了量子点激光器研制中存在的问题和发展趋势。     

掺饵氢化非晶氧化硅1.54μm发光性质的研究

采用等离子体增强化学汽相沉积技术生长不同氧含量的氢化非晶氧化硅薄膜(a-SiO_{x∶H),离子注入铒及退火后在室温观察到很强的光致发光.当材料中氧硅含量比约为1和 1.76时,分别对应77Ｋ和室温测量时最强的1.54μm光致发光.从15到250Ｋ的变温实验显示 出三个不同的强度与温度变化关系,表明氢化非晶氧化硅中铒离子的能量激发和发光是一个 复杂的过程.提出氢化非晶氧化硅薄膜中发光铒离子来自于富氧区,并对实验现象进行了解 释.氢化非晶氧化硅中铒发光的温度淬灭效应很弱.从15到250Ｋ,光致发光强度减弱约1/2. 关键词： 铒 光致发光 氧含量}     

ZnO:Tb纳米晶的协同发光现象

用光致发光的方法研究了掺铽的ZnO纳米晶这种新型掺杂纳米晶体系,观察到了其中的协同发光现象,指出ZnO纳米基质与掺入其中的铽中心之间存在有效的能量传递.该能量传递对稀土铽离子的特征发光起决定性的作用. 关键词： 光致发光 掺杂 纳米晶