Spectral dynamical behavior in two-section,quantum well,mode-locked laser at 1.064 μm

In this study, two-section mode-locked semiconductor lasers with different numbers of quantum wells and different types of waveguide structures are made. Their ultrashort pulse features are presented. The spectral dynamical behaviors in these lasers are studied in detail. In the simulation part, a two-band compressive-strained quantum well(QW) model is used to study thermally induced band-edge detuning in the amplifier and saturable absorber(SA). A sudden blue shift in laser spectrum is expected by calculating the peak of the net gain. In the experiment part, the sudden blue shift in the emission spectrum is observed in triple QW samples under certain operating conditions but remains absent in single QW samples.Experimental results reveal that blue shift phenomenon is connected with the difference between currents in two sections.Additionally, a threshold current ratio for blue-shift is also demonstrated.     

Etching mask optimization of InAs/GaSb superlattice mid-wavelength infared 640×512 focal plane array

In this paper we focused on the mask technology of inductively coupled plasma(ICP) etching for the mesa fabrication of infrared focal plane arrays(FPA).By using the SiO_2 mask,the mesa has higher graphics transfer accuracy and creates less micro-ripples in sidewalls.Comparing the IV characterization of detectors by using two different masks,the detector using the SiO_2 hard mask has the R_0A of 9.7×10~6 Ω·cm~2,while the detector using the photoresist mask has the R_0A of3.2 × 10~2 Ω·cm~2 in 77 K.After that we focused on the method of removing the remaining SiO_2 after mesa etching.The dry ICP etching and chemical buffer oxide etcher(BOE) based on HF and NH4 F are used in this part.Detectors using BOE only have closer R_0A to that using the combining method,but it leads to gaps on mesas because of the corrosion on AlSb layer by BOE.We finally choose the combining method and fabricated the 640×512 FPA.The FPA with cutoff wavelength of 4.8 μm has the average R_0A of 6.13 × 10~9 Ω·cm~2 and the average detectivity of 4.51 × 10~9 cm·Hz~(1/2).W~(-1)at 77 K.The FPA has good uniformity with the bad dots rate of 1.21%and the noise equivalent temperature difference(NEDT) of 22.9 mK operating at 77 K.     

Electrically Driven InAs Quantum-Dot Single-Photon Sources

Electrically driven single photon source based on single InAs quantum dot （QDs） is demonstrated. The device contains InAs QDs within a planar cavity formed between a bottom AlCaAs/CaAs distributed Bragg reflector （DBR） and a surface CaAs-air interface. The device is characterized by I-V curve and electroluminescence, and a single sharp exciton emission line at 966nm is observed. Hanbury Brown and Twiss （HBT） correlation measurements demonstrate single photon emission with suppression of multiphoton emission to below 45% at 80 K     

Hole Spin Relaxation in an Ultrathin InAs Monolayer

We investigate the spin relaxation time of holes in an ultrathin neutral InAs monolayer （1.5 ML） and compare with that of electrons, using polarization-dependent time-resolved photoluminescence （TRPL） experiments. With excitation energies above the GaAs gap, we observe a rather slow relaxation of holes （τ1h = 196± 17 ps） that is in the magnitude similar to electrons （t1e= 354 ± 32 ps） in this ultrathin sample. The results are in good agreement with earlier theoretical prediction, and the phonon scattering due to spin-orbit coupling is realized to play a dominant role in the carrier spin kinetics.     

Molecular beam epitaxy growth of GaAs on an offcut Ge substrate

Molecular beam epitaxy growth of GaAs on an offcut Ge (100) substrate has been systemically investigated. A high quality GaAs/Ge interface and GaAs film on Ge have been achieved. High temperature annealing before GaAs deposition is found to be indispensable to avoid anti-phase domains. The quality of the GaAs film is found to strongly depend on the GaAs/Ge interface and the beginning of GaAs deposition. The reason why both high temperature annealing and GaAs growth temperature can affect epitaxial GaAs film quality is discussed. High quality In_0.17Ga_0.83As/GaAs strained quantum wells have also been achieved on a Ge substrate. Samples show flat surface morphology and narrow photoluminescence line width compared with the same structure sample grown on a GaAs substrate. These results indicate a large application potential for III--V compound semiconductor optoelectronic devices on Ge substrates.     

GaAs均匀点状结构的分子束外延图形生长

报道了在(311)A腐蚀图形衬底上，用分子束外延(MBE)生长高度规则的三种点状结构的实验研究.样品表面的原子力显微镜和剖面的扫描电子显微镜测试结果表明，在不同尺寸的方形凹面腐蚀图形区域，原凹面之间形成了沿［233］晶向不完全和完全收缩的尖角形点状外延结构；而在方形台面腐蚀图形区域，台顶面之间形成了沿［233］方向收缩的脊形点状结构.分析认为这些均匀有序的三角形点状结构的形成是由非平面(311)A衬底上生长各向异性导致的必然结果，而构成这些点结构的晶面取向与原图形的取向相关.低温阴极荧光谱测试结果清晰地表 关键词：     

InAs/GaAs单电子量子点量子比特的失相率

在有效质量包络函数理论近似下, 计算了InAs/GaAs量子点的参数相图，确切定义了InAs/GaAs量子点的参数的范围,使得该量子点能作为二能级量子系统用于量子计算；发现静电场能够有效延长消相干时间，当外加静电场超过20 kV/cm时，消相干时间能够达到毫秒量级. 这些结果有助于未来实现固态量子计算.     

新奇半导体低维结构的自组织生长

文章介绍了自组织生长半导体量子线、量子点和量子环的进展，同时介绍了这些低维半导体材料在光电子和通信等领域应用情况。此外，对这些材料的一些测试方法也进行了介绍．     

等离子体增强InAs单量子点荧光辐射的研究

通过测量光致发光(PL)谱、PL时间分辨光谱及不同激发功率下PL发光强度,研究了低温(5 K)下等离子体对InAs单量子点PL光谱的增强效应.采用电子束蒸发镀膜技术在InAs量子点样品表面淀积了5 nm厚度的金膜,形成纳米金岛膜结构.实验发现,金岛膜有利于量子点样品发光强度的增加,最大PL强度增加了约5倍,其主要物理机理是金岛膜纳米结构提高了量子点PL光谱的收集效率.     

An effective reflectance method for designing broadband antireflection films coupled with solar cells

The solar spectrum covers a broad wavelength range,which requires that antireflection coating(ARC) is effective over a relatively wide wavelength range for more incident light coming into the cell.In this paper,we present two methods to measure the composite reflection of SiO2/ZnS double-layer ARC in the wavelength ranges of 300-870 nm(dualjunction) and 300-1850 nm(triple-junction),under the solar spectrum AM0.In order to give sufficient consideration to the ARC coupled with the window layer and the dispersion effect of the refractive index of each layer,we use multidimensional matrix data for reliable simulation.A comparison between the results obtained from the weighted-average reflectance(WAR) method commonly used and that from the effective-average reflectance(EAR) method introduced here shows that the optimized ARC through minimizing the effective-average reflectance is convenient and available.