Atomic hydrogen induced step bunching and fabrication of quantum wire arrays on GaAs（311） A Substrate by molecular eam epitaxy

Atomic hydrogen assisted molecular beam epitaxy (MBE) is a novel type of epitaxial growth of nanostructures. The GaAs (311)A surface naturally forms one-dimensional step arrays by step bunching along the direction of 〈-233〉 and the space period is around 40nm. The step arrays extend over several μm without displacement. The InGaAs quantum wire arrays are grown on the step arrays as the basis. Our results may prompt further development of more uniform quantum wire and quantum dot arrays.     

Switching Characteristics of Phase Change Memory Cell Integrated with Metal-Oxide Semiconductor Field Effect Transistor

A Ge2Sb2Te5 based phase change memory device cell integrated with metal-oxide semiconductor field effect transistor （MOSFET） is fabricated using standard 0.18 #m complementary metM-oxide semiconductor process technology. It shows steady switching characteristics in the dc current-voltage measurement. The phase changing phenomenon from crystalline state to amorphous state with a voltage pulse altitude of 2.0 V and pulse width of 50ns is also obtained. These results show the feasibility of integrating phase change memory cell with MOSFET.     

Interfaces in InAs/GaSb Superlattices Grown by Molecular Beam Epitaxy

Short period InAs（4ML）/GaSb（SML） superlattices （SLs） with InSb- and mixed-like （or Ga1-xInxAs1-ySby- like） interfaces （IFs） are grown by molecular-beam epitaxy （MBE） on （001） GaSh substrates at optimized growth temperature. Raman scattering reveals that two kinds of IFs can be formed by controlling shutter sequences. X-ray diffraction （XRD） and atomic force microscopy （AFM） demonstrate that SLs with mixed-like IFs are more sensitive to growth temperature than that with InSb-like IFs. The photoluminescence （PL） spectra of SLs with mixed-like IFs show a stronger intensity and narrower line width than with InSb-like IFs. It is concluded that InAs/GaSb SLs with mixed-like IFs have better crystalline and optical properties.     

High-density and narrow size-distribution InAs quantum dots formed by a modified two-step growth

We develop a modified two-step method of growing high-density and narrow size-distribution InAs/GaAs quantum dots (QDs) by molecular beam epitaxy. In the first step, high-density small InAs QDs are formed by optimizing the continuous deposition amount. In the second step, deposition is carried out with a long growth interruption for every 0.1 InAs monolayer. Atomic force microscope images show that the high-density ($\sim $5.9$\times $10$^{10}$\,cm$^{ - 2})$ good size-uniformity InAs QDs are achieved. The strong intensity and narrow linewidth (27.7\,meV) of the photoluminescence spectrum show that the QDs grown in this two-step method have a good optical quality.     

垂直耦合自组织InAs双量子点中激子能的计算

在有效质量近似条件下研究了垂直耦合的自组织InAs/GaAs量子点的激子态.在绝热近似条件下，采用传递矩阵方法计算了电子和空穴的能谱.通过哈密顿量矩阵的对角化，对电子和空穴间的库仑相互作用进行了精确处理.讨论了两量子点间的垂直距离对激子基态能的影响.从基态波函数概率分布的角度，讨论了激子的束缚能.计算了重空穴和轻空穴激子的基态能随外部垂直磁场变化的函数关系.计算了量子点大小（量子点半径）对激子能的影响. 关键词： 量子点 激子 对角化     

求解粘性Hamilton-Jacobi方程的高阶方法

提出了求解具有粘性项的Hamilton-Jacobi方程的二阶、四阶方法.该方法以加权基本无振荡(WENO)格式为基础,通过修正数值通量函数和构造右端粘性项的基于非线性限制器的二阶近似、基于Taylor展开的四阶近似,成功地求解了一维、二维的粘性Hamilton-Jacobi方程.给出的算例说明了本方法具有高分辨率、鲁棒性和无振荡特性.     

丙烯聚合负载型Ziegler-Natta催化剂的ESR研究

用ESR方法对MgCl₂负载的钛系Ziegier-Natta催化剂进行了研究,获得了分辩率较好的谱图,并结合前人的工作将信号的归属同钛原子在MgCl₂上的负载情况对应起来.同时考察了内外给电子化合物对ESR谱图的影响,探讨了它们可能的作用机理.     

InGaAs/GaAs应变脊形量子线分子束外延非平面生长研究

提出了新型InGaAs/GaAs应变脊形量子线结构．这种应变脊形量子线结合了非平面应变外延层中沿不同晶向能带带隙的变化、非平面生长应变层In组分的变化，以及非平面外延层厚度的变化等三方面共同形成的横向量子限制效应的综合作用．在非平面GaAs衬底上用分子束外延生长了侧面取向为（113）的脊形AlAs/In GaAs/AlAs应变量子线．用10K光致荧光谱测试了其发光性质．用Kronig-Penney模型近似计算了这种应变脊形结构所具有的横向量子限制效应，发现其光致荧光谱峰位的测试结果，与计算结果相比，有10meV的“蓝移”．认为这一跃迁能量的“蓝移”是上述三方面横向量子限制效应综合作用的结果 关键词：     

Fabrication and Characterization of ZnO-Based Film Bulk Acoustic Resonator with a High Working Frequency

We report on the fabrication and characterization of a ZnO-based film-bulk acoustic-resonance device utilized as biosensor. The device has a multilayer structure which consists of piezoelectric element (Au/ZnO/Pt) and a Bragg-reflection-layer acoustic isolation consisting of multilayers of ZnO/Pt. Dielectric measurements have revealed that the device has a very high working frequency (up to -3.1 GHz), meaning that the device may have a higher sensitivity than the devices reported in the literature.     

1.3μm量子点垂直腔面发射激光器高频响应的优化设计

结合垂直腔面发射激光器(VCSEL)原理以及量子点增益特点，计算了有源层p掺杂结构的量子点VCSEL的材料增益和3 dB带宽，发现p掺杂结构可以大大提高频率特性.结合VCSEL激射条件和阈值特性，分析了对VCSEL结构的要求；分析了分布参数对频率特性的影响，对其外部封装提出了要求.设计了高频率响应的含氧化限制层的1.3 μm量子点VCSEL结构. 关键词： 量子点 垂直腔面发射激光器 微分增益 3 dB带宽